Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 3 · NO. 3 | July 2004
CONTENTS
Editorial
Immersion Lithography
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1756917
TOPICS: Immersion lithography, Semiconducting wafers, Photomasks, Refractive index, Imaging systems, Water, Lithography, Metals, Resolution enhancement technologies, Stray light
EUV Lithography
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1756165
TOPICS: Mirrors, Reflectivity, Surface finishing, Polishing, Silicon, Metals, Extreme ultraviolet lithography, Nickel, Magnetism, Optical components
Proximity Electron Lithography
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1759326
TOPICS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography
Proximity X-Ray Lithography
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1759324
TOPICS: Photons, Electrons, Polymethylmethacrylate, Copper, Absorption, Luminescence, Aluminum, Chemical species, Interfaces, Silicon
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1753271
TOPICS: Photomasks, X-rays, Gold, Silicon, X-ray lithography, Electron beam lithography, Etching, Photoresist processing, Electroplating, Anisotropic etching
Resist Processes
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1759325
TOPICS: Scanning electron microscopy, Edge roughness, Line edge roughness, Photoresist materials, Digital filtering, Line width roughness, Image analysis, Edge detection, Image filtering, Correlation function
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1759327
TOPICS: Semiconducting wafers, Ion implantation, Diffraction, Wafer-level optics, Lithography, Computer simulations, Finite-difference time-domain method, Light sources, Deep ultraviolet, Scanners
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1758268
TOPICS: Line edge roughness, Electron beam lithography, Electron beams, Photoresist processing, Image processing, Imaging systems, Hydrogen, Etching, Polymers, Photomasks
Mask Pellicles
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1758949
TOPICS: Silica, Pellicles, Aluminum, Sol-gels, Adsorption, Lithography, Nitrogen, Deep ultraviolet, Photomasks, Bioalcohols
Dielectric Masks
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1759328
TOPICS: Laser ablation, Dielectrics, Photomasks, Optical lithography, Excimer lasers, Optical components, Reflectivity, Laser processing, Optical coatings, Ultraviolet radiation
Microplanar Waveguides
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1759331
TOPICS: Phase shifts, Dielectrics, Thin films, Silicon, Waveguides, Electrodes, Capacitors, Sputter deposition, Metals, Signal attenuation
MEMs Switches
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1758950
TOPICS: Switches, Microelectromechanical systems, Optical amplifiers, Switching, Capacitors, Silicon, Electrodes, Resistance, Amplifiers, Electromagnetism
Three-Dimensional Micromachining
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1753589
TOPICS: Polymers, Laser ablation, 3D modeling, Diode pumped solid state lasers, Laser processing, Laser applications, Solid state lasers, Manufacturing, Laser damage threshold, Fabrication
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1759330
TOPICS: Crystals, Etching, Femtosecond phenomena, Excimer lasers, Absorption, Glasses, Ceramics, Heat treatments, Photons, Laser processing
Microfluidics
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1759329
TOPICS: Microfluidics, Silicon, Semiconducting wafers, Resistance, Liquids, Control systems, Surface finishing, Silica, Nitrogen
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) https://doi.org/10.1117/1.1758726
TOPICS: Sensors, Silicon, Semiconducting wafers, Microfluidics, Resistance, Doping, Resistors, Wafer bonding, Chemical elements, Silica
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