Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 6 · NO. 3 | July 2007
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 6(3), 030101 (1 July 2007) https://doi.org/10.1117/1.2793804
Special Section on Resolution Enhancement Techniques and Design for Manufacturability
J. Micro/Nanolith. MEMS MOEMS 6(3), 031002 (1 July 2007) https://doi.org/10.1117/1.2778447
TOPICS: Photomasks, Diffraction, Polarization, Refractive index, Lithography, Electromagnetism, Binary data, Water, Lithographic illumination, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 6(3), 031003 (1 July 2007) https://doi.org/10.1117/1.2783418
TOPICS: Apodization, Optical proximity correction, Pellicles, Data modeling, Lithography, Signal attenuation, Critical dimension metrology, Gaussian filters, Calibration, Optical filters
J. Micro/Nanolith. MEMS MOEMS 6(3), 031004 (1 July 2007) https://doi.org/10.1117/1.2752814
TOPICS: Optical proximity correction, Lithography, Photomasks, Calibration, Critical dimension metrology, Photoresist materials, Convolution, Systems modeling, Data modeling, Image processing
J. Micro/Nanolith. MEMS MOEMS 6(3), 031005 (1 July 2007) https://doi.org/10.1117/1.2774994
TOPICS: Optical proximity correction, Tolerancing, Photomasks, Critical dimension metrology, Resolution enhancement technologies, Model-based design, Lithography, Computer programming, Capacitance, Semiconductors
J. Micro/Nanolith. MEMS MOEMS 6(3), 031006 (1 July 2007) https://doi.org/10.1117/1.2785031
TOPICS: Photomasks, Lithography, Genetic algorithms, Lithographic illumination, Binary data, Optimization (mathematics), Manufacturing, Critical dimension metrology, Image processing, Computer simulations
J. Micro/Nanolith. MEMS MOEMS 6(3), 031007 (1 July 2007) https://doi.org/10.1117/1.2774987
TOPICS: Optical proximity correction, Design for manufacturing, Data modeling, Process modeling, Image processing, Photoresist materials, Photomasks, Calibration, Lithography, Model-based design
J. Micro/Nanolith. MEMS MOEMS 6(3), 031008 (1 July 2007) https://doi.org/10.1117/1.2781584
TOPICS: Optical proximity correction, Design for manufacturability, Lithography, Design for manufacturing, Metals, Scanning electron microscopy, Semiconducting wafers, Holmium, Calibration, Integrated circuit design
J. Micro/Nanolith. MEMS MOEMS 6(3), 031009 (1 July 2007) https://doi.org/10.1117/1.2775471
TOPICS: Computer aided design, Optical proximity correction, Critical dimension metrology, Design for manufacturing, Field effect transistors, Manufacturing, Photomasks, Lithography, Analog electronics, Etching
J. Micro/Nanolith. MEMS MOEMS 6(3), 031010 (1 July 2007) https://doi.org/10.1117/1.2785030
TOPICS: Metals, Lithography, Optical proximity correction, Logic devices, Calibration, Manufacturing, Semiconducting wafers, Logic, Design for manufacturability, Image processing
J. Micro/Nanolith. MEMS MOEMS 6(3), 031011 (1 July 2007) https://doi.org/10.1117/1.2781583
TOPICS: Logic, Metals, Manufacturing, Lithography, Standards development, Silicon, Integrated circuit design, Design for manufacturability, Optical proximity correction, Resolution enhancement technologies
Articles
J. Micro/Nanolith. MEMS MOEMS 6(3), 033001 (1 July 2007) https://doi.org/10.1117/1.2770472
TOPICS: Modulation, Critical dimension metrology, Electron beam direct write lithography, Point spread functions, Electron beam lithography, Cadmium sulfide, Electron beams, Optical lithography, Manufacturing, Backscatter
J. Micro/Nanolith. MEMS MOEMS 6(3), 033002 (1 July 2007) https://doi.org/10.1117/1.2767331
TOPICS: Spatial light modulators, LCDs, Photoresist materials, Binary data, Optical lithography, Photomasks, Reticles, Prototyping, Super resolution, Liquid crystals
J. Micro/Nanolith. MEMS MOEMS 6(3), 033003 (1 July 2007) https://doi.org/10.1117/1.2778641
TOPICS: Oxygen, Absorption, Argon, Microfluidics, Absorbance, Refractive index, Optical lithography, Nitrogen, Molecules, Oxidation
J. Micro/Nanolith. MEMS MOEMS 6(3), 033004 (1 July 2007) https://doi.org/10.1117/1.2778685
TOPICS: Scanning probe lithography, Microfluidics, Humidity, Silicon, Nanolithography, Semiconducting wafers, Thermoelectric materials, Directed energy weapons, Nanostructures, Fractal analysis
J. Micro/Nanolith. MEMS MOEMS 6(3), 033005 (1 July 2007) https://doi.org/10.1117/1.2777158
TOPICS: Bragg cells, Acousto-optics, Acoustics, Photomasks, Spiral phase plates, Transducers, Phase shift keying, Optical lithography, Spatial filters, Image enhancement
J. Micro/Nanolith. MEMS MOEMS 6(3), 033006 (1 July 2007) https://doi.org/10.1117/1.2778644
TOPICS: Silicon, Titanium, Gold, Metals, Copper, Chromium, Polymethylmethacrylate, Semiconducting wafers, X-ray lithography, Chemical analysis
J. Micro/Nanolith. MEMS MOEMS 6(3), 033007 (1 July 2007) https://doi.org/10.1117/1.2767326
TOPICS: Gold, Actuators, Aluminum, Gallium, Reflectors, Microelectromechanical systems, Silicon, Distributed Bragg reflectors, Optical lithography, Chemistry
J. Micro/Nanolith. MEMS MOEMS 6(3), 033008 (1 July 2007) https://doi.org/10.1117/1.2778645
TOPICS: Gyroscopes, Electrodes, Finite element methods, Sensors, Capacitors, Nonlinear dynamics, Photomasks, Mechanical engineering, Motion measurement, Reliability
J. Micro/Nanolith. MEMS MOEMS 6(3), 033009 (1 July 2007) https://doi.org/10.1117/1.2770459
TOPICS: Silicon, Etching, Electrodes, Semiconducting wafers, Fabrication, Thermal oxidation, Diffusion, Lithography, Array processing, Boron
J. Micro/Nanolith. MEMS MOEMS 6(3), 033010 (1 July 2007) https://doi.org/10.1117/1.2775458
TOPICS: Mirrors, Reliability, Microelectromechanical systems, Optical design, Packaging, Reflectivity, Microopto electromechanical systems, Tolerancing, Lenses, Silicon
J. Micro/Nanolith. MEMS MOEMS 6(3), 033011 (1 July 2007) https://doi.org/10.1117/1.2778431
TOPICS: Thin films, Nickel, Silicon, Etching, Finite element methods, Electroplating, Microelectromechanical systems, Sensors, Silicon films, Scanning electron microscopy
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