Editorial
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1808766
RESOLUTION ENHANCEMENT TECHNIQUES
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1794708
TOPICS: Light, Modulation, Diffraction, Objectives, Convolution, Printing, Photomasks, Semiconducting wafers, Optical proximity correction, Diffractive optical elements
Immersion Lithography
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1794179
TOPICS: Scattering, Light scattering, Liquids, Polarizability, Polarization, Raman scattering, Molecules, Immersion lithography, Rayleigh scattering, Microfluidics
Extreme Ultraviolet Lithography
Ahmed Hassanein, Tatiana Burtseva, Jeffrey Brooks, Isak Konkashbaev, Bryan Rice
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793153
TOPICS: Electrodes, Plasma, Copper, Dielectrics, Extreme ultraviolet, Manufacturing, Resistance, Molybdenum, Ions, Tungsten
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793171
TOPICS: Reflection, Reflectivity, Reflectors, Extreme ultraviolet, Multilayers, Point spread functions, Projection systems, Thin films, Optical design, Wavefronts
Fabrication by Electron Beams
Minoru Takeda, Motohiro Furuki, Masanobu Yamamoto, Masataka Shinoda, Kimihiro Saito, Yuichi Aki, Hiroshi Kawase, Mitsuru Koizumi, Toshiaki Miyokawa, Masao Mutou
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793154
TOPICS: Silicon, Electron beams, Etching, Eye, Near field, Near field optics, Signal processing, Head, Reactive ion etching, Spindles
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793156
TOPICS: Absorbance, Glasses, Photomasks, Lithography, Photoresist processing, Photoresist materials, Mask making, Optical lithography, Etching, Calibration
Fabrication by Excimer Laser Ablation
C. Pan, S. Shen, Chi-Chang Hsieh, Chi-Hui Chien, Yung-Chang Chen
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1794178
TOPICS: Laser ablation, Excimer lasers, Microlens array, Microlens, Numerical analysis, Optical simulations, Photomasks, Micromachining, Polymers, 3D microstructuring
Fabrication of High-Aspect-Ratio Microstructures
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1792650
TOPICS: Lithography, Ultraviolet radiation, Light sources, Diffraction, Optical filters, Scanning electron microscopy, Photoresist processing, X-ray lithography, Microelectromechanical systems, Light
Peng Jin, Kyle Jiang, Nianjun Sun
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793155
TOPICS: Ultraviolet radiation, Photoresist materials, Lithography, Image processing, Absorption, Carbon monoxide, Scanning electron microscopy, Transparency, Sun, Photoresist developing
Fabrication of Microelectronic Pressure Sensors
Zhi-yu Wen, Zhongquan Wen, Gang Chen, Xiaolan Wang
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1792651
TOPICS: Sensors, Microelectronics, Silicon, Corrosion, Anisotropy, Resistance, Electronics, Electrons, Low pressure chemical vapor deposition, Optoelectronics
MEMs Tunable Fabry-Perot Interferometers
Rohit Srivastava, Urvi Shenoy, Scott Forrest, Swetha Chinnayelka, J. Mohammed, Ronald Besser, Michael McShane
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1794707
TOPICS: Silicon, Semiconducting wafers, Mirrors, Electrodes, Bulk micromachining, Etching, Infrared spectroscopy, Fabry–Perot interferometry, Infrared radiation, Instrument modeling
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