journal of micro nanolithography mems and moems
VOL. 5 · NO. 2 | April 2006
CONTENTS
Editorial
Special Section on Bio-MEMS and Microfluidics
J. Micro/Nanolith. MEMS MOEMS 5(2), 021102 (1 April 2006) https://doi.org/10.1117/1.2200674
TOPICS: Ultraviolet radiation, Fourier transforms, Microfabrication, Microfluidics, Silicon, Biosensors, Wafer bonding, Semiconducting wafers, Roads, Polymers
Sunil Belligundu, Panayiotis Shiakolas
J. Micro/Nanolith. MEMS MOEMS 5(2), 021103 (1 April 2006) https://doi.org/10.1117/1.2198794
TOPICS: Silicon, Polymers, Polymethylmethacrylate, Rapid manufacturing, Semiconductor lasers, Microfabrication, Femtosecond laser micromachining, Glasses, Microfluidics, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 5(2), 021105 (1 April 2006) https://doi.org/10.1117/1.2203666
TOPICS: Waveguides, Sensors, Glucose, Packaging, Microfluidics, Diffusion, Oxygen, Instrument modeling, Luminescence, Fabrication
J. Micro/Nanolith. MEMS MOEMS 5(2), 021106 (1 April 2006) https://doi.org/10.1117/1.2198839
Stephen Olson, Balasubramanian Sankaran, Bruce Altemus, Robert Geer, James Castracane, Bai Xu
J. Micro/Nanolith. MEMS MOEMS 5(2), 021107 (1 April 2006) https://doi.org/10.1117/1.2200887
TOPICS: Zinc oxide, Actuators, Semiconducting wafers, Ultrasonics, Scanning probe microscopy, Etching, Electrodes, Oxides, Imaging systems, Silicon
Articles
J. Micro/Nanolith. MEMS MOEMS 5(2), 023001 (1 April 2006) https://doi.org/10.1117/1.2200675
TOPICS: Line edge roughness, Polymers, Diffusion, Data modeling, Optical lithography, Image quality, Systems modeling, Photoresist materials, Chemical analysis, Scanning electron microscopy
Scott Schuetter, Timothy Shedd, Keith Doxtator, Gregory Nellis, Chris Van Peski, Andrew Grenville, Shang-Ho Lin, Dah-Chung Owe-Yang
J. Micro/Nanolith. MEMS MOEMS 5(2), 023002 (1 April 2006) https://doi.org/10.1117/1.2198540
J. Micro/Nanolith. MEMS MOEMS 5(2), 023003 (1 April 2006) https://doi.org/10.1117/1.2198853
TOPICS: Photomasks, Extreme ultraviolet lithography, Multilayers, Coating, Particles, Reflectivity, Silicon, Ions, Ion beams, Quartz
Sasa Bajt, Zu Rong Dai, Erik Nelson, Mark Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey Robinson, John Taylor, Andrew Aquila, Nora Edwards
J. Micro/Nanolith. MEMS MOEMS 5(2), 023004 (1 April 2006) https://doi.org/10.1117/1.2201027
TOPICS: Ruthenium, Silicon, Molybdenum, Extreme ultraviolet lithography, Reflectivity, Electrons, Oxides, Resistance, Transmission electron microscopy, Oxidation
J. Micro/Nanolith. MEMS MOEMS 5(2), 023005 (1 April 2006) https://doi.org/10.1117/1.2201017
TOPICS: Chemical species, Lithography, Rubidium, Collimation, Interferometry, Interferometers, Lenses, Optical simulations, Mirrors, Optical arrays
J. Micro/Nanolith. MEMS MOEMS 5(2), 023006 (1 April 2006) https://doi.org/10.1117/1.2202641
TOPICS: Scanning electron microscopy, Lithographic illumination, Semiconducting wafers, Photomasks, Edge detection, Image processing, Metrology, Diffusion, Denoising, Binary data
Yasuhiko Sato, Junko Abe
J. Micro/Nanolith. MEMS MOEMS 5(2), 023007 (1 April 2006) https://doi.org/10.1117/1.2198841
TOPICS: Etching, Silicon, Resistance, Reflectivity, Chemical vapor deposition, Photomasks, Lithography, X-rays, Glasses, Reactive ion etching
Jer-Liang Yeh, Jing-Yi Huang, Chi-Nan Chen, Chung-Yuen Hui
J. Micro/Nanolith. MEMS MOEMS 5(2), 023008 (1 April 2006) https://doi.org/10.1117/1.2198532
TOPICS: Actuators, Semiconducting wafers, 3D modeling, Instrument modeling, Optical simulations, Etching, Sensors, Magnetism, Performance modeling, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 5(2), 023009 (1 April 2006) https://doi.org/10.1117/1.2203366
TOPICS: Micromirrors, Waveguides, Silicon, Integrated optics, Semiconducting wafers, Mirrors, Photomasks, Sensors, Packaging, Etching
S. Sudheer, V. P. Mahadevan Pillai, V. Unnikrishnan Nayar, Yavar Pothiawala, Devesh Kothwala, Dhiraj Kotadia
J. Micro/Nanolith. MEMS MOEMS 5(2), 023010 (1 April 2006) https://doi.org/10.1117/1.2201038
TOPICS: Laser cutting, Modulation, Acousto-optics, Nd:YAG lasers, Micromachining, Modulators, Scanning electron microscopy, Laser processing, Photomicroscopy, Biomedical optics
J. Micro/Nanolith. MEMS MOEMS 5(2), 023011 (1 April 2006) https://doi.org/10.1117/1.2198815
TOPICS: Silicon, Waveguides, Antireflective coatings, Semiconducting wafers, Coating, Reflection, Refractive index, Reactive ion etching, Etching, Silicon films
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