journal of micro nanolithography mems and moems
VOL. 5 · NO. 3 | July 2006
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (9)
Editorial
JM3 5(3), 030101 (1 July 2006) doi:10.1117/1.2358364
JM3 Letters
Augustus Janssen, Peter Dirksen
JM3 5(3), 030501 (1 July 2006) doi:10.1117/1.2345672
TOPICS: Lithography, Scanners, Image processing, Zernike polynomials, Monochromatic aberrations, Solids, Optical lithography, Lithographic illumination, Computer simulations
Articles
JM3 5(3), 033001 (1 July 2006) doi:10.1117/1.2358129
TOPICS: Polarization, Dielectric polarization, Monte Carlo methods, Optical lithography, Lithography, Zernike polynomials, Jones matrices, Semiconducting wafers, Optical spheres, Dielectrics
Yayi Wei, Nickolay Stepanenko, Antje Laessig, Lars Voelkel, Michael Sebald
JM3 5(3), 033002 (1 July 2006) doi:10.1117/1.2358128
TOPICS: Semiconducting wafers, Photoresist processing, Photomasks, Contamination, Lithography, Scanners, Line edge roughness, Binary data, Head, Critical dimension metrology
Gian Lorusso, Leonardus Leunissen, Monique Ercken, Christie Delvaux, Frieda Van Roey, Nadia Vandenbroeck, H. Yang, Amir Azordegan, Tony DiBiase
JM3 5(3), 033003 (1 July 2006) doi:10.1117/1.2242982
TOPICS: Line width roughness, Critical dimension metrology, Metrology, Immersion lithography, Process control, Etching, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Optical lithography
JM3 5(3), 033004 (1 July 2006) doi:10.1117/1.2242524
TOPICS: Speckle, Line edge roughness, Nanoimprint lithography, Lithography, Excimer lasers, Stochastic processes, Spatial coherence, Fiber optic illuminators, Projection lithography, Optical lithography
JM3 5(3), 033005 (1 July 2006) doi:10.1117/1.2358112
JM3 5(3), 033006 (1 July 2006) doi:10.1117/1.2243082
TOPICS: Molybdenum, Silicon, Ions, Gold, Xenon, Plasma, Ruthenium, Palladium, Mirrors, Extreme ultraviolet lithography
JM3 5(3), 033007 (1 July 2006) doi:10.1117/1.2358124
TOPICS: Contamination, Molybdenum, Tin, Mirrors, Reflectivity, Gold, Sputter deposition, Ions, Ruthenium, Plasma
JM3 5(3), 033008 (1 July 2006) doi:10.1117/1.2242815
Xiaobo Xing, Xiaoqing Deng, Baojun Li, Bharat Chaudhari
JM3 5(3), 033009 (1 July 2006) doi:10.1117/1.2358091
COMMUNICATIONS
Nazmul Mamun, Prashanta Dutta
JM3 5(3), 039701 (1 July 2006) doi:10.1117/1.2242633
TOPICS: Electrodes, Platinum, Microfluidics, Optical lithography, Photoresist materials, Glasses, Polymers, Sputter deposition, Titanium, Silicon
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