journal of micro nanolithography mems and moems
VOL. 6 · NO. 1 | January 2007
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (11)
Editorial
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 6(1), 010501 (1 January 2007) https://doi.org/10.1117/1.2718941
TOPICS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles
Articles
J. Micro/Nanolith. MEMS MOEMS 6(1), 013001 (1 January 2007) https://doi.org/10.1117/1.2712841
TOPICS: Contamination, Immersion lithography, Laser irradiation, Wafer-level optics, Optical components, Semiconducting wafers, Liquids, Diffusion, In situ metrology, Reflection
Juan Lopez Gejo, Joy Kunjappu, Nicholas Turro, Willard Conley
J. Micro/Nanolith. MEMS MOEMS 6(1), 013002 (1 January 2007) https://doi.org/10.1117/1.2435730
TOPICS: Refractive index, Water, Microfluidics, Absorption, Refraction, Optical lithography, Liquids, Polymethylmethacrylate, Ultraviolet radiation, Fluid dynamics
Kaushal Vora, Bor-Yuan Shew, Erol Harvey, J. Hayes, Andrew Peele
J. Micro/Nanolith. MEMS MOEMS 6(1), 013003 (1 January 2007) https://doi.org/10.1117/1.2712868
TOPICS: Acoustics, Diffusion, X-rays, Photomasks, X-ray lithography, Calibration, Temperature metrology, Resistance, Signal attenuation, Synchrotron radiation
Kaushal Vora, Bor-Yuan Shew, Erol Harvey, J. Hayes, Andrew Peele
J. Micro/Nanolith. MEMS MOEMS 6(1), 013004 (1 January 2007) https://doi.org/10.1117/1.2712869
TOPICS: Diffusion, Photomasks, X-rays, X-ray lithography, Lithography, Polymethylmethacrylate, Synchrotron radiation, Photoresist processing, Photoresist materials, Diffraction
J. Arcamone, A. Sanchez-Amores, Josep Montserrat, M. A. F. van de Boogaart, Juergen Brugger, Francesc Pérez-Murano
J. Micro/Nanolith. MEMS MOEMS 6(1), 013005 (1 January 2007) https://doi.org/10.1117/1.2435273
TOPICS: Semiconducting wafers, Lithography, Aluminum, Etching, Silicon, Reactive ion etching, Dry etching, Electron beam lithography, Resonators, Oxides
J. Micro/Nanolith. MEMS MOEMS 6(1), 013006 (1 January 2007) https://doi.org/10.1117/1.2437212
TOPICS: Ions, Molybdenum, Mirrors, Gold, Silicon, Extreme ultraviolet, Ruthenium, Extreme ultraviolet lithography, Multilayers, Sputter deposition
J. Micro/Nanolith. MEMS MOEMS 6(1), 013007 (1 January 2007) https://doi.org/10.1117/1.2435202
TOPICS: Image segmentation, Computer programming, Image compression, Maskless lithography, Binary data, Raster graphics, Semiconducting wafers, Photomasks, Multiplexers, Lithography
Han-Byul Kang, Yong-Dae Kim, Jong-Min Kim, Hyun-Joon Cho, Moon-Hwan Choi, Sang-Soo Choi, Jee-Hwan Bae, Cheol-Woong Yang
J. Micro/Nanolith. MEMS MOEMS 6(1), 013008 (1 January 2007) https://doi.org/10.1117/1.2435715
TOPICS: Ions, Air contamination, Photomasks, Chromatography, Potassium, Phase shifts, Lithography, Thermal effects, Chemical analysis, Materials science
Miyako Matsui, Syuntaro Machida, Toshiyuki Mine, Kazuyuki Hozawa, Kikuo Watanabe, Yasushi Goto, Jiro Inoue, Hiroshi Nagaishi
J. Micro/Nanolith. MEMS MOEMS 6(1), 013009 (1 January 2007) https://doi.org/10.1117/1.2437195
TOPICS: Inspection, Dielectrics, Electron beams, Electrodes, Capacitors, Semiconducting wafers, Molybdenum, Annealing, Scanning electron microscopy, Oxides
J. Micro/Nanolith. MEMS MOEMS 6(1), 013010 (1 January 2007) https://doi.org/10.1117/1.2434990
TOPICS: Etching, Aluminum, Photoresist materials, Chemical vapor deposition, Coating, Silicon, Scanning electron microscopy, Silica, Wet etching, Microfluidics
Jemmy Sutanto, Ronald Setia, Adam Papania, Gary May, Peter Hesketh, Yves Berthelot
J. Micro/Nanolith. MEMS MOEMS 6(1), 013011 (1 January 2007) https://doi.org/10.1117/1.2712864
TOPICS: Microactuators, Neural networks, Electromagnetism, Data modeling, Microelectromechanical systems, Microfluidics, Neurons, Mechanical engineering, Artificial neural networks, Actuators
Back to Top