journal of micro nanolithography mems and moems
VOL. 4 · NO. 3 | July 2005
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 4(3), 030101 (1 April 2005) doi:10.1117/1.1999655
Special Section on Polarization and Hyper-NA Lithography
J. Micro/Nanolith. MEMS MOEMS 4(3), 031101 (1 July 2005) doi:10.1117/1.2044807
J. Micro/Nanolith. MEMS MOEMS 4(3), 031102 (1 July 2005) doi:10.1117/1.2038487
TOPICS: Polarization, Polarimetry, Photomasks, Calibration, Reticles, Phase shifts, Point spread functions, Printing, Immersion lithography, Lithographic illumination
Roger French, Harry Sewell, Min Yang, Sheng Peng, Diane McCafferty, Weiming Qiu, Robert Wheland, Michael Lemon, Louis Markoya, Michael Crawford
J. Micro/Nanolith. MEMS MOEMS 4(3), 031103 (1 July 2005) doi:10.1117/1.2039953
TOPICS: Refractive index, Water, Oscillators, Absorption, Absorbance, Lithography, Immersion lithography, Microfluidics, Microfluidic imaging, Glasses
J. Micro/Nanolith. MEMS MOEMS 4(3), 031104 (1 July 2005) doi:10.1117/1.2039081
TOPICS: Polarization, Reticles, Birefringence, Photoresist materials, Chromium, Photomasks, Lithography, Sodium, Fiber optic illuminators, Imaging systems
J. Micro/Nanolith. MEMS MOEMS 4(3), 031105 (1 July 2005) doi:10.1117/1.2032888
TOPICS: Polarization, Diodes, Charge-coupled devices, Imaging systems, Photodiodes, Imaging arrays, Photomicroscopy, Silicon, Computer aided design, Silica
J. Micro/Nanolith. MEMS MOEMS 4(3), 031106 (1 July 2005) doi:10.1117/1.2038687
TOPICS: Polarization, Immersion lithography, Optical proximity correction, Diffraction, Photomasks, Water, Lithographic illumination, Model-based design, Nanoimprint lithography, Lithography
J. Micro/Nanolith. MEMS MOEMS 4(3), 031107 (1 July 2005) doi:10.1117/1.2037507
TOPICS: Polarization, Polarizers, Refractive index, Binary data, Photomasks, Metals, Chromium, Dielectric polarization, Silicon, Sodium
Michael Totzeck, Paul Gräupner, Tilmann Heil, Aksel Göhnermeier, Olaf Dittmann, Daniel Kraehmer, Vladimir Kamenov, Johannes Ruoff, Donis Flagello
J. Micro/Nanolith. MEMS MOEMS 4(3), 031108 (1 July 2005) doi:10.1117/1.2049187
TOPICS: Polarization, Diffraction, Wavefronts, Imaging systems, Zernike polynomials, Superposition, Jones vectors, Radio propagation, Birefringence, Lithography
Articles
Chao Liu, Mosong Cheng
J. Micro/Nanolith. MEMS MOEMS 4(3), 033001 (1 July 2005) doi:10.1117/1.2037407
TOPICS: Diffusion, Polymers, Chemically amplified resists, Capacitance, Semiconducting wafers, Resistance, Dielectrics, Chemical analysis, Mathematical modeling, Capacitors
J. Micro/Nanolith. MEMS MOEMS 4(3), 033002 (1 July 2005) doi:10.1117/1.2037447
TOPICS: Monte Carlo methods, Line scan image sensors, Spatial resolution, Scanning electron microscopy, Microscopy, Device simulation, Manufacturing, Precision measurement, Computer simulations, Electron microscopes
J. Micro/Nanolith. MEMS MOEMS 4(3), 033003 (1 July 2005) doi:10.1117/1.2037487
TOPICS: Critical dimension metrology, Scanning electron microscopy, Deep ultraviolet, Microscopes, Photomasks, Cadmium, Opacity, Semiconducting wafers, Electron microscopes, Atomic force microscopy
J. Micro/Nanolith. MEMS MOEMS 4(3), 033004 (1 July 2005) doi:10.1117/1.2037427
TOPICS: Liquids, Nitrogen, Diffusion, Immersion lithography, Interfaces, Solids, Spherical lenses, Semiconducting wafers, Protactinium, Molecules
Thanis Tridhavee, Balu Santhanam, Steven Brueck
J. Micro/Nanolith. MEMS MOEMS 4(3), 033005 (1 July 2005) doi:10.1117/1.2008969
TOPICS: Optical proximity correction, Photomasks, Lithography, Image filtering, Binary data, Resolution enhancement technologies, Optimization (mathematics), Spatial frequencies, Nonlinear filtering, Interferometry
Eric Hendrickx, Alberto Colina, Alex van der Hoff, Jo Finders, Geert Vandenberghe
J. Micro/Nanolith. MEMS MOEMS 4(3), 033006 (1 July 2005) doi:10.1117/1.2008229
TOPICS: Reticles, Overlay metrology, Image segmentation, Diffraction, Scanning electron microscopy, Scanners, Semiconducting wafers, Monochromatic aberrations, Metrology, Error analysis
Libor Juha, Michal Bittner, Dagmar Chvostova, Josef Krasa, Michaela Kozlov, Miroslav Pfeifer, Jiri Polan, Ansgar Präg, Bedrich Rus, Michal Stupka, Josef Feldhaus, Vit Letal, Zdenek Otcenasek, Jacek Krzywinski, Robert Nietubye, Jerzy Pelka, Andrzej Andrejczuk, Ryszard Sobierajski, Leszek Ryc, Frederick Boody, Henryk Fiedorowicz, Andrzej Bartnik, Janusz Mikolajczyk, Rafal Rakowski, Pavel Kubát, Ladislav Pína, Martin Horváth, Michael Grisham, Georgiy Vaschenko, Carmen Menoni, Jorge Rocca
J. Micro/Nanolith. MEMS MOEMS 4(3), 033007 (1 July 2005) doi:10.1117/1.2037467
TOPICS: Laser ablation, Polymethylmethacrylate, Extreme ultraviolet, Free electron lasers, Solids, Pulsed laser operation, X-rays, Signal attenuation, Photons, Absorption
Chi Pan, Chia-Lung Chang, Yi-Kun Chen
J. Micro/Nanolith. MEMS MOEMS 4(3), 033008 (1 July 2005) doi:10.1117/1.2040448
TOPICS: Microactuators, Actuators, Silicon, Convection, Fabrication, Doping, 3D modeling, Low pressure chemical vapor deposition, Micromachining
Deng-Huei Hwang, Kan-Ping Chin, Yi-Chung Lo, Wensyang Hsu
J. Micro/Nanolith. MEMS MOEMS 4(3), 033009 (1 July 2005) doi:10.1117/1.2037070
TOPICS: Finite element methods, Structural design, Capacitors, Data modeling, Molecular bridges, Electrodes, Magnesium, Signal detection, Aluminum
Chung-Hsien Lin, Hong-Ren Chen, Weileun Fang
J. Micro/Nanolith. MEMS MOEMS 4(3), 033010 (1 July 2005) doi:10.1117/1.2037387
TOPICS: Resonators, Acoustics, Electrodes, Etching, Aluminum nitride, Electromechanical design, Thin films, Wet etching, Silicon, Inductive coupling
Mojtaba Joodaki, Guenter Kompa, Hartmut Hillmer, Rainer Kassing
J. Micro/Nanolith. MEMS MOEMS 4(3), 033011 (1 July 2005) doi:10.1117/1.2008968
TOPICS: Transistors, Epoxies, Resistance, Gallium arsenide, Gold, Silicon, Reliability, Packaging, Field effect transistors, Electronics
Mark Summers, Barbara Djufors, Michael Brett
J. Micro/Nanolith. MEMS MOEMS 4(3), 033012 (1 July 2005) doi:10.1117/1.2036991
TOPICS: Thin films, Silicon, Fabrication, Thin film deposition, Electron beam lithography, Crystals, Nanostructures, Silicon films, Nanolithography, Thin film growth
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