journal of micro nanolithography mems and moems
VOL. 5 · NO. 1 | January 2006

Editorial (1)
Articles (8)
Special Section on Nanopatterning
Kees Eijkel, Glenn Kubiak, Marion Scott, Volker Saile, Steven Walsh, Jill Hruby
J. Micro/Nanolith. MEMS MOEMS 5(1), 011001 (1 January 2006)
Yifang Chen, Jiarui Tao, Xing-Zhong Zhao, Zheng Cui
J. Micro/Nanolith. MEMS MOEMS 5(1), 011002 (1 January 2006)
TOPICS: Nanoimprint lithography, Silicon, Gallium arsenide, Polymethylmethacrylate, Lithography, Etching, Electron beam lithography, Scanning electron microscopy, Distortion, Dry etching
Chien-Hung Lin, Rongshun Chen
J. Micro/Nanolith. MEMS MOEMS 5(1), 011003 (1 January 2006)
TOPICS: Ultrasonics, Polymers, Nanoimprint lithography, Polymer thin films, Transducers, Lithography, Nanostructures, Silicon, Atomic force microscopy, Energy efficiency
H. Hocheng, C. C. Nien
J. Micro/Nanolith. MEMS MOEMS 5(1), 011004 (1 January 2006)
TOPICS: Polymers, Polymethylmethacrylate, Nanoimprint lithography, Finite element methods, Numerical analysis, Glasses, Polymer thin films, Lithography, Process modeling, Thin films
M. Worgull, Mathias Heckele, J. Hétu, K. Kabanemi
J. Micro/Nanolith. MEMS MOEMS 5(1), 011005 (1 January 2006)
TOPICS: Polymers, Optimization (mathematics), Temperature metrology, Polymethylmethacrylate, Interfaces, Manufacturing, Glasses, Nanolithography, Nanostructures, Materials processing
Takashi Nagase, Kenji Gamo, Rieko Ueda, Tohru Kubota, Shinro Mashiko
J. Micro/Nanolith. MEMS MOEMS 5(1), 011006 (1 January 2006)
TOPICS: Etching, Electrodes, Nanolithography, Gold, Thin films, Resistance, Scanning electron microscopy, Molecules, Ion beams, Nanowires
Frederic Perennes, B. Marmirolli, Massimo Tormen, Maurizio Matteucci, Enzo Di Fabrizio
J. Micro/Nanolith. MEMS MOEMS 5(1), 011007 (1 January 2006)
TOPICS: Polymethylmethacrylate, X-ray lithography, Polymers, Liquids, Photomasks, Solids, Electroplating, Silicon, Nanofabrication, Microelectromechanical systems
Suwaree Suraprapapich, Songphol Kanjanachuchai, Supachok Thainoi, Somsak Panyakeow
J. Micro/Nanolith. MEMS MOEMS 5(1), 011008 (1 January 2006)
TOPICS: Indium arsenide, Quantum dots, Gallium arsenide, Annealing, Atomic force microscopy, Semiconductors, Molecular beam epitaxy, Molecules, Crystals, Molecular self-assembly
Arvind Battula, Senthil Theppakuttai, Shaochen Chen
J. Micro/Nanolith. MEMS MOEMS 5(1), 011009 (1 January 2006)
TOPICS: Silicon carbide, Optical spheres, Nanostructures, Silica, Scanning electron microscopy, Laser ablation, Near field optics, Lithography, Etching, Femtosecond phenomena
Helmut Schift, Sandro Bellini, Uwe Pieles, Jens Gobrecht
J. Micro/Nanolith. MEMS MOEMS 5(1), 011010 (1 January 2006)
TOPICS: Polymers, Nanoimprint lithography, Nanolithography, Etching, Photomicroscopy, Microfluidics, Silicon, Scanning electron microscopy, Nanotechnology, Applied sciences
Jacques Giérak, Eric Bourhis, A. Madouri, Martin Strassner, Isabelle Sagnes, Sophie Bouchoule, M. N. Merat Combes, D. Mailly, Peter Hawkes, Ralf Jede, L. Bardotti, Brigitte Prevel, A. Hannour, P. Melinon, Annie Perez, Jacques Ferre, J. Jamet, A. Mougin, Claude Chappert, V. Mathet
J. Micro/Nanolith. MEMS MOEMS 5(1), 011011 (1 January 2006)
TOPICS: Ions, Optical lithography, Ion beams, Magnetism, Silicon carbide, Gallium, Nanofabrication, Silicon, Nanostructures, Platinum
Cees van Rijn
J. Micro/Nanolith. MEMS MOEMS 5(1), 011012 (1 January 2006)
TOPICS: Lithography, Silicon, Chromium, Nanostructures, Scanning electron microscopy, Mirrors, Photomasks, Photomicroscopy, Etching, Photoresist materials
S. Curran, J. Dewald, D. Carroll
J. Micro/Nanolith. MEMS MOEMS 5(1), 011013 (1 January 2006)
TOPICS: Near field optics, Fullerenes, Composites, Near field scanning optical microscopy, Optical storage, Near field, Integrated optics, Polymers, Optical computing, Optical signal processing
Kees Eijkel, Jill Hruby, Glenn Kubiak, Marion Scott, J. Brokaw, Volker Saile, Steven Walsh, Craig White, Daniel Walsh
J. Micro/Nanolith. MEMS MOEMS 5(1), 011014 (1 January 2006)
TOPICS: Patents, Nanotechnology, Microsystems, Nanostructures, Nanolithography, Microfabrication, Semiconductors, Electrodes, Manufacturing, Microelectromechanical systems
Ronald Jones, Christopher Soles, Eric Lin, Wenchuang Hu, Ronald Reano, Stella Pang, Steven Weigand, Denis Keane, John Quintana
J. Micro/Nanolith. MEMS MOEMS 5(1), 013001 (1 January 2006)
TOPICS: Nanoimprint lithography, Data modeling, Polymers, Polymethylmethacrylate, X-rays, Scattering, Scanning electron microscopy, Diffraction, Picosecond phenomena, Silicon
De-Qiang Wang, Leifeng Cao, Changqing Xie, Ming Liu, Tianchun Ye
J. Micro/Nanolith. MEMS MOEMS 5(1), 013002 (1 January 2006)
TOPICS: Electron beam lithography, X-ray lithography, Photomasks, Gold, Nickel, X-rays, Scanning electron microscopy, Lithography, Silicon, Zone plates
Qin Zhou, Ying Dong, Dong Zhe, You Zheng
J. Micro/Nanolith. MEMS MOEMS 5(1), 013003 (1 January 2006)
TOPICS: Sensors, Actuators, Resistors, Resistance, Electrodes, Capacitors, Capacitance, Systems modeling, Environmental sensing, Electronic filtering
Sigitas Tamulevicius, Asta Guobiene, Giedrius Janusas, Arvydas Palevicius, Vytautas Ostasevicius, Mindaugas Andrulevicius
J. Micro/Nanolith. MEMS MOEMS 5(1), 013004 (1 January 2006)
TOPICS: Diffraction gratings, Diffraction, Polymers, Silicon, Ultraviolet radiation, Nickel, Atomic force microscopy, Diffractive optical elements, Polymethylmethacrylate, Modulation
Peter Dirksen, Joseph Braat, Augustus Janssen
J. Micro/Nanolith. MEMS MOEMS 5(1), 013005 (1 January 2006)
TOPICS: Diffusion, Optical lithography, Mathematical modeling, Monochromatic aberrations, Point spread functions, Image processing, Convolution, Stochastic processes, Photoresist processing, Solids
SangMan Bae, Moon-Hee Lee
J. Micro/Nanolith. MEMS MOEMS 5(1), 013006 (1 January 2006)
TOPICS: Optical alignment, Semiconducting wafers, Chemical mechanical planarization, Signal detection, Signal processing, Lithography, Photomasks, Polishing, Laser marking, Metrology
Gregory Nellis, Mohamed El-Morsi, Chris Van Peski, Andrew Grenville
J. Micro/Nanolith. MEMS MOEMS 5(1), 013007 (1 January 2006)
TOPICS: Contamination, Semiconducting wafers, Immersion lithography, Diffusion, Microfluidics, Absorption, Liquids, Water, Transmittance, Photoresist processing
J. Micro/Nanolith. MEMS MOEMS 5(1), 013008 (1 January 2006)
TOPICS: Semiconducting wafers, Immersion lithography, Liquids, Quartz, Image processing, Microfluidics, Cameras, Glasses, Fluid dynamics, Calcium
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