Global critical dimension uniformity improvement for mask fabrication with negative-tone chemically amplified resists by zone-controlled postexposure bake
Photomask dimensional metrology in the scanning electron microscope, part I: Has anything really changed?
Photomask dimensional metrology in the scanning electron microscope, part II: High-pressure/environmental scanning electron microscope
Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments
Novel in-situ focus monitor technology in attenuated phase shift mask under actual illumination conditions
Complementary double-exposure technique (CODE): a way to print 80- and 65-nm gate levels using a double-exposure binary mask approach
Initial study of the fabrication of step and flash imprint lithography templates for the printing of contact holes
Simulation studies and experimental verification of the performance of a lithocell combination bake-chill station