journal of micro nanolithography mems and moems
VOL. 6 · NO. 2 | April 2007
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (12)
Editorial
J. Micro/Nanolith. MEMS MOEMS 6(2), 020101 (1 April 2007) doi:10.1117/1.2752509
Articles
J. Micro/Nanolith. MEMS MOEMS 6(2), 023001 (1 April 2007) doi:10.1117/1.2743657
TOPICS: Feedback control, Process control, Control systems, Device simulation, Filtering (signal processing), Manufacturing, Data modeling, Process modeling, Semiconductor manufacturing, Systems modeling
J. Micro/Nanolith. MEMS MOEMS 6(2), 023002 (1 April 2007) doi:10.1117/1.2728742
TOPICS: Calibration, Standards development, Error analysis, Scanners, Atomic force microscope, Silicon, Semiconductor manufacturing, Semiconductors, Metrology, Semiconducting wafers
Scott Schuetter, Timothy Shedd, Gregory Nellis
J. Micro/Nanolith. MEMS MOEMS 6(2), 023003 (1 April 2007) doi:10.1117/1.2727490
TOPICS: Liquids, Velocity measurements, Fluid dynamics, Capillaries, Image processing, Data modeling, Interfaces, Semiconducting wafers, Chromium, Microfluidics
J. Micro/Nanolith. MEMS MOEMS 6(2), 023004 (1 April 2007) doi:10.1117/1.2728899
TOPICS: Electrons, Polymethylmethacrylate, Electron beams, Electron beam lithography, Scanning electron microscopy, Monte Carlo methods, Lithography, Scattering, Laser scattering, Solids
J. Micro/Nanolith. MEMS MOEMS 6(2), 023005 (1 April 2007) doi:10.1117/1.2750651
TOPICS: Plasma, Lithium, Mirrors, EUV optics, Extreme ultraviolet, Extreme ultraviolet lithography, Ions, Sputter deposition, Reflectivity, Optics manufacturing
J. Micro/Nanolith. MEMS MOEMS 6(2), 023006 (1 April 2007) doi:10.1117/1.2727475
TOPICS: Diffraction, Photomasks, Printing, Photoresist materials, Lithography, Computer simulations, Refractive index, Waveguides, Wave propagation, Tolerancing
Arnaud Benahmed, Robert Lam, Nicholaus Rechner, Chih-Ming Ho
J. Micro/Nanolith. MEMS MOEMS 6(2), 023007 (1 April 2007) doi:10.1117/1.2731384
TOPICS: Printing, Diffraction gratings, Gold, Surface plasmons, Holography, Polymers, Lithography, Diffraction, Atomic force microscopy, Control systems
Miao Liu, Quanfang Chen
J. Micro/Nanolith. MEMS MOEMS 6(2), 023008 (1 April 2007) doi:10.1117/1.2731381
TOPICS: Interfaces, Diffusion, Microelectromechanical systems, Polymers, Silicon, Lab on a chip, Biological research, Microfluidics, Plasma treatment, Dielectrics
Lia Almeida, Ramesh Ramadoss, Robert Jackson, Koji Ishikawa, Q. Yu
J. Micro/Nanolith. MEMS MOEMS 6(2), 023009 (1 April 2007) doi:10.1117/1.2744240
Xuhan Dai, Xiaolin Zhao, Guifu Ding, Bingchu Cai
J. Micro/Nanolith. MEMS MOEMS 6(2), 023010 (1 April 2007) doi:10.1117/1.2750653
TOPICS: Camera shutters, Signal attenuation, Microelectromechanical systems, Receivers, Silicon, Variable optical attenuators, Attenuators, Copper, Surface micromachining, Free space optics
J. Micro/Nanolith. MEMS MOEMS 6(2), 023011 (1 April 2007) doi:10.1117/1.2731364
TOPICS: Mirrors, Optical filters, Microelectromechanical systems, Reflectivity, Optical simulations, Capacitors, Electromechanical design, Mirror structures, Electrodes, Tunable filters
J. Micro/Nanolith. MEMS MOEMS 6(2), 023012 (1 April 2007) doi:10.1117/1.2743374
TOPICS: Polymers, Polymer thin films, Lithography, Optical lithography, Atomic force microscope, Metrology, Scanning probe lithography, Silicon, In situ metrology, Silicon films
Back to Top