Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 4 · NO. 1 | January 2005
CONTENTS
Editorial
Special Section on Next Generation Lithography
Articles
J. Micro/Nanolith. MEMS MOEMS 4(1), 013001 (1 January 2005) https://doi.org/10.1117/1.1857529
TOPICS: Photomasks, Transistors, Lithography, Standards development, Resolution enhancement technologies, Field effect transistors, Capacitance, Phase shifts, Image quality standards, Binary data
J. Micro/Nanolith. MEMS MOEMS 4(1), 013002 (1 January 2005) https://doi.org/10.1117/1.1858331
TOPICS: Semiconducting wafers, Liquids, Thermal effects, Microfluidics, Wafer-level optics, Refraction, Computational fluid dynamics, Optical lithography, Microfluidic imaging, Photomasks
J. Micro/Nanolith. MEMS MOEMS 4(1), 013003 (1 January 2005) https://doi.org/10.1117/1.1861852
TOPICS: Interfaces, Polymers, Oxides, Head-mounted displays, Photoresist materials, Silicon, Liquids, Absorption, Polymer thin films, Silicon films
J. Micro/Nanolith. MEMS MOEMS 4(1), 013004 (1 January 2005) https://doi.org/10.1117/1.1858131
TOPICS: Nanoparticles, Polymers, Pellicles, Absorbance, Polymer thin films, Nanocomposites, Particles, Transparency, Lithography, Silica
J. Micro/Nanolith. MEMS MOEMS 4(1), 013005 (1 January 2005) https://doi.org/10.1117/1.1858491
TOPICS: Diffusion, Printing, Photoresist processing, Photoresist materials, Line edge roughness, Lithography, Critical dimension metrology, Cadmium sulfide, Binary data, Photomasks
J. Micro/Nanolith. MEMS MOEMS 4(1), 013006 (1 January 2005) https://doi.org/10.1117/1.1856929
TOPICS: Semiconducting wafers, Photoresist developing, Photoresist materials, Photoresist processing, Semiconductors, Manufacturing, Lithography, Aerosols, Critical dimension metrology, Thin film coatings
J. Micro/Nanolith. MEMS MOEMS 4(1), 013007 (1 January 2005) https://doi.org/10.1117/1.1857534
TOPICS: Electron microscopy, Atomic force microscopy, 3D metrology, Line edge roughness, Reconstruction algorithms, Scanners, Finite element methods, Photoresist processing, Critical dimension metrology, Process control
J. Micro/Nanolith. MEMS MOEMS 4(1), 013008 (1 January 2005) https://doi.org/10.1117/1.1861732
TOPICS: Monte Carlo methods, Error analysis, Phase shifts, Critical dimension metrology, Photomasks, Coherence imaging, Wavefronts, Light sources, Resolution enhancement technologies, Zernike polynomials
J. Micro/Nanolith. MEMS MOEMS 4(1), 013009 (1 January 2005) https://doi.org/10.1117/1.1869132
TOPICS: Copper, Etching, Silicon, Reactive ion etching, Lithography, Electrochemical etching, Photoresist materials, Wet etching, Nanolithography, Microfluidics
J. Micro/Nanolith. MEMS MOEMS 4(1), 013010 (1 January 2005) https://doi.org/10.1117/1.1856928
TOPICS: Etching, Silicon, Aluminum, Reactive ion etching, Oxides, Photoresist materials, Anisotropy, Anisotropic etching, Photomasks, Micromachining
J. Micro/Nanolith. MEMS MOEMS 4(1), 013011 (1 January 2005) https://doi.org/10.1117/1.1857532
TOPICS: Resistance, Thin films, Copper, Electroplating, Inductance, Amplitude modulation, Diodes, Metals, Capacitance, Silicon
J. Micro/Nanolith. MEMS MOEMS 4(1), 013012 (1 January 2005) https://doi.org/10.1117/1.1857551
TOPICS: Microelectromechanical systems, Digital holography, Microscopes, Holograms, Silicon, 3D image reconstruction, Charge-coupled devices, Finite element methods, Wavefronts, Holography
J. Micro/Nanolith. MEMS MOEMS 4(1), 013013 (1 January 2005) https://doi.org/10.1117/1.1861812
TOPICS: Inspection, Liquids, Biomedical optics, Microfluidics, Detection and tracking algorithms, Computer simulations, Digital imaging, Biological research, Scanning electron microscopy, Microfluidic imaging
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 4(1), 019701 (1 January 2005) https://doi.org/10.1117/1.1857533
TOPICS: Silicon, Semiconducting wafers, Diffraction gratings, Crystals, Scanning electron microscopy, Wet etching, Atomic force microscopy, Wafer-level optics, Optical design, Photomasks
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