Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 6 · NO. 1 | January 2007
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (11)
Editorial
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 6(1), 010501 (1 January 2007) https://doi.org/10.1117/1.2718941
TOPICS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles
Articles
J. Micro/Nanolith. MEMS MOEMS 6(1), 013001 (1 January 2007) https://doi.org/10.1117/1.2712841
TOPICS: Contamination, Immersion lithography, Laser irradiation, Wafer-level optics, Optical components, Semiconducting wafers, Liquids, Diffusion, In situ metrology, Reflection
J. Micro/Nanolith. MEMS MOEMS 6(1), 013002 (1 January 2007) https://doi.org/10.1117/1.2435730
TOPICS: Refractive index, Water, Microfluidics, Absorption, Refraction, Optical lithography, Liquids, Polymethylmethacrylate, Ultraviolet radiation, Fluid dynamics
J. Micro/Nanolith. MEMS MOEMS 6(1), 013003 (1 January 2007) https://doi.org/10.1117/1.2712868
TOPICS: Acoustics, Diffusion, X-rays, Photomasks, X-ray lithography, Calibration, Temperature metrology, Resistance, Signal attenuation, Synchrotron radiation
J. Micro/Nanolith. MEMS MOEMS 6(1), 013004 (1 January 2007) https://doi.org/10.1117/1.2712869
TOPICS: Diffusion, Photomasks, X-rays, X-ray lithography, Lithography, Polymethylmethacrylate, Synchrotron radiation, Photoresist processing, Photoresist materials, Diffraction
J. Micro/Nanolith. MEMS MOEMS 6(1), 013005 (1 January 2007) https://doi.org/10.1117/1.2435273
TOPICS: Semiconducting wafers, Lithography, Aluminum, Etching, Silicon, Reactive ion etching, Dry etching, Electron beam lithography, Resonators, Oxides
J. Micro/Nanolith. MEMS MOEMS 6(1), 013006 (1 January 2007) https://doi.org/10.1117/1.2437212
TOPICS: Ions, Molybdenum, Mirrors, Gold, Silicon, Extreme ultraviolet, Ruthenium, Extreme ultraviolet lithography, Multilayers, Sputter deposition
J. Micro/Nanolith. MEMS MOEMS 6(1), 013007 (1 January 2007) https://doi.org/10.1117/1.2435202
TOPICS: Image segmentation, Computer programming, Image compression, Maskless lithography, Binary data, Raster graphics, Semiconducting wafers, Photomasks, Multiplexers, Lithography
J. Micro/Nanolith. MEMS MOEMS 6(1), 013008 (1 January 2007) https://doi.org/10.1117/1.2435715
TOPICS: Ions, Air contamination, Photomasks, Chromatography, Potassium, Phase shifts, Lithography, Thermal effects, Chemical analysis, Materials science
J. Micro/Nanolith. MEMS MOEMS 6(1), 013009 (1 January 2007) https://doi.org/10.1117/1.2437195
TOPICS: Inspection, Dielectrics, Electron beams, Electrodes, Capacitors, Semiconducting wafers, Molybdenum, Annealing, Scanning electron microscopy, Oxides
J. Micro/Nanolith. MEMS MOEMS 6(1), 013010 (1 January 2007) https://doi.org/10.1117/1.2434990
TOPICS: Etching, Aluminum, Photoresist materials, Chemical vapor deposition, Coating, Silicon, Scanning electron microscopy, Silica, Wet etching, Microfluidics
J. Micro/Nanolith. MEMS MOEMS 6(1), 013011 (1 January 2007) https://doi.org/10.1117/1.2712864
TOPICS: Microactuators, Neural networks, Electromagnetism, Data modeling, Microelectromechanical systems, Microfluidics, Neurons, Mechanical engineering, Artificial neural networks, Actuators
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