Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 4 · NO. 2 | April 2005
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (15)
Editorial
Articles
J. Micro/Nanolith. MEMS MOEMS 4(2), 023001 (1 April 2005) https://doi.org/10.1117/1.1898066
TOPICS: Photomasks, Distortion, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Matrices, Transform theory, Vector spaces, Optical lithography, Error analysis
J. Micro/Nanolith. MEMS MOEMS 4(2), 023002 (1 April 2005) https://doi.org/10.1117/1.1898603
TOPICS: Signal processing, Semiconducting wafers, Optical alignment, TCAD, Photomasks, Metals, Computer aided design, Laser ablation, Chemical mechanical planarization, Inspection
J. Micro/Nanolith. MEMS MOEMS 4(2), 023003 (1 April 2005) https://doi.org/10.1117/1.1898244
TOPICS: Optical proximity correction, Diffractive optical elements, Critical dimension metrology, Calibration, Photomasks, Stanford Linear Collider, Fiber optic illuminators, Lithography, Printing, Logic
J. Micro/Nanolith. MEMS MOEMS 4(2), 023004 (1 April 2005) https://doi.org/10.1117/1.1898043
TOPICS: Photomasks, Phase shifts, Monochromatic aberrations, Reticles, Diffraction, Critical dimension metrology, Cadmium, Scattering, Optical lithography, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 4(2), 023005 (1 April 2005) https://doi.org/10.1117/1.1899324
TOPICS: Photomasks, Double patterning technology, Optical lithography, Photoresist processing, Scanning electron microscopy, Phase shifts, Lithographic illumination, Lithography, Semiconducting wafers, Scanners
J. Micro/Nanolith. MEMS MOEMS 4(2), 023006 (1 April 2005) https://doi.org/10.1117/1.1897392
TOPICS: Photomasks, Diffraction, Imaging systems, Image acquisition, Electromagnetism, Spiral phase plates, Error analysis, Etching, Photoresist materials, Transmittance
J. Micro/Nanolith. MEMS MOEMS 4(2), 023007 (1 April 2005) https://doi.org/10.1117/1.1897388
TOPICS: Resistance, Scanning electron microscopy, Electron microscopes, Semiconducting wafers, Electron beams, Inspection, Image processing, Optical simulations, Semiconductors, Silicon
J. Micro/Nanolith. MEMS MOEMS 4(2), 023008 (1 April 2005) https://doi.org/10.1117/1.1898063
TOPICS: Photomasks, Semiconducting wafers, Charged-particle lithography, Electron beams, Optical alignment, Distortion, Electron beam lithography, Wafer-level optics, Projection lithography, Scanners
J. Micro/Nanolith. MEMS MOEMS 4(2), 023009 (1 April 2005) https://doi.org/10.1117/1.1898246
TOPICS: Photomasks, Lithography, Spatial frequencies, Polarization, Interferometry, Optical proximity correction, Resolution enhancement technologies, Image resolution, Image processing, Image quality
J. Micro/Nanolith. MEMS MOEMS 4(2), 023010 (1 April 2005) https://doi.org/10.1117/1.1897385
TOPICS: Mathematical modeling, Photography, Diffusion, Chemical elements, Microlens, Microlens array, 3D modeling, Absorbance, Halftones, Binary data
J. Micro/Nanolith. MEMS MOEMS 4(2), 023011 (1 April 2005) https://doi.org/10.1117/1.1899312
TOPICS: Prototyping, Microactuators, Laser processing, Microfabrication, Fabrication, Micromachining, Chemical elements, Actuators, Control systems, Pulsed laser operation
J. Micro/Nanolith. MEMS MOEMS 4(2), 023012 (1 April 2005) https://doi.org/10.1117/1.1898243
TOPICS: Actuators, Nickel, Metals, Plating, Microelectromechanical systems, Temperature metrology, Silicon, Resistance, Thin films, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 4(2), 023013 (1 April 2005) https://doi.org/10.1117/1.1898605
TOPICS: Microrings, Resonators, Silicon, Waveguides, Lithography, Polymethylmethacrylate, Chromium, Tunable lasers, Electron beams, Photomasks
J. Micro/Nanolith. MEMS MOEMS 4(2), 023014 (1 April 2005) https://doi.org/10.1117/1.1898245
TOPICS: Microfluidics, Scanning probe lithography, Nanolithography, Capillaries, Silicon, Semiconducting wafers, Liquids, Deep reactive ion etching, Reactive ion etching, Satellites
J. Micro/Nanolith. MEMS MOEMS 4(2), 023015 (1 April 2005) https://doi.org/10.1117/1.1897381
TOPICS: Microlens, Nickel, Plasma enhanced chemical vapor deposition, Deposition processes, Dielectrics, Photomasks, Sputter deposition, Aspheric lenses, Light emitting diodes, Silicon
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 4(2), 029701 (1 April 2005) https://doi.org/10.1117/1.1898604
TOPICS: Polymers, Extreme ultraviolet lithography, Lithography, Optical lithography, Extreme ultraviolet, Photoresist materials, Photomicroscopy, Etching, Resistance, Nanotechnology
Back to Top