Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 2 · NO. 3 | July 2003
CONTENTS
Editorial
MEMS FOR RADIO-FREQUENCY WIRELESS COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1586707
TOPICS: Microelectromechanical systems, Switches, Resonators, Lithography, Semiconductors, Electrodes, Capacitors, Semiconducting wafers, Metals, Wireless communications
BIOCHIPS
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1582467
TOPICS: Acoustics, Microfluidics, Diffusion, Liquids, Ferroelectric materials, Electrodes, Convection, Signal processing, Biological research, Silicon
MICROGRIPPERS
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1585063
TOPICS: Shape memory alloys, Silicon, Thin films, Optical simulations, Actuators, Temperature metrology, Semiconducting wafers, Sputter deposition, Microelectromechanical systems, Device simulation
MICROFIBER SPECTROMETERS
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1582179
TOPICS: Spectroscopy, Detector arrays, Mercury, Lamps, Integrated optics, Holography, Single mode fibers, Multimode fibers, Fabrication, Spectrometer engineering
MASK AND MASKLESS TECHNOLOGY
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1584686
TOPICS: Sol-gels, Photomasks, Glasses, Silica, Deep ultraviolet, Birefringence, Manufacturing, Lithography, Polishing, Ultraviolet radiation
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1580828
TOPICS: Etching, Chromium, Photomasks, Critical dimension metrology, Cadmium, Photoresist processing, Plasma etching, Plasma, Ions, Oxygen
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1584445
TOPICS: Microlens array, Microlens, Spatial filters, Digital micromirror devices, Maskless lithography, Glasses, Photoresist materials, Lithography, Chromium, Micromirrors
ALIGNMENT FOR MICROLITHOGRAPHY
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1584685
TOPICS: Finite-difference time-domain method, Optical alignment, Diffraction, Imaging systems, Solids, Sensors, Curium, Signal detection, Computer simulations, Semiconducting wafers
CONTACT HOLE INSPECTION
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1585062
TOPICS: Inspection, Semiconducting wafers, Electron beams, Dry etching, Scanning electron microscopy, Selenium, Silicon, Signal detection, Etching, Linear filtering
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1583735
TOPICS: Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Mirrors, Monochromators, Krypton, Light scattering, X-ray optics, Spectral resolution, 3D metrology
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