journal of micro nanolithography mems and moems
VOL. 4 · NO. 2 | April 2005
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (15)
Editorial
J. Micro/Nanolith. MEMS MOEMS 4(2), 020101 (1 April 2005) doi:10.1117/1.1904625
Articles
J. Micro/Nanolith. MEMS MOEMS 4(2), 023001 (1 April 2005) doi:10.1117/1.1898066
TOPICS: Photomasks, Distortion, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Matrices, Transform theory, Vector spaces, Optical lithography, Error analysis
Takashi Sato, Ayako Endo, Tatsuhiko Higashiki, Kazutaka Ishigo, Takuya Kono, Takashi Sakamoto, Yoshiyuki Shioyama, Satoshi Tanaka
J. Micro/Nanolith. MEMS MOEMS 4(2), 023002 (1 April 2005) doi:10.1117/1.1898603
TOPICS: Signal processing, Semiconducting wafers, Optical alignment, TCAD, Photomasks, Metals, Computer aided design, Laser ablation, Chemical mechanical planarization, Inspection
J. Micro/Nanolith. MEMS MOEMS 4(2), 023003 (1 April 2005) doi:10.1117/1.1898244
TOPICS: Optical proximity correction, Diffractive optical elements, Critical dimension metrology, Calibration, Photomasks, Stanford Linear Collider, Fiber optic illuminators, Lithography, Printing, Logic
J. Micro/Nanolith. MEMS MOEMS 4(2), 023004 (1 April 2005) doi:10.1117/1.1898043
TOPICS: Photomasks, Phase shifts, Monochromatic aberrations, Reticles, Diffraction, Critical dimension metrology, Cadmium, Scattering, Optical lithography, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 4(2), 023005 (1 April 2005) doi:10.1117/1.1899324
TOPICS: Photomasks, Double patterning technology, Optical lithography, Photoresist processing, Scanning electron microscopy, Phase shifts, Lithographic illumination, Lithography, Semiconducting wafers, Scanners
J. Micro/Nanolith. MEMS MOEMS 4(2), 023006 (1 April 2005) doi:10.1117/1.1897392
TOPICS: Photomasks, Diffraction, Imaging systems, Image acquisition, Electromagnetism, Spiral phase plates, Error analysis, Etching, Photoresist materials, Transmittance
Hidetoshi Nishiyama, Mari Nozoe
J. Micro/Nanolith. MEMS MOEMS 4(2), 023007 (1 April 2005) doi:10.1117/1.1897388
TOPICS: Resistance, Scanning electron microscopy, Electron microscopes, Semiconducting wafers, Electron beams, Inspection, Image processing, Optical simulations, Semiconductors, Silicon
Norihiko Samoto, Akira Yoshida, Hideaki Takano, Akihiro Endo, Toyoji Fukui
J. Micro/Nanolith. MEMS MOEMS 4(2), 023008 (1 April 2005) doi:10.1117/1.1898063
TOPICS: Photomasks, Semiconducting wafers, Charged-particle lithography, Electron beams, Optical alignment, Distortion, Electron beam lithography, Wafer-level optics, Projection lithography, Scanners
Eric Wu, Balu Santhanam, Steven Brueck
J. Micro/Nanolith. MEMS MOEMS 4(2), 023009 (1 April 2005) doi:10.1117/1.1898246
TOPICS: Photomasks, Lithography, Spatial frequencies, Polarization, Interferometry, Optical proximity correction, Resolution enhancement technologies, Image resolution, Image processing, Image quality
Enrique Navarrete-Garcia, Sergio Calixto-Carrera
J. Micro/Nanolith. MEMS MOEMS 4(2), 023010 (1 April 2005) doi:10.1117/1.1897385
TOPICS: Mathematical modeling, Photography, Diffusion, Chemical elements, Microlens, Microlens array, 3D modeling, Absorbance, Halftones, Binary data
J. Micro/Nanolith. MEMS MOEMS 4(2), 023011 (1 April 2005) doi:10.1117/1.1899312
TOPICS: Prototyping, Microactuators, Laser processing, Microfabrication, Fabrication, Micromachining, Chemical elements, Actuators, Control systems, Pulsed laser operation
Jack Luo, J. H. He, Andrew Flewitt, David Moore, S. Mark Spearing, Norman Fleck, William Milne
J. Micro/Nanolith. MEMS MOEMS 4(2), 023012 (1 April 2005) doi:10.1117/1.1898243
TOPICS: Actuators, Nickel, Metals, Plating, Microelectromechanical systems, Temperature metrology, Silicon, Resistance, Thin films, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 4(2), 023013 (1 April 2005) doi:10.1117/1.1898605
TOPICS: Microrings, Resonators, Silicon, Waveguides, Lithography, Polymethylmethacrylate, Chromium, Tunable lasers, Electron beams, Photomasks
Debjyoti Banerjee, Nabil Amro, Sandeep Disawal, Joseph Fragala
J. Micro/Nanolith. MEMS MOEMS 4(2), 023014 (1 April 2005) doi:10.1117/1.1898245
TOPICS: Microfluidics, Scanning probe lithography, Nanolithography, Capillaries, Silicon, Semiconducting wafers, Liquids, Deep reactive ion etching, Reactive ion etching, Satellites
J. Micro/Nanolith. MEMS MOEMS 4(2), 023015 (1 April 2005) doi:10.1117/1.1897381
TOPICS: Microlens, Nickel, Plasma enhanced chemical vapor deposition, Deposition processes, Dielectrics, Photomasks, Sputter deposition, Aspheric lenses, Light emitting diodes, Silicon
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 4(2), 029701 (1 April 2005) doi:10.1117/1.1898604
TOPICS: Polymers, Extreme ultraviolet lithography, Lithography, Optical lithography, Extreme ultraviolet, Photoresist materials, Photomicroscopy, Etching, Resistance, Nanotechnology
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