journal of micro nanolithography mems and moems
VOL. 5 · NO. 4 | October 2006

Editorial (1)
Articles (11)
J. Micro/Nanolith. MEMS MOEMS 5(4), 040101 (1 October 2006) doi:10.1117/1.2426331
J. Micro/Nanolith. MEMS MOEMS 5(4), 043001 (1 October 2006) doi:10.1117/1.2397065
TOPICS: Polarization, Photomasks, Transmittance, Chromium, Phase shifts, Lithography, Lithographic illumination, Immersion lithography, Semiconducting wafers, Finite-difference time-domain method
J. Micro/Nanolith. MEMS MOEMS 5(4), 043002 (1 October 2006) doi:10.1117/1.2399537
TOPICS: Photomasks, Lithography, Source mask optimization, Convolution, Inverse problems, Optical lithography, Semiconducting wafers, Computer programming, Optical proximity correction, Optimization (mathematics)
J. Micro/Nanolith. MEMS MOEMS 5(4), 043003 (1 October 2006) doi:10.1117/1.2396926
TOPICS: Lithography, Optical proximity correction, Critical dimension metrology, Excimer lasers, Optical simulations, Colorimetry, Image processing, Semiconducting wafers, Photoresist processing, Imaging systems
Tokuyuki Honda, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Minoru Yoshii
J. Micro/Nanolith. MEMS MOEMS 5(4), 043004 (1 October 2006) doi:10.1117/1.2397018
TOPICS: Diffusion, Interferometry, Modulation transfer functions, Immersion lithography, Semiconducting wafers, Refractive index, Extreme ultraviolet lithography, Microfluidic imaging, Microfluidics, Lithography
J. Micro/Nanolith. MEMS MOEMS 5(4), 043005 (1 October 2006) doi:10.1117/1.2399525
TOPICS: Semiconducting wafers, Photoresist materials, Scanning electron microscopy, Critical dimension metrology, Chemistry, Electron microscopes, Lead, Molecules, Process control, Printing
J. Micro/Nanolith. MEMS MOEMS 5(4), 043006 (1 October 2006) doi:10.1117/1.2397034
TOPICS: Scanning electron microscopy, Scatterometry, Metrology, Critical dimension metrology, Monte Carlo methods, Inspection, Stereolithography, Manufacturing, Time metrology, Optical proximity correction
Robert Boye, Shanalyn Kemme, Joel Wendt, Alvaro Cruz-Cabrera, Gregory Vawter, Charles Alford, Tony Carter, Sally Samora
J. Micro/Nanolith. MEMS MOEMS 5(4), 043007 (1 October 2006) doi:10.1117/1.2397081
TOPICS: Wave plates, Optical design, Etching, Polarization, Gallium arsenide, Birefringence, Polarimetry, Phase measurement, Polarizers, Metals
Theodore Fedynyshyn, Roger Sinta, David Astolfi, Russell Goodman, Alberto Cabral, Jeanette Roberts, Robert Meagley
J. Micro/Nanolith. MEMS MOEMS 5(4), 043010 (1 October 2006) doi:10.1117/1.2408410
TOPICS: Polymers, Surface roughness, Polymer thin films, Line edge roughness, Line width roughness, Photoresist processing, Profiling, Atomic force microscopy, Semiconducting wafers, Lithography
J. Micro/Nanolith. MEMS MOEMS 5(4), 043011 (1 October 2006) doi:10.1117/1.2401388
TOPICS: Microelectromechanical systems, LCDs, Optical components, Light sources, Thin films, Reflectivity, Silicon, Prisms, Aluminum, Polymethylmethacrylate
J. Micro/Nanolith. MEMS MOEMS 5(4), 043012 (1 October 2006) doi:10.1117/1.2397045
TOPICS: Waveguides, Modulation, Microopto electromechanical systems, Sensors, Electronics, Polarization, Sun, Mathematical modeling, Mechanical sensors, Microelectromechanical systems
Ampere Tseng, Jong-Seung Park
J. Micro/Nanolith. MEMS MOEMS 5(4), 043013 (1 October 2006) doi:10.1117/1.2397088
TOPICS: Silicon, Surface roughness, Semiconducting wafers, Glasses, Interfaces, Wafer bonding, Diffusion, Laser bonding, Surface finishing, Silicon carbide
Shyamala Subramanian, Jeffrey Catchmark
J. Micro/Nanolith. MEMS MOEMS 5(4), 049701 (1 October 2006) doi:10.1117/1.2401140
TOPICS: Lithography, Gold, Nanolithography, Metals, Molecular self-assembly, Electron beam lithography, Molecular assembly, Semiconducting wafers, Copper, Multilayers
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