journal of micro nanolithography mems and moems
VOL. 6 · NO. 4 | October 2007
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (15)
Editorial
J. Micro/Nanolith. MEMS MOEMS 6(4), 040101 (1 October 2007) https://doi.org/10.1117/1.2826725
Articles
J. Micro/Nanolith. MEMS MOEMS 6(4), 043001 (1 October 2007) https://doi.org/10.1117/1.2794767
TOPICS: Photomasks, Lithography, Double patterning technology, Semiconducting wafers, Imaging systems, Detection and tracking algorithms, Coherence imaging, Mathematical modeling, Image processing, Optimization (mathematics)
Fabio Zocchi, Enrico Benedetti
J. Micro/Nanolith. MEMS MOEMS 6(4), 043002 (1 October 2007) https://doi.org/10.1117/1.2811949
TOPICS: Mirrors, Grazing incidence, Optical design, Reflectivity, Extreme ultraviolet lithography, Fiber optic illuminators, Reflection, Solids, Optics manufacturing, Coating
J. Micro/Nanolith. MEMS MOEMS 6(4), 043003 (1 October 2007) https://doi.org/10.1117/1.2804128
TOPICS: Ions, Particles, Extreme ultraviolet, Magnetism, Monte Carlo methods, Systems modeling, Plasma, Tin, Argon, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 6(4), 043004 (1 October 2007) https://doi.org/10.1117/1.2792178
TOPICS: Line edge roughness, Monte Carlo methods, Lithography, Molecules, Diffusion, Image enhancement, Electron beam lithography, Ionization, Electron beams, Polymers
Alexander Philippou, Thomas Mülders, Eckehard Schoell
J. Micro/Nanolith. MEMS MOEMS 6(4), 043005 (1 October 2007) https://doi.org/10.1117/1.2817656
TOPICS: Polymers, Ionization, Line edge roughness, Diffusion, Photoresist materials, Computer simulations, Stochastic processes, Chemical species, Molecules, Photoresist developing
Anda Grigorescu, Marco van der Krogt, Cees Hagen
J. Micro/Nanolith. MEMS MOEMS 6(4), 043006 (1 October 2007) https://doi.org/10.1117/1.2816459
TOPICS: Electron beam lithography, Electron beams, Scanning electron microscopy, Hydrogen, Silicon, Photoresist processing, Polymers, Semiconducting wafers, Photomicroscopy, Nanolithography
Da-Jeng Yao, Jhao-Ronga Chen, Woan-Tying Ju
J. Micro/Nanolith. MEMS MOEMS 6(4), 043007 (1 October 2007) https://doi.org/10.1117/1.2805452
TOPICS: Convection, Polymers, Control systems, Temperature metrology, Sensors, Resistance, Microelectromechanical systems, Microfluidics, Molecular biology, Particles
Nan-Chyuan Tsai, Chung-Yang Sue
J. Micro/Nanolith. MEMS MOEMS 6(4), 043008 (1 October 2007) https://doi.org/10.1117/1.2804114
TOPICS: Actuators, Fabrication, Polymers, Electrodes, Microfluidics, Polymer thin films, Silver, Chemical analysis, Control systems, Ions
J. Micro/Nanolith. MEMS MOEMS 6(4), 043009 (1 October 2007) https://doi.org/10.1117/1.2816449
TOPICS: Head, Liquids, Inkjet technology, Microfluidics, Silicon, Printing, Video, Imaging systems, Satellites, Resistance
Takashi Takahashi, Toshiki Okumura, Etsuya Suzuki, Tatsuya Kojima, Hitoshi Suzuki, Toru Tojo, Koji Machida
J. Micro/Nanolith. MEMS MOEMS 6(4), 043010 (1 October 2007) https://doi.org/10.1117/1.2804125
TOPICS: Cements, Deep ultraviolet, Adhesives, Transmittance, Objectives, Inspection, Microscopes, Fluorine, Lamps, Excimer lasers
R. Jafari, Andrew Kirk
J. Micro/Nanolith. MEMS MOEMS 6(4), 043011 (1 October 2007) https://doi.org/10.1117/1.2804103
TOPICS: Micromirrors, Electrodes, Chemical elements, Microelectromechanical systems, 3D modeling, Transducers, Mirrors, Instrument modeling, Data modeling, Systems modeling
J. Micro/Nanolith. MEMS MOEMS 6(4), 043012 (1 October 2007) https://doi.org/10.1117/1.2816455
TOPICS: Mirrors, Microelectromechanical systems, Micromirrors, Actuators, Data modeling, Systems modeling, Oscillators, Motion models, Simulink, Reverse modeling
J. Micro/Nanolith. MEMS MOEMS 6(4), 043013 (1 October 2007) https://doi.org/10.1117/1.2794291
TOPICS: Etching, Microelectromechanical systems, Aluminum, Oxides, Profilometers, Reactive ion etching, Scanning electron microscopy, Sensors, Optical testing, Plasma
Kjetil Gjerde, Jakob Kjelstrup-Hansen, Lauge Gammelgaard, Peter Bøggild
J. Micro/Nanolith. MEMS MOEMS 6(4), 043014 (1 October 2007) https://doi.org/10.1117/1.2811948
TOPICS: Nickel, Etching, Photomasks, Electron beam lithography, Semiconducting wafers, Silicon, Lead, Microsystems, Aluminum, Reactive ion etching
Alan Purvis, Richard McWilliam, Simon Johnson, Nicholas Seed, Gavin Williams, Andrew Maiden, Peter Ivey
J. Micro/Nanolith. MEMS MOEMS 6(4), 043015 (1 October 2007) https://doi.org/10.1117/1.2824377
TOPICS: Optical lithography, Photomasks, Computer generated holography, Photoresist materials, Binary data, Holography, Manufacturing, Antennas, Lithography, Optical alignment
COMMUNICATIONS
Vikas Agrawal, Ritesh Devani, Sushanta Mitra
J. Micro/Nanolith. MEMS MOEMS 6(4), 049701 (1 October 2007) https://doi.org/10.1117/1.2795635
TOPICS: Excimer lasers, Laser ablation, Polymethylmethacrylate, Etching, Photomasks, Microfabrication, Polymers, Laser processing, Laser vision correction, Micromachining
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