Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 5 · NO. 4 | October 2006
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (11)
Editorial
Articles
J. Micro/Nanolith. MEMS MOEMS 5(4), 043001 (1 October 2006) https://doi.org/10.1117/1.2397065
TOPICS: Polarization, Photomasks, Transmittance, Chromium, Phase shifts, Lithography, Lithographic illumination, Immersion lithography, Semiconducting wafers, Finite-difference time-domain method
J. Micro/Nanolith. MEMS MOEMS 5(4), 043002 (1 October 2006) https://doi.org/10.1117/1.2399537
TOPICS: Photomasks, Lithography, Source mask optimization, Convolution, Inverse problems, Optical lithography, Semiconducting wafers, Computer programming, Optical proximity correction, Optimization (mathematics)
J. Micro/Nanolith. MEMS MOEMS 5(4), 043003 (1 October 2006) https://doi.org/10.1117/1.2396926
TOPICS: Lithography, Optical proximity correction, Critical dimension metrology, Excimer lasers, Optical simulations, Colorimetry, Image processing, Semiconducting wafers, Photoresist processing, Imaging systems
J. Micro/Nanolith. MEMS MOEMS 5(4), 043004 (1 October 2006) https://doi.org/10.1117/1.2397018
TOPICS: Diffusion, Interferometry, Modulation transfer functions, Immersion lithography, Semiconducting wafers, Refractive index, Extreme ultraviolet lithography, Microfluidic imaging, Microfluidics, Lithography
J. Micro/Nanolith. MEMS MOEMS 5(4), 043005 (1 October 2006) https://doi.org/10.1117/1.2399525
TOPICS: Semiconducting wafers, Photoresist materials, Scanning electron microscopy, Critical dimension metrology, Chemistry, Electron microscopes, Lead, Molecules, Process control, Printing
J. Micro/Nanolith. MEMS MOEMS 5(4), 043006 (1 October 2006) https://doi.org/10.1117/1.2397034
TOPICS: Scanning electron microscopy, Scatterometry, Metrology, Critical dimension metrology, Monte Carlo methods, Inspection, Stereolithography, Manufacturing, Time metrology, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 5(4), 043007 (1 October 2006) https://doi.org/10.1117/1.2397081
TOPICS: Wave plates, Optical design, Etching, Polarization, Gallium arsenide, Birefringence, Polarimetry, Phase measurement, Polarizers, Metals
J. Micro/Nanolith. MEMS MOEMS 5(4), 043010 (1 October 2006) https://doi.org/10.1117/1.2408410
TOPICS: Polymers, Surface roughness, Polymer thin films, Line edge roughness, Line width roughness, Photoresist processing, Profiling, Atomic force microscopy, Semiconducting wafers, Lithography
J. Micro/Nanolith. MEMS MOEMS 5(4), 043011 (1 October 2006) https://doi.org/10.1117/1.2401388
TOPICS: Microelectromechanical systems, LCDs, Optical components, Light sources, Thin films, Reflectivity, Silicon, Prisms, Aluminum, Polymethylmethacrylate
J. Micro/Nanolith. MEMS MOEMS 5(4), 043012 (1 October 2006) https://doi.org/10.1117/1.2397045
TOPICS: Waveguides, Modulation, Microopto electromechanical systems, Sensors, Electronics, Polarization, Sun, Mathematical modeling, Mechanical sensors, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 5(4), 043013 (1 October 2006) https://doi.org/10.1117/1.2397088
TOPICS: Silicon, Surface roughness, Semiconducting wafers, Glasses, Interfaces, Wafer bonding, Diffusion, Laser bonding, Surface finishing, Silicon carbide
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 5(4), 049701 (1 October 2006) https://doi.org/10.1117/1.2401140
TOPICS: Lithography, Gold, Nanolithography, Metals, Molecular self-assembly, Electron beam lithography, Molecular assembly, Semiconducting wafers, Copper, Multilayers
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