journal of micro nanolithography mems and moems
VOL. 7 · NO. 2 | April 2008
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 7(2), 020501 (1 April 2008)
TOPICS: Photomasks, Lithography, Semiconducting wafers, Diffraction, Resonance enhancement, Tantalum, Dielectrics, Critical dimension metrology, Electromagnetism, Radio propagation
Special Section on Silicon-Based MOEMS and Their Applications
Michael Scholles, Andreas Bräuer, Klaus Frommhagen, Christian Gerwig, Hubert Lakner, Harald Schenk, Markus Schwarzenberg
J. Micro/Nanolith. MEMS MOEMS 7(2), 021001 (1 April 2008)
TOPICS: Mirrors, Projection systems, Modulation, Video, Laser sources, Semiconductor lasers, LCDs, Image resolution, Microopto electromechanical systems, RGB color model
J. Micro/Nanolith. MEMS MOEMS 7(2), 021002 (1 April 2008)
TOPICS: Mirrors, Motion models, Microelectromechanical systems, Actuators, Micromirrors, Oscillators, Data modeling, Stochastic processes, Motion measurement, Motion estimation
Chengkuo Lee, Jer-Liang Yeh
J. Micro/Nanolith. MEMS MOEMS 7(2), 021003 (1 April 2008)
TOPICS: Signal attenuation, Microelectromechanical systems, Mirrors, Actuators, Camera shutters, Microopto electromechanical systems, Reflectivity, Silicon, Micromirrors, Optical alignment
J. Micro/Nanolith. MEMS MOEMS 7(2), 021004 (1 April 2008)
TOPICS: Reflectors, Tunable filters, Optical filters, Electronic filtering, Infrared detectors, Refractive index, Sensors, Silicon, Reflectivity, Transmittance
J. Micro/Nanolith. MEMS MOEMS 7(2), 021005 (1 April 2008)
TOPICS: Spectroscopy, Silicon, Etching, Near infrared, Diffraction gratings, Diodes, Semiconducting wafers, Signal processing, Mirrors, Monochromators
J. Micro/Nanolith. MEMS MOEMS 7(2), 021006 (1 April 2008)
TOPICS: Mirrors, FT-IR spectroscopy, Microopto electromechanical systems, Protactinium, Spectrometers, Actuators, Infrared radiation, Microelectromechanical systems, Spectral resolution, Signal to noise ratio
Ali Khiat, F. Lamarque, C. Prelle, A. Phataralaoha, Jan Dittmer, T. Krah, Monika Leester-Schaedel, Stephanus Büttgenbach
J. Micro/Nanolith. MEMS MOEMS 7(2), 021007 (1 April 2008)
TOPICS: Silicon, Sensors, Microfabrication, Aluminum, Etching, Gold, Fiber optics, Diffraction gratings, Fiber optics sensors, Micromachining
J. Micro/Nanolith. MEMS MOEMS 7(2), 021008 (1 April 2008)
TOPICS: Mirrors, Monochromatic aberrations, Optical coherence tomography, Confocal microscopy, Imaging systems, Tissues, Objectives, Optical components, Microelectromechanical systems, Microscopes
J. Micro/Nanolith. MEMS MOEMS 7(2), 021009 (1 April 2008)
TOPICS: Deformable mirrors, Actuators, Mirrors, Microelectromechanical systems, Image quality, Optical microscopes, Cameras, Calibration, Scanners, Optical design
Ho-Chiao Chuang, Ricardo Jimenez-Martinez, Simon Braun, Dana Anderson, Victor Bright
J. Micro/Nanolith. MEMS MOEMS 7(2), 021010 (1 April 2008)
TOPICS: Semiconductor lasers, Silicon, Ferroelectric materials, Rubidium, Actuators, Temperature metrology, Doppler effect, Copper, Laser systems engineering, Laser development
J. Micro/Nanolith. MEMS MOEMS 7(2), 021011 (1 April 2008)
TOPICS: Mirrors, Electrodes, Spatial light modulators, Micromirrors, Deep ultraviolet, Oxides, Actuators, Analog electronics, Titanium, Silicon
Jan-Uwe Schmidt, Martin Friedrichs, Andreas Gehner
J. Micro/Nanolith. MEMS MOEMS 7(2), 021012 (1 April 2008)
TOPICS: Actuators, Mirrors, Aluminum, Reflectivity, Micromirrors, CMOS technology, Analog electronics, Deep ultraviolet, Multilayers, Etching
J. Micro/Nanolith. MEMS MOEMS 7(2), 021013 (1 April 2008)
TOPICS: Diffractive optical elements, Silicon, Actuators, Mirrors, Multilayers, Optical components, Scanning electron microscopy, Diffraction, Microopto electromechanical systems, Electrochemical etching
J. Micro/Nanolith. MEMS MOEMS 7(2), 021014 (1 April 2008)
TOPICS: Mirrors, Micromirrors, Electrodes, Cryogenics, Astronomical imaging, Semiconducting wafers, Spectroscopy, Deep reactive ion etching, Coating, Spectrographs
Heping Liu, Idriss Blakey, Willard Conley, Graeme George, David Hill, Andrew Whittaker
J. Micro/Nanolith. MEMS MOEMS 7(2), 023001 (1 April 2008)
TOPICS: Chromium, Etching, Line edge roughness, Double patterning technology, Photomasks, Photoresist processing, Refractive index, Image registration, Lithography, Scanning electron microscopy
David Van Steenwinckel, Roel Gronheid, Jeroen Lammers, Frieda Van Roey, Patrick Willems
J. Micro/Nanolith. MEMS MOEMS 7(2), 023002 (1 April 2008)
TOPICS: Line width roughness, Nanoimprint lithography, Electroluminescence, Diffusion, Photoresist materials, Absorbance, Extreme ultraviolet, Lithography, Photoresist processing, Extreme ultraviolet lithography
Ian Foulds, Robert Johnstone, See-Ho Tsang, M. Pallapa
J. Micro/Nanolith. MEMS MOEMS 7(2), 023003 (1 April 2008)
TOPICS: Deep ultraviolet, Data modeling, Semiconducting wafers, Microelectromechanical systems, Absorbance, Absorption, Polymers, Etching, Standards development, Wafer-level optics
Houwen Tang, Yun-Bo Yi, Mohammad Matin
J. Micro/Nanolith. MEMS MOEMS 7(2), 023004 (1 April 2008)
TOPICS: Mirrors, Microelectromechanical systems, Chemical elements, Thermal modeling, Resonators, Finite element methods, Analytical research, Computer engineering, Micromirrors, Nanoelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 7(2), 023005 (1 April 2008)
TOPICS: Refraction, Water, Prisms, Refractive index, Thermal optics, Microfluidics, Lithography, Absorbance, Temperature metrology, Electrodes
Takayuki Abe, Jun Yashima, Hayato Shibata
J. Micro/Nanolith. MEMS MOEMS 7(2), 023006 (1 April 2008)
TOPICS: Critical dimension metrology, Computed tomography, Forward error correction, Convolution, Modulation, Fourier transforms, Semiconducting wafers, Erbium, Lithography, Numerical analysis
Jongwoong Kim, Young-Chul Lee, Sang-Su Ha, Ja-Myeong Koo, Jae-Hoon Ko, Wansoo Nah, Seung-Boo Jung
J. Micro/Nanolith. MEMS MOEMS 7(2), 023007 (1 April 2008)
TOPICS: Microwave radiation, Adhesives, Quartz, Semiconducting wafers, Silicon, Particles, Gold, Resistance, Signal attenuation, Epoxies
J. Micro/Nanolith. MEMS MOEMS 7(2), 023008 (1 April 2008)
TOPICS: Etching, Silicon, Lithography, Capillaries, Ultraviolet radiation, Coating, Liquids, Polymers, Optical lithography, Data modeling
Back to Top