journal of micro nanolithography mems and moems
VOL. 5 · NO. 3 | July 2006
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (9)
Editorial
J. Micro/Nanolith. MEMS MOEMS 5(3), 030101 (1 July 2006) doi:10.1117/1.2358364
JM3 Letters
Augustus Janssen, Peter Dirksen
J. Micro/Nanolith. MEMS MOEMS 5(3), 030501 (1 July 2006) doi:10.1117/1.2345672
TOPICS: Lithography, Scanners, Image processing, Zernike polynomials, Monochromatic aberrations, Solids, Optical lithography, Lithographic illumination, Computer simulations
Articles
J. Micro/Nanolith. MEMS MOEMS 5(3), 033001 (1 July 2006) doi:10.1117/1.2358129
TOPICS: Polarization, Dielectric polarization, Monte Carlo methods, Optical lithography, Lithography, Zernike polynomials, Jones matrices, Semiconducting wafers, Optical spheres, Dielectrics
Yayi Wei, Nickolay Stepanenko, Antje Laessig, Lars Voelkel, Michael Sebald
J. Micro/Nanolith. MEMS MOEMS 5(3), 033002 (1 July 2006) doi:10.1117/1.2358128
TOPICS: Semiconducting wafers, Photoresist processing, Photomasks, Contamination, Lithography, Scanners, Line edge roughness, Binary data, Head, Critical dimension metrology
Gian Lorusso, Leonardus Leunissen, Monique Ercken, Christie Delvaux, Frieda Van Roey, Nadia Vandenbroeck, H. Yang, Amir Azordegan, Tony DiBiase
J. Micro/Nanolith. MEMS MOEMS 5(3), 033003 (1 July 2006) doi:10.1117/1.2242982
TOPICS: Line width roughness, Critical dimension metrology, Metrology, Immersion lithography, Process control, Etching, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 5(3), 033004 (1 July 2006) doi:10.1117/1.2242524
TOPICS: Speckle, Line edge roughness, Nanoimprint lithography, Lithography, Excimer lasers, Stochastic processes, Spatial coherence, Fiber optic illuminators, Projection lithography, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 5(3), 033005 (1 July 2006) doi:10.1117/1.2358112
J. Micro/Nanolith. MEMS MOEMS 5(3), 033006 (1 July 2006) doi:10.1117/1.2243082
TOPICS: Molybdenum, Silicon, Ions, Gold, Xenon, Plasma, Ruthenium, Palladium, Mirrors, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 5(3), 033007 (1 July 2006) doi:10.1117/1.2358124
TOPICS: Contamination, Molybdenum, Tin, Mirrors, Reflectivity, Gold, Sputter deposition, Ions, Ruthenium, Plasma
J. Micro/Nanolith. MEMS MOEMS 5(3), 033008 (1 July 2006) doi:10.1117/1.2242815
Xiaobo Xing, Xiaoqing Deng, Baojun Li, Bharat Chaudhari
J. Micro/Nanolith. MEMS MOEMS 5(3), 033009 (1 July 2006) doi:10.1117/1.2358091
COMMUNICATIONS
Nazmul Mamun, Prashanta Dutta
J. Micro/Nanolith. MEMS MOEMS 5(3), 039701 (1 July 2006) doi:10.1117/1.2242633
TOPICS: Electrodes, Platinum, Microfluidics, Optical lithography, Photoresist materials, Glasses, Polymers, Sputter deposition, Titanium, Silicon
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