Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology

Masafumi Asano; Takahiro Ikeda; Toru Koike; Hideaki Abe

doi:10.1117/1.2397034

1 October 2006 Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology

Masafumi Asano, Takahiro Ikeda, Toru Koike, Hideaki Abe

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 5, Issue 4, 043006 (October 2006). https://doi.org/10.1117/1.2397034

Abstract

Measurement characteristics in scatterometry and critical dimension–scanning electron microscopy (CD-SEM) for lot acceptance sampling of inline CD metrology were investigated by using a statistical approach with Monte Carlo simulation. By operation characteristics curve analysis, producer's risk and consumer's risk arising from sampling were clarified. Single use of scatterometry involves a higher risk, such risk being particularly acute in the case of large intrachip CD variation because it is unable to sufficiently monitor intrachip CD variation including local CD error. Substituting scatterometry for conventional SEM metrology is accompanied with risks, resulting in the increase of unnecessary cost. The combined use of scatterometry and SEM metrology in which the sampling plan for SEM is controlled by scatterometry is a promising metrology from the viewpoint of the suppression of risks and cost. This is due to the effect that CD errors existing in the distribution tails are efficiently caught.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Masafumi Asano, Takahiro Ikeda, Toru Koike, and Hideaki Abe "Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(4), 043006 (1 October 2006). https://doi.org/10.1117/1.2397034

Published: 1 October 2006

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available