Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 7 · NO. 1 | January 2008
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (12)
Editorial
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 7(1), 010501 (1 January 2008) https://doi.org/10.1117/1.2896082
TOPICS: Silicon, Nickel, Optical fibers, Packaging, Electroplating, Semiconducting wafers, Microfabrication, Sputter deposition, Optical lithography, Single mode fibers
Articles
J. Micro/Nanolith. MEMS MOEMS 7(1), 013001 (1 January 2008) https://doi.org/10.1117/1.2841718
TOPICS: Photomasks, Polarization, Diffraction, Optical proximity correction, Pellicles, Chromium, Fiber optic illuminators, Lithography, Optical lithography, Diffraction gratings
J. Micro/Nanolith. MEMS MOEMS 7(1), 013002 (1 January 2008) https://doi.org/10.1117/1.2898504
TOPICS: Optical proximity correction, Critical dimension metrology, SRAF, Lithography, Model-based design, Semiconducting wafers, Resolution enhancement technologies, Standards development, Computer programming, Image processing
J. Micro/Nanolith. MEMS MOEMS 7(1), 013003 (1 January 2008) https://doi.org/10.1117/1.2898515
TOPICS: Extreme ultraviolet, Xenon, Plasma, Magnetism, Diagnostics, Photodiodes, Electrodes, Quantum efficiency, Solids, Hydrogen
J. Micro/Nanolith. MEMS MOEMS 7(1), 013004 (1 January 2008) https://doi.org/10.1117/1.2838591
TOPICS: Lithography, Interferometry, Visibility, Spatial light modulators, Integrated circuits, Absorption, Beam splitters, Physics, Computer simulations, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 7(1), 013005 (1 January 2008) https://doi.org/10.1117/1.2841716
TOPICS: Etching, Silicon, Electron beam lithography, Reactive ion etching, Carbon, Oxides, Dry etching, Semiconducting wafers, X-rays, Photoemission spectroscopy
J. Micro/Nanolith. MEMS MOEMS 7(1), 013006 (1 January 2008) https://doi.org/10.1117/1.2841721
TOPICS: Lithography, Photomasks, Waveguides, Polymers, Aluminum, Ions, Refractive index, Beam shaping, Etching, Chemical elements
J. Micro/Nanolith. MEMS MOEMS 7(1), 013008 (1 January 2008) https://doi.org/10.1117/1.2894772
TOPICS: Polymers, Polymethylmethacrylate, Scatterometry, Nanostructures, Reflectivity, Electron beam lithography, Scanning electron microscopy, Nanoimprint lithography, Visible radiation, Cadmium sulfide
J. Micro/Nanolith. MEMS MOEMS 7(1), 013009 (1 January 2008) https://doi.org/10.1117/1.2894817
J. Micro/Nanolith. MEMS MOEMS 7(1), 013010 (1 January 2008) https://doi.org/10.1117/1.2896107
TOPICS: Sensors, Capacitance, Microelectromechanical systems, Amplifiers, Power supplies, Electrodes, Capacitors, Resistors, Connectors, Interference (communication)
J. Micro/Nanolith. MEMS MOEMS 7(1), 013011 (1 January 2008) https://doi.org/10.1117/1.2894795
TOPICS: Microlens, Electrodes, Finite element methods, Semiconducting wafers, Electro optics, Refractive index, Electro optical modeling, Ferroelectric materials, Diffraction, Microlens array
J. Micro/Nanolith. MEMS MOEMS 7(1), 013012 (1 January 2008) https://doi.org/10.1117/1.2885275
TOPICS: Reflectivity, Diffraction, Silicon, Microscopy, Scanning electron microscopy, Optical testing, Objectives, Atomic force microscopy, Diffraction gratings, Microscopes
J. Micro/Nanolith. MEMS MOEMS 7(1), 013013 (1 January 2008) https://doi.org/10.1117/1.2842375
TOPICS: Polarizers, Gold, Measurement devices, Refractive index, Mid-IR, Silica, Polarimetry, Scanning electron microscopy, Staring arrays, Polarization
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