journal of micro nanolithography mems and moems
VOL. 4 · NO. 1 | January 2005
CONTENTS
Editorial
Special Section on Next Generation Lithography
Articles
J. Micro/Nanolith. MEMS MOEMS 4(1), 013001 (1 January 2005) https://doi.org/10.1117/1.1857529
TOPICS: Photomasks, Transistors, Lithography, Standards development, Resolution enhancement technologies, Field effect transistors, Capacitance, Phase shifts, Image quality standards, Binary data
J. Micro/Nanolith. MEMS MOEMS 4(1), 013002 (1 January 2005) https://doi.org/10.1117/1.1858331
TOPICS: Semiconducting wafers, Liquids, Thermal effects, Microfluidics, Wafer-level optics, Refraction, Computational fluid dynamics, Optical lithography, Microfluidic imaging, Photomasks
Bryan Vogt, Christopher Soles, Chia-Ying Wang, Vivek Prabhu, Patricia McGuiggan, Jack Douglas, Eric Lin, Wen-Li Wu, Sushil Satija, Dario Goldfarb, Marie Angelopoulos
J. Micro/Nanolith. MEMS MOEMS 4(1), 013003 (1 January 2005) https://doi.org/10.1117/1.1861852
TOPICS: Interfaces, Polymers, Oxides, Head-mounted displays, Photoresist materials, Silicon, Liquids, Absorption, Polymer thin films, Silicon films
J. Micro/Nanolith. MEMS MOEMS 4(1), 013004 (1 January 2005) https://doi.org/10.1117/1.1858131
TOPICS: Nanoparticles, Polymers, Pellicles, Absorbance, Polymer thin films, Nanocomposites, Particles, Transparency, Lithography, Silica
J. Micro/Nanolith. MEMS MOEMS 4(1), 013005 (1 January 2005) https://doi.org/10.1117/1.1858491
TOPICS: Diffusion, Printing, Photoresist processing, Photoresist materials, Line edge roughness, Lithography, Critical dimension metrology, Cadmium sulfide, Binary data, Photomasks
Kay Lederer, Steffen Hornig, Ralf Schuster
J. Micro/Nanolith. MEMS MOEMS 4(1), 013006 (1 January 2005) https://doi.org/10.1117/1.1856929
TOPICS: Semiconducting wafers, Photoresist developing, Photoresist materials, Photoresist processing, Semiconductors, Manufacturing, Lithography, Aerosols, Critical dimension metrology, Thin film coatings
J. Micro/Nanolith. MEMS MOEMS 4(1), 013007 (1 January 2005) https://doi.org/10.1117/1.1857534
TOPICS: Electron microscopy, Atomic force microscopy, 3D metrology, Line edge roughness, Reconstruction algorithms, Scanners, Finite element methods, Photoresist processing, Critical dimension metrology, Process control
J. Micro/Nanolith. MEMS MOEMS 4(1), 013008 (1 January 2005) https://doi.org/10.1117/1.1861732
TOPICS: Monte Carlo methods, Error analysis, Phase shifts, Critical dimension metrology, Photomasks, Coherence imaging, Wavefronts, Light sources, Resolution enhancement technologies, Zernike polynomials
Gary Cheng, Daniel Pirzada, Prashanta Dutta
J. Micro/Nanolith. MEMS MOEMS 4(1), 013009 (1 January 2005) https://doi.org/10.1117/1.1869132
TOPICS: Copper, Etching, Silicon, Reactive ion etching, Lithography, Electrochemical etching, Photoresist materials, Wet etching, Nanolithography, Microfluidics
Wei-Chih Wang, Joe Ho, Per Reinhall
J. Micro/Nanolith. MEMS MOEMS 4(1), 013010 (1 January 2005) https://doi.org/10.1117/1.1856928
TOPICS: Etching, Silicon, Aluminum, Reactive ion etching, Oxides, Photoresist materials, Anisotropy, Anisotropic etching, Photomasks, Micromachining
Jie Wu, Shailendra Dubashi, Gary Bernstein
J. Micro/Nanolith. MEMS MOEMS 4(1), 013011 (1 January 2005) https://doi.org/10.1117/1.1857532
TOPICS: Resistance, Thin films, Copper, Electroplating, Inductance, Amplitude modulation, Diodes, Metals, Capacitance, Silicon
Giuseppe Coppola, Mario Iodice, Andrea Finizio, Sergio De Nicola, Giovanni Pierattini, Pietro Ferraro, Carlo Magro, G. Spoto
J. Micro/Nanolith. MEMS MOEMS 4(1), 013012 (1 January 2005) https://doi.org/10.1117/1.1857551
TOPICS: Microelectromechanical systems, Digital holography, Microscopes, Holograms, Silicon, 3D image reconstruction, Charge-coupled devices, Finite element methods, Wavefronts, Holography
Ya-hui Hu, Ming Chang, Kao-Hui Lin
J. Micro/Nanolith. MEMS MOEMS 4(1), 013013 (1 January 2005) https://doi.org/10.1117/1.1861812
TOPICS: Inspection, Liquids, Biomedical optics, Microfluidics, Detection and tracking algorithms, Computer simulations, Digital imaging, Biological research, Scanning electron microscopy, Microfluidic imaging
COMMUNICATIONS
Hui Ju, Ping Zhang, Jingqiu Liang, Shurong Wang, YiHui Wu
J. Micro/Nanolith. MEMS MOEMS 4(1), 019701 (1 January 2005) https://doi.org/10.1117/1.1857533
TOPICS: Silicon, Semiconducting wafers, Diffraction gratings, Crystals, Scanning electron microscopy, Wet etching, Atomic force microscopy, Wafer-level optics, Optical design, Photomasks
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