Editorial
J. Micro/Nanolith. MEMS MOEMS 4(4), 040101 (1 October 2005) https://doi.org/10.1117/1.2062507
SPECIAL SECTION ON MOEMS Design, Technology, and Applications
SPECIAL SECTION ON MOEMS Fiber Optics and Telecom
Huibing Mao, Weiping Jing
J. Micro/Nanolith. MEMS MOEMS 4(4), 041301 (1 October 2005) https://doi.org/10.1117/1.2109792
TOPICS: Photonic crystals, Optical filters, Microopto electromechanical systems, Fabry–Perot interferometers, Tunable filters, Fabrication, Refractive index, Dielectrics, Thin films, Wavelength division multiplexing
SPECIAL SECTION ON MOEMSFiber Optics and Telecom
J. Micro/Nanolith. MEMS MOEMS 4(4), 041302 (1 October 2005) https://doi.org/10.1117/1.2114667
TOPICS: Lithium niobate, Thin films, Crystals, Sol-gels, Cladding, Sensors, Microopto electromechanical systems, Photoelasticity, Modulators, Glasses
SPECIAL SECTION ON MOEMS Fiber Optics and Telecom
J. Micro/Nanolith. MEMS MOEMS 4(4), 041303 (1 October 2005) https://doi.org/10.1117/1.2107107
TOPICS: Mirrors, Optical filters, Finite element methods, Electronic filtering, Electromechanical design, Tunable filters, Optical simulations, Optomechanical design, Wavelength division multiplexing
Xuhan Dai, Xiaolin Zhao, Guifu Ding, Bingchu Cai
J. Micro/Nanolith. MEMS MOEMS 4(4), 041304 (1 October 2005) https://doi.org/10.1117/1.2120648
TOPICS: Silicon, Electromagnetism, Signal attenuation, Variable optical attenuators, Microopto electromechanical systems, Optical fibers, Semiconducting wafers, Single mode fibers, Polarization, Optical alignment
SPECIAL SECTION ON MOEMS Display and Spectroscopy
J. Micro/Nanolith. MEMS MOEMS 4(4), 041401 (1 October 2005) https://doi.org/10.1117/1.2107687
J. Micro/Nanolith. MEMS MOEMS 4(4), 041402 (1 October 2005) https://doi.org/10.1117/1.2110027
TOPICS: Interferometry, Actuators, Silicon, Plasma enhanced chemical vapor deposition, Ferroelectric materials, Refractive index, Microactuators, Microelectromechanical systems, Motion measurement, Interferometers
J. Micro/Nanolith. MEMS MOEMS 4(4), 041403 (1 October 2005) https://doi.org/10.1117/1.2114767
TOPICS: Spectroscopy, Collimators, Plasma, Prototyping, Particles, Ions, Wind energy, Fabrication, Silicon, Electrodes
SPECIAL SECTION ON MOEMSMicromirrors and Adaptive Optics
J. Micro/Nanolith. MEMS MOEMS 4(4), 041501 (1 October 2005) https://doi.org/10.1117/1.2131824
TOPICS: Mirrors, Micromirrors, Microopto electromechanical systems, Electrodes, Microelectromechanical systems, Silicon, Semiconducting wafers, Aluminum, Photomicroscopy, Spatial light modulators
SPECIAL SECTION ON MOEMS Design, Technology, and Applications Micromirrors and Adaptive Optics
J. Micro/Nanolith. MEMS MOEMS 4(4), 041502 (1 October 2005) https://doi.org/10.1117/1.2107127
TOPICS: Mirrors, 3D scanning, Silicon, Etching, Microopto electromechanical systems, Microscopes, Confocal microscopy, Electrodes, 3D acquisition, Control systems
SPECIAL SECTION ON MOEMSMicromirrors and Adaptive Optics
Ke-Min Liao, Yi-Chih Wang, Chih-Hsien Yeh, Rongshun Chen
J. Micro/Nanolith. MEMS MOEMS 4(4), 041503 (1 October 2005) https://doi.org/10.1117/1.2110145
TOPICS: Micromirrors, Adaptive control, Capacitance, Device simulation, Electrodes, Control systems, Microopto electromechanical systems, Mirrors, Surface micromachining, Modulation
SPECIAL SECTION ON MOEMS Micromirrors and Adaptive Optics
J. Micro/Nanolith. MEMS MOEMS 4(4), 041504 (1 October 2005) https://doi.org/10.1117/1.2120487
TOPICS: Adaptive optics, Microelectromechanical systems, Wavefront sensors, Scintillation, Telescopes, Imaging systems, Cameras, Analytical research, Astronomy, Surveillance
SPECIAL SECTION ON MOEMS Microlithography and Processing
Lars Erdmann, Arnaud Deparnay, Gunter Maschke, Mario Längle, Robert Brunner
J. Micro/Nanolith. MEMS MOEMS 4(4), 041601 (1 October 2005) https://doi.org/10.1117/1.2114647
TOPICS: Lithography, Digital micromirror devices, Photomasks, Microlens array, Photoresist materials, Objectives, Computer generated holography, Micromirrors, Lenses, Optical components
SPECIAL SECTION ON MOEMS Design, Technology, and Applications Microlithography and Processing
Vytautas Ostasevicius, Sigitas Tamulevicius, Arvydas Palevicius, Minvydas Ragulskis, Viktoras Grigaliunas, Virgilijus Minialga
J. Micro/Nanolith. MEMS MOEMS 4(4), 041602 (1 October 2005) https://doi.org/10.1117/1.2107427
TOPICS: Microopto electromechanical systems, Microelectromechanical systems, Holography, Switches, Holograms, Oscilloscopes, Silicon, Nickel, Copper, Surface micromachining
SPECIAL SECTION ON MOEMS Microlithography and Processing
J. Micro/Nanolith. MEMS MOEMS 4(4), 041603 (1 October 2005) https://doi.org/10.1117/1.2110226
TOPICS: Photomasks, Binary data, Analog electronics, Optical design, Microlens, Photoresist materials, Micro optics, Diffraction gratings, Semiconducting wafers, Transmittance
SPECIAL SECTION ON MOEMSDevice Packaging
Henne van Heeren, Ayman El-Fatatry, Lia Paschalidou, Patric Salomon
J. Micro/Nanolith. MEMS MOEMS 4(4), 041701 (1 October 2005) https://doi.org/10.1117/1.2121367
TOPICS: Packaging, Semiconducting wafers, Standards development, Electronics, Semiconductors, Sensors, Microopto electromechanical systems, Nanolithography, Molecular nanotechnology, Manufacturing
SPECIAL SECTION ON MOEMS Device Packaging
J. Micro/Nanolith. MEMS MOEMS 4(4), 041702 (1 October 2005) https://doi.org/10.1117/1.2121087
TOPICS: Microopto electromechanical systems, Prototyping, Electrodes, Semiconducting wafers, Microelectromechanical systems, Diffraction gratings, Electromechanical design, Optical fabrication, Gold, Polymers
Articles
Lex Straaijer
J. Micro/Nanolith. MEMS MOEMS 4(4), 043001 (1 October 2005) https://doi.org/10.1117/1.2140247
TOPICS: Printing, Lithography, Photomasks, Electroluminescence, Binary data, Critical dimension metrology, Diffusion, Resolution enhancement technologies, Imaging systems, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 4(4), 043002 (1 October 2005) https://doi.org/10.1117/1.2076727
TOPICS: Stray light, Point spread functions, Critical dimension metrology, Stereolithography, Chromium, Fractal analysis, Light scattering, Lithography, Data modeling, Quantitative analysis
J. Micro/Nanolith. MEMS MOEMS 4(4), 043003 (1 October 2005) https://doi.org/10.1117/1.2137967
TOPICS: Thin films, Wave propagation, Magnetism, Optical lithography, Critical dimension metrology, Interfaces, Scanners, Absorption, Lithography, Multilayers
J. Micro/Nanolith. MEMS MOEMS 4(4), 043004 (1 October 2005) https://doi.org/10.1117/1.2137987
TOPICS: Thin films, Optical lithography, Reflection, Antireflective coatings, Immersion lithography, Refractive index, Critical dimension metrology, Scanners, Reflectivity, Wave propagation
Kevin Campbell, Jacey Morine, Zachary George, Craig Lusk, Larry Howell, Stephen Schultz, Aaron Hawkins
J. Micro/Nanolith. MEMS MOEMS 4(4), 043005 (1 October 2005) https://doi.org/10.1117/1.2075267
TOPICS: Polymers, Aluminum, Silicon, Etching, Profilometers, Reflection, RGB color model, Heat treatments, Microelectromechanical systems
Tracy Hudson, Sherrie Holt, Paul Ruffin, Michael Kranz, James McKee, Michael Whitley, Milan Buncick, Eric Tuck
J. Micro/Nanolith. MEMS MOEMS 4(4), 043006 (1 October 2005) https://doi.org/10.1117/1.2114787
TOPICS: Gyroscopes, Sensors, Microelectromechanical systems, Microfabrication, Semiconducting wafers, Packaging, Silicon, Deep reactive ion etching, Calibration, Data modeling
Miyako Matsui, Syuntaro Machida, Hideo Todokoro, Tadashi Otaka, Aritoshi Sugimoto
J. Micro/Nanolith. MEMS MOEMS 4(4), 043007 (1 October 2005) https://doi.org/10.1117/1.2073767
TOPICS: Scanning electron microscopy, Electron microscopes, Spatial resolution, Electron beams, Semiconducting wafers, Monte Carlo methods, 3D metrology, Silicon, Metrology, Particles
Bo Li, Miao Liu, Quanfang Chen
J. Micro/Nanolith. MEMS MOEMS 4(4), 043008 (1 October 2005) https://doi.org/10.1117/1.2117108
TOPICS: Optical lithography, Microelectromechanical systems, Ultraviolet radiation, Silicon, Finite element methods, Semiconducting wafers, Lithium, Scanning electron microscopy, Near ultraviolet, Photomasks
Christoph Hohle, Nicole Heckmann, Michael Sebald, Matthias Markert, Nickolay Stepanenko, Francis Houlihan, Andrew Romano, Raj Sakamuri, David Rentkiewicz, Ralph Dammel
J. Micro/Nanolith. MEMS MOEMS 4(4), 043009 (1 October 2005) https://doi.org/10.1117/1.2131101
TOPICS: Etching, Polymers, Surface roughness, Fluorine, Plasmas, Scanning electron microscopy, Resistance, Oxides, Plasma etching, Chlorine
Thomas Mülders, Wolfgang Henke, Klaus Elian, Christoph Nölscher, Michael Sebald
J. Micro/Nanolith. MEMS MOEMS 4(4), 043010 (1 October 2005) https://doi.org/10.1117/1.2136867
TOPICS: Molecules, Stochastic processes, Diffusion, Particles, Computer simulations, Line edge roughness, Printing, Process modeling, Solids, Computing systems
COMMUNICATIONS
Shyamala Subramanian, Gregory McCarty, Jeffrey Catchmark
J. Micro/Nanolith. MEMS MOEMS 4(4), 049701 (1 October 2005) https://doi.org/10.1117/1.2131829
TOPICS: Lithography, Gold, Molecular self-assembly, Semiconducting wafers, Multilayers, Metals, Nanolithography, Molecular assembly, Image processing, Molecules
Back to Top