journal of micro nanolithography mems and moems
VOL. 3 · NO. 3 | July 2004
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1778174
Immersion Lithography
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1756917
TOPICS: Immersion lithography, Semiconducting wafers, Photomasks, Refractive index, Imaging systems, Water, Lithography, Metals, Resolution enhancement technologies, Stray light
EUV Lithography
Hideo Takino, Masaaki Kuki, Akinori Itoh, Hideki Komatsuda, Kazushi Nomura, Norio Shibata
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1756165
TOPICS: Mirrors, Reflectivity, Surface finishing, Polishing, Silicon, Metals, Extreme ultraviolet lithography, Nickel, Magnetism, Optical components
Proximity Electron Lithography
Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1759326
TOPICS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography
Proximity X-Ray Lithography
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1759324
TOPICS: Photons, Electrons, Polymethylmethacrylate, Copper, Absorption, Luminescence, Aluminum, Chemical species, Interfaces, Silicon
Lin Wang, Todd Christenson, Yohannes Desta, Rainer Fettig, Jost Goettert
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1753271
TOPICS: Photomasks, X-rays, Gold, Silicon, X-ray lithography, Electron beam lithography, Etching, Photoresist processing, Electroplating, Anisotropic etching
Resist Processes
Vassilios Constantoudis, George Patsis, Evangelos Gogolides
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1759325
TOPICS: Scanning electron microscopy, Edge roughness, Line edge roughness, Photoresist materials, Digital filtering, Line width roughness, Image analysis, Edge detection, Image filtering, Correlation function
Takashi Sato, Ayako Endo, Koji Hashimoto, Soichi Inoue, Tsuyoshi Shibata, Yuuji Kobayashi
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1759327
TOPICS: Semiconducting wafers, Ion implantation, Diffraction, Wafer-level optics, Lithography, Computer simulations, Finite-difference time-domain method, Light sources, Deep ultraviolet, Scanners
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1758268
TOPICS: Line edge roughness, Electron beam lithography, Electron beams, Photoresist processing, Image processing, Imaging systems, Hydrogen, Etching, Polymers, Photomasks
Mask Pellicles
D. Laurence Meixner, Rahul Ganguli, Troy Robinson, De-Yin Jeng, Mark Morris, Satyabrata Chaudhuri, Brian Grenon
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1758949
TOPICS: Silica, Pellicles, Aluminum, Sol-gels, Adsorption, Lithography, Nitrogen, Deep ultraviolet, Photomasks, Bioalcohols
Dielectric Masks
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1759328
TOPICS: Laser ablation, Dielectrics, Photomasks, Optical lithography, Excimer lasers, Optical components, Reflectivity, Laser processing, Optical coatings, Ultraviolet radiation
Microplanar Waveguides
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1759331
TOPICS: Phase shifts, Dielectrics, Thin films, Silicon, Waveguides, Electrodes, Capacitors, Sputter deposition, Metals, Signal attenuation
MEMs Switches
Miao Lu, Zhengping Zhao, Xiaodong Hu, Xuefeng Zou, Hejun Guo
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1758950
TOPICS: Switches, Microelectromechanical systems, Optical amplifiers, Switching, Capacitors, Silicon, Electrodes, Resistance, Amplifiers, Electromagnetism
Three-Dimensional Micromachining
Won-Seok Chang, Bosung Shin, Jae-gu Kim, Kyung-Hyun Whang
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1753589
TOPICS: Polymers, Laser ablation, 3D modeling, Diode pumped solid state lasers, Laser processing, Laser applications, Solid state lasers, Manufacturing, Laser damage threshold, Fabrication
Joohan Kim, Halil Berberoglu, Xianfan Xu
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1759330
TOPICS: Crystals, Etching, Femtosecond phenomena, Excimer lasers, Absorption, Glasses, Ceramics, Heat treatments, Photons, Laser processing
Microfluidics
Daniel Bien, S. J. Mitchell, Harold Gamble
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1759329
TOPICS: Microfluidics, Silicon, Semiconducting wafers, Resistance, Liquids, Control systems, Surface finishing, Silica, Nitrogen
Hao Zhao, John Montgomery, S. J. Mitchell, Harold Gamble
J. Micro/Nanolith. MEMS MOEMS 3(3), (1 July 2004) doi:10.1117/1.1758726
TOPICS: Sensors, Silicon, Semiconducting wafers, Microfluidics, Resistance, Doping, Resistors, Wafer bonding, Chemical elements, Silica
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