Global critical dimension uniformity improvement for mask fabrication with negative-tone chemically amplified resists by zone-controlled postexposure bake
Photomask dimensional metrology in the scanning electron microscope, part I: Has anything really changed?
Photomask dimensional metrology in the scanning electron microscope, part II: High-pressure/environmental scanning electron microscope
Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments
Novel in-situ focus monitor technology in attenuated phase shift mask under actual illumination conditions
Complementary double-exposure technique (CODE): a way to print 80- and 65-nm gate levels using a double-exposure binary mask approach
Step and flash imprint lithography (S-FIL) is an attractive method for printing sub-100-nm geometries. Relative to other imprinting processes, S-FIL has the advantage of the template being transparent, thereby facilitating conventional overlay techniques.
Simulation studies and experimental verification of the performance of a lithocell combination bake-chill station