journal of micro nanolithography mems and moems
VOL. 2 · NO. 3 | July 2003
CONTENTS
Editorial
MEMS FOR RADIO-FREQUENCY WIRELESS COMMUNICATIONS
David Seeger, Jennifer Lund, Christopher Jahnes, Lili Deligianni, Paivikki Buchwalter, Panayotis Andricacos, Raul Acosta, Inna Babich, Arpan Mahorowala, Joanna Rosner, John Cotte
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1586707
TOPICS: Microelectromechanical systems, Switches, Resonators, Lithography, Semiconductors, Electrodes, Capacitors, Semiconducting wafers, Metals, Wireless communications
BIOCHIPS
Robin Liu, Ralf Lenigk, Piotr Grodzinski
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1582467
TOPICS: Acoustics, Microfluidics, Diffusion, Liquids, Ferroelectric materials, Electrodes, Convection, Signal processing, Biological research, Silicon
MICROGRIPPERS
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1585063
TOPICS: Shape memory alloys, Silicon, Thin films, Optical simulations, Actuators, Temperature metrology, Semiconducting wafers, Sputter deposition, Microelectromechanical systems, Device simulation
MICROFIBER SPECTROMETERS
Gang Chen, Zhiyu Wen, Zhongquan Wen, Yinshong Pan, Shanglian Huang
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1582179
TOPICS: Spectroscopy, Detector arrays, Mercury, Lamps, Integrated optics, Holography, Single mode fibers, Multimode fibers, Fabrication, Spectrometer engineering
MASK AND MASKLESS TECHNOLOGY
Rahul Ganguli, D. Laurence Meixner, Steven Colbern, Matt Gleason, Douglas Meyers, Satyabrata Chaudhuri
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1584686
TOPICS: Sol-gels, Photomasks, Glasses, Silica, Deep ultraviolet, Birefringence, Manufacturing, Lithography, Polishing, Ultraviolet radiation
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1580828
TOPICS: Etching, Chromium, Photomasks, Critical dimension metrology, Cadmium, Photoresist processing, Plasma etching, Plasma, Ions, Oxygen
Ren Yang, Kin Foong Chan, Zhiqiang Feng, Ishikawa Akihito, WenHui Mei
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1584445
TOPICS: Microlens array, Microlens, Spatial filters, Digital micromirror devices, Maskless lithography, Glasses, Photoresist materials, Lithography, Chromium, Micromirrors
ALIGNMENT FOR MICROLITHOGRAPHY
Nikolay Nikolaev, Andreas Erdmann
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1584685
TOPICS: Finite-difference time-domain method, Optical alignment, Diffraction, Imaging systems, Solids, Sensors, Curium, Signal detection, Computer simulations, Semiconducting wafers
CONTACT HOLE INSPECTION
Miyako Matsui, Mari Nozoe, Keiko Arauchi, Atsuko Takafuji, Hidetoshi Nishiyama, Yasushi Goto
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1585062
TOPICS: Inspection, Semiconducting wafers, Electron beams, Dry etching, Scanning electron microscopy, Selenium, Silicon, Signal detection, Etching, Linear filtering
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 2(3), (1 July 2003) https://doi.org/10.1117/1.1583735
TOPICS: Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Mirrors, Monochromators, Krypton, Light scattering, X-ray optics, Spectral resolution, 3D metrology
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