Editorial
J. Micro/Nanolith. MEMS MOEMS 4(4), 040101 (1 October 2005) https://doi.org/10.1117/1.2062507
SPECIAL SECTION ON MOEMS Design, Technology, and Applications
SPECIAL SECTION ON MOEMS Fiber Optics and Telecom
J. Micro/Nanolith. MEMS MOEMS 4(4), 041301 (1 October 2005) https://doi.org/10.1117/1.2109792
TOPICS: Photonic crystals, Optical filters, Microopto electromechanical systems, Fabry–Perot interferometers, Tunable filters, Fabrication, Refractive index, Dielectrics, Thin films, Wavelength division multiplexing
SPECIAL SECTION ON MOEMSFiber Optics and Telecom
J. Micro/Nanolith. MEMS MOEMS 4(4), 041302 (1 October 2005) https://doi.org/10.1117/1.2114667
TOPICS: Lithium niobate, Thin films, Crystals, Sol-gels, Cladding, Sensors, Microopto electromechanical systems, Photoelasticity, Modulators, Glasses
SPECIAL SECTION ON MOEMS Fiber Optics and Telecom
J. Micro/Nanolith. MEMS MOEMS 4(4), 041303 (1 October 2005) https://doi.org/10.1117/1.2107107
TOPICS: Mirrors, Optical filters, Finite element methods, Electronic filtering, Electromechanical design, Tunable filters, Optical simulations, Optomechanical design, Wavelength division multiplexing
J. Micro/Nanolith. MEMS MOEMS 4(4), 041304 (1 October 2005) https://doi.org/10.1117/1.2120648
TOPICS: Silicon, Electromagnetism, Signal attenuation, Variable optical attenuators, Microopto electromechanical systems, Optical fibers, Semiconducting wafers, Single mode fibers, Polarization, Optical alignment
SPECIAL SECTION ON MOEMS Display and Spectroscopy
J. Micro/Nanolith. MEMS MOEMS 4(4), 041401 (1 October 2005) https://doi.org/10.1117/1.2107687
J. Micro/Nanolith. MEMS MOEMS 4(4), 041402 (1 October 2005) https://doi.org/10.1117/1.2110027
TOPICS: Interferometry, Actuators, Silicon, Plasma enhanced chemical vapor deposition, Ferroelectric materials, Refractive index, Microactuators, Microelectromechanical systems, Motion measurement, Interferometers
J. Micro/Nanolith. MEMS MOEMS 4(4), 041403 (1 October 2005) https://doi.org/10.1117/1.2114767
TOPICS: Spectroscopy, Collimators, Plasma, Prototyping, Particles, Ions, Wind energy, Fabrication, Silicon, Electrodes
SPECIAL SECTION ON MOEMSMicromirrors and Adaptive Optics
J. Micro/Nanolith. MEMS MOEMS 4(4), 041501 (1 October 2005) https://doi.org/10.1117/1.2131824
TOPICS: Mirrors, Micromirrors, Microopto electromechanical systems, Electrodes, Microelectromechanical systems, Silicon, Semiconducting wafers, Aluminum, Photomicroscopy, Spatial light modulators
SPECIAL SECTION ON MOEMS Design, Technology, and Applications Micromirrors and Adaptive Optics
J. Micro/Nanolith. MEMS MOEMS 4(4), 041502 (1 October 2005) https://doi.org/10.1117/1.2107127
TOPICS: Mirrors, 3D scanning, Silicon, Etching, Microopto electromechanical systems, Microscopes, Confocal microscopy, Electrodes, 3D acquisition, Control systems
SPECIAL SECTION ON MOEMSMicromirrors and Adaptive Optics
J. Micro/Nanolith. MEMS MOEMS 4(4), 041503 (1 October 2005) https://doi.org/10.1117/1.2110145
TOPICS: Micromirrors, Adaptive control, Capacitance, Device simulation, Electrodes, Control systems, Microopto electromechanical systems, Mirrors, Surface micromachining, Modulation
SPECIAL SECTION ON MOEMS Micromirrors and Adaptive Optics
J. Micro/Nanolith. MEMS MOEMS 4(4), 041504 (1 October 2005) https://doi.org/10.1117/1.2120487
TOPICS: Adaptive optics, Microelectromechanical systems, Wavefront sensors, Scintillation, Telescopes, Imaging systems, Cameras, Analytical research, Astronomy, Surveillance
SPECIAL SECTION ON MOEMS Microlithography and Processing
J. Micro/Nanolith. MEMS MOEMS 4(4), 041601 (1 October 2005) https://doi.org/10.1117/1.2114647
TOPICS: Lithography, Digital micromirror devices, Photomasks, Microlens array, Photoresist materials, Objectives, Computer generated holography, Micromirrors, Lenses, Optical components
SPECIAL SECTION ON MOEMS Design, Technology, and Applications Microlithography and Processing
J. Micro/Nanolith. MEMS MOEMS 4(4), 041602 (1 October 2005) https://doi.org/10.1117/1.2107427
TOPICS: Microopto electromechanical systems, Microelectromechanical systems, Holography, Switches, Holograms, Oscilloscopes, Silicon, Nickel, Copper, Surface micromachining
SPECIAL SECTION ON MOEMS Microlithography and Processing
J. Micro/Nanolith. MEMS MOEMS 4(4), 041603 (1 October 2005) https://doi.org/10.1117/1.2110226
TOPICS: Photomasks, Binary data, Analog electronics, Optical design, Microlens, Photoresist materials, Micro optics, Diffraction gratings, Semiconducting wafers, Transmittance
SPECIAL SECTION ON MOEMSDevice Packaging
J. Micro/Nanolith. MEMS MOEMS 4(4), 041701 (1 October 2005) https://doi.org/10.1117/1.2121367
TOPICS: Packaging, Semiconducting wafers, Standards development, Electronics, Semiconductors, Sensors, Microopto electromechanical systems, Nanolithography, Molecular nanotechnology, Manufacturing
SPECIAL SECTION ON MOEMS Device Packaging
J. Micro/Nanolith. MEMS MOEMS 4(4), 041702 (1 October 2005) https://doi.org/10.1117/1.2121087
TOPICS: Microopto electromechanical systems, Prototyping, Electrodes, Semiconducting wafers, Microelectromechanical systems, Diffraction gratings, Electromechanical design, Optical fabrication, Gold, Polymers
Articles
J. Micro/Nanolith. MEMS MOEMS 4(4), 043001 (1 October 2005) https://doi.org/10.1117/1.2140247
TOPICS: Printing, Lithography, Photomasks, Electroluminescence, Binary data, Critical dimension metrology, Diffusion, Resolution enhancement technologies, Imaging systems, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 4(4), 043002 (1 October 2005) https://doi.org/10.1117/1.2076727
TOPICS: Stray light, Point spread functions, Critical dimension metrology, Stereolithography, Chromium, Fractal analysis, Light scattering, Lithography, Data modeling, Quantitative analysis
J. Micro/Nanolith. MEMS MOEMS 4(4), 043003 (1 October 2005) https://doi.org/10.1117/1.2137967
TOPICS: Thin films, Wave propagation, Magnetism, Optical lithography, Critical dimension metrology, Interfaces, Scanners, Absorption, Lithography, Multilayers
J. Micro/Nanolith. MEMS MOEMS 4(4), 043004 (1 October 2005) https://doi.org/10.1117/1.2137987
TOPICS: Thin films, Optical lithography, Reflection, Antireflective coatings, Immersion lithography, Refractive index, Critical dimension metrology, Scanners, Reflectivity, Wave propagation
J. Micro/Nanolith. MEMS MOEMS 4(4), 043005 (1 October 2005) https://doi.org/10.1117/1.2075267
TOPICS: Polymers, Aluminum, Silicon, Etching, Profilometers, Reflection, RGB color model, Heat treatments, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 4(4), 043006 (1 October 2005) https://doi.org/10.1117/1.2114787
TOPICS: Gyroscopes, Sensors, Microelectromechanical systems, Microfabrication, Semiconducting wafers, Packaging, Silicon, Deep reactive ion etching, Calibration, Data modeling
J. Micro/Nanolith. MEMS MOEMS 4(4), 043007 (1 October 2005) https://doi.org/10.1117/1.2073767
TOPICS: Scanning electron microscopy, Electron microscopes, Spatial resolution, Electron beams, Semiconducting wafers, Monte Carlo methods, 3D metrology, Silicon, Metrology, Particles
J. Micro/Nanolith. MEMS MOEMS 4(4), 043008 (1 October 2005) https://doi.org/10.1117/1.2117108
TOPICS: Optical lithography, Microelectromechanical systems, Ultraviolet radiation, Silicon, Finite element methods, Semiconducting wafers, Lithium, Scanning electron microscopy, Near ultraviolet, Photomasks
J. Micro/Nanolith. MEMS MOEMS 4(4), 043009 (1 October 2005) https://doi.org/10.1117/1.2131101
TOPICS: Etching, Polymers, Surface roughness, Fluorine, Plasmas, Scanning electron microscopy, Resistance, Oxides, Plasma etching, Chlorine
J. Micro/Nanolith. MEMS MOEMS 4(4), 043010 (1 October 2005) https://doi.org/10.1117/1.2136867
TOPICS: Molecules, Stochastic processes, Diffusion, Particles, Computer simulations, Line edge roughness, Printing, Process modeling, Solids, Computing systems
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 4(4), 049701 (1 October 2005) https://doi.org/10.1117/1.2131829
TOPICS: Lithography, Gold, Molecular self-assembly, Semiconducting wafers, Multilayers, Metals, Nanolithography, Molecular assembly, Image processing, Molecules
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