Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 5 · NO. 2 | April 2006
CONTENTS
Editorial
Special Section on Bio-MEMS and Microfluidics
J. Micro/Nanolith. MEMS MOEMS 5(2), 021102 (1 April 2006) https://doi.org/10.1117/1.2200674
TOPICS: Ultraviolet radiation, Fourier transforms, Microfabrication, Microfluidics, Silicon, Biosensors, Wafer bonding, Semiconducting wafers, Roads, Polymers
J. Micro/Nanolith. MEMS MOEMS 5(2), 021103 (1 April 2006) https://doi.org/10.1117/1.2198794
TOPICS: Silicon, Polymers, Polymethylmethacrylate, Rapid manufacturing, Semiconductor lasers, Microfabrication, Femtosecond laser micromachining, Glasses, Microfluidics, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 5(2), 021105 (1 April 2006) https://doi.org/10.1117/1.2203666
TOPICS: Waveguides, Sensors, Glucose, Packaging, Microfluidics, Diffusion, Oxygen, Instrument modeling, Luminescence, Fabrication
J. Micro/Nanolith. MEMS MOEMS 5(2), 021106 (1 April 2006) https://doi.org/10.1117/1.2198839
J. Micro/Nanolith. MEMS MOEMS 5(2), 021107 (1 April 2006) https://doi.org/10.1117/1.2200887
TOPICS: Zinc oxide, Actuators, Semiconducting wafers, Ultrasonics, Scanning probe microscopy, Etching, Electrodes, Oxides, Imaging systems, Silicon
Articles
J. Micro/Nanolith. MEMS MOEMS 5(2), 023001 (1 April 2006) https://doi.org/10.1117/1.2200675
TOPICS: Line edge roughness, Polymers, Diffusion, Data modeling, Optical lithography, Image quality, Systems modeling, Photoresist materials, Chemical analysis, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 5(2), 023003 (1 April 2006) https://doi.org/10.1117/1.2198853
TOPICS: Photomasks, Extreme ultraviolet lithography, Multilayers, Coating, Particles, Reflectivity, Silicon, Ions, Ion beams, Quartz
J. Micro/Nanolith. MEMS MOEMS 5(2), 023004 (1 April 2006) https://doi.org/10.1117/1.2201027
TOPICS: Ruthenium, Silicon, Molybdenum, Extreme ultraviolet lithography, Reflectivity, Electrons, Oxides, Resistance, Transmission electron microscopy, Oxidation
J. Micro/Nanolith. MEMS MOEMS 5(2), 023005 (1 April 2006) https://doi.org/10.1117/1.2201017
TOPICS: Chemical species, Lithography, Rubidium, Collimation, Interferometry, Interferometers, Lenses, Optical simulations, Mirrors, Optical arrays
J. Micro/Nanolith. MEMS MOEMS 5(2), 023006 (1 April 2006) https://doi.org/10.1117/1.2202641
TOPICS: Scanning electron microscopy, Lithographic illumination, Semiconducting wafers, Photomasks, Edge detection, Image processing, Metrology, Diffusion, Denoising, Binary data
J. Micro/Nanolith. MEMS MOEMS 5(2), 023007 (1 April 2006) https://doi.org/10.1117/1.2198841
TOPICS: Etching, Silicon, Resistance, Reflectivity, Chemical vapor deposition, Photomasks, Lithography, X-rays, Glasses, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 5(2), 023008 (1 April 2006) https://doi.org/10.1117/1.2198532
TOPICS: Actuators, Semiconducting wafers, 3D modeling, Instrument modeling, Optical simulations, Etching, Sensors, Magnetism, Performance modeling, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 5(2), 023009 (1 April 2006) https://doi.org/10.1117/1.2203366
TOPICS: Micromirrors, Waveguides, Silicon, Integrated optics, Semiconducting wafers, Mirrors, Photomasks, Sensors, Packaging, Etching
J. Micro/Nanolith. MEMS MOEMS 5(2), 023010 (1 April 2006) https://doi.org/10.1117/1.2201038
TOPICS: Laser cutting, Modulation, Acousto-optics, Nd:YAG lasers, Micromachining, Modulators, Scanning electron microscopy, Laser processing, Photomicroscopy, Biomedical optics
J. Micro/Nanolith. MEMS MOEMS 5(2), 023011 (1 April 2006) https://doi.org/10.1117/1.2198815
TOPICS: Silicon, Waveguides, Antireflective coatings, Semiconducting wafers, Coating, Reflection, Refractive index, Reactive ion etching, Etching, Silicon films
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