Editorial
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1808766
RESOLUTION ENHANCEMENT TECHNIQUES
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1794708
TOPICS: Light, Modulation, Diffraction, Objectives, Convolution, Printing, Photomasks, Semiconducting wafers, Optical proximity correction, Diffractive optical elements
Immersion Lithography
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1794179
TOPICS: Scattering, Light scattering, Liquids, Polarizability, Polarization, Raman scattering, Molecules, Immersion lithography, Rayleigh scattering, Microfluidics
Extreme Ultraviolet Lithography
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793153
TOPICS: Electrodes, Plasma, Copper, Dielectrics, Extreme ultraviolet, Manufacturing, Resistance, Molybdenum, Ions, Tungsten
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793171
TOPICS: Reflection, Reflectivity, Reflectors, Extreme ultraviolet, Multilayers, Point spread functions, Projection systems, Thin films, Optical design, Wavefronts
Fabrication by Electron Beams
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793154
TOPICS: Silicon, Electron beams, Etching, Eye, Near field, Near field optics, Signal processing, Head, Reactive ion etching, Spindles
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793156
TOPICS: Absorbance, Glasses, Photomasks, Lithography, Photoresist processing, Photoresist materials, Mask making, Optical lithography, Etching, Calibration
Fabrication by Excimer Laser Ablation
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1794178
TOPICS: Laser ablation, Excimer lasers, Microlens array, Microlens, Numerical analysis, Optical simulations, Photomasks, Micromachining, Polymers, 3D microstructuring
Fabrication of High-Aspect-Ratio Microstructures
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1792650
TOPICS: Lithography, Ultraviolet radiation, Light sources, Diffraction, Optical filters, Scanning electron microscopy, Photoresist processing, X-ray lithography, Microelectromechanical systems, Light
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1793155
TOPICS: Ultraviolet radiation, Photoresist materials, Lithography, Image processing, Absorption, Carbon monoxide, Scanning electron microscopy, Transparency, Sun, Photoresist developing
Fabrication of Microelectronic Pressure Sensors
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1792651
TOPICS: Sensors, Microelectronics, Silicon, Corrosion, Anisotropy, Resistance, Electronics, Electrons, Low pressure chemical vapor deposition, Optoelectronics
MEMs Tunable Fabry-Perot Interferometers
J. Micro/Nanolith. MEMS MOEMS 3(4), (1 October 2004) https://doi.org/10.1117/1.1794707
TOPICS: Silicon, Semiconducting wafers, Mirrors, Electrodes, Bulk micromachining, Etching, Infrared spectroscopy, Fabry–Perot interferometry, Infrared radiation, Instrument modeling
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