journal of micro nanolithography mems and moems
VOL. 7 · NO. 3 | July 2008
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (17)
Editorial
J. Micro/Nanolith. MEMS MOEMS 7(3), 030101 (1 July 2008) doi:10.1117/1.2988031
JM3 Letters
Alioune Diouf, Gregory Reimann, Thomas Bifano
J. Micro/Nanolith. MEMS MOEMS 7(3), 030501 (1 July 2008) doi:10.1117/1.2955935
TOPICS: Electroplating, Gold, Photoresist materials, Microfluidics, Fabrication, Photoresist processing, Microelectromechanical systems, Eye, Semiconducting wafers, Process control
Articles
J. Micro/Nanolith. MEMS MOEMS 7(3), 033001 (1 July 2008) doi:10.1117/1.2964297
TOPICS: Critical dimension metrology, Optical simulations, Laser scanners, 3D scanning, Laser stabilization, Scanners, Convolution, Semiconducting wafers, Laser metrology, Laser damage threshold
Paul Harder, Timothy Shedd
J. Micro/Nanolith. MEMS MOEMS 7(3), 033002 (1 July 2008) doi:10.1117/1.2964214
TOPICS: Liquids, Data modeling, Fluid dynamics, Thin films, Water, Semiconducting wafers, Microfluidics, Immersion lithography, Quartz, Velocity measurements
Miyako Matsui, Toshiyuki Mine, Kazuyuki Hozawa, Kikuo Watanabe, Jiro Inoue, Hiroshi Nagaishi
J. Micro/Nanolith. MEMS MOEMS 7(3), 033003 (1 July 2008) doi:10.1117/1.2959176
TOPICS: Dielectrics, Capacitors, Inspection, Electrodes, Molybdenum, Semiconducting wafers, Oxides, Metals, Semiconductors, Electron beams
J. Micro/Nanolith. MEMS MOEMS 7(3), 033004 (1 July 2008) doi:10.1117/1.2964218
TOPICS: Gold, Reflectivity, Molybdenum, Ions, Extreme ultraviolet, Mirrors, Plasma, Xenon, Extreme ultraviolet lithography, Photodiodes
Michael Lin, Daniel Hellebusch, Kai Wu, Eui Kim, Kuan-Hsun Lu, Kenneth Liechti, John Ekerdt, Paul Ho, C. Grant Willson
J. Micro/Nanolith. MEMS MOEMS 7(3), 033005 (1 July 2008) doi:10.1117/1.2968269
TOPICS: Polymers, Interfaces, Quartz, Adhesives, Etching, Liquids, Silicon, Lithography, Mechanics, Natural surfaces
Yung-Chun Lee, Chun-Hsiang Chen, Cheng-Yu Chiu, Fuh-Yu Chang
J. Micro/Nanolith. MEMS MOEMS 7(3), 033006 (1 July 2008) doi:10.1117/1.2970146
TOPICS: Quartz, Silicon, Metals, Printing, Silicon films, Etching, Semiconductor lasers, Nonimpact printing, Optical lithography, Interfaces
J. Micro/Nanolith. MEMS MOEMS 7(3), 033007 (1 July 2008) doi:10.1117/1.2970147
TOPICS: Photomasks, Liquid crystals, Glasses, Polymers, Polymer thin films, Ultraviolet radiation, Reflection, Thin films, Optical filters, Electrodes
Stanley Wanat, Robert Plass, M. Dalil Rahman
J. Micro/Nanolith. MEMS MOEMS 7(3), 033008 (1 July 2008) doi:10.1117/1.2968268
TOPICS: Metals, Microelectronics, Photoresist materials, Ion exchange, Electroluminescence, Photoresist developing, Patents, Photoresist processing, Picture Archiving and Communication System, Dielectrics
U. Stohr, P. Vulto, P. Hoppe, Gerald Urban, Holger Reinecke
J. Micro/Nanolith. MEMS MOEMS 7(3), 033009 (1 July 2008) doi:10.1117/1.2964217
TOPICS: Semiconducting wafers, Microfluidics, Photoresist materials, Wafer bonding, Liquids, Photoresist processing, Glasses, Positron emission tomography, Microsystems, Microelectromechanical systems
Min Yang, Roger French, Edward Tokarsky
J. Micro/Nanolith. MEMS MOEMS 7(3), 033010 (1 July 2008) doi:10.1117/1.2965541
TOPICS: Atrial fibrillation, Absorption, Absorbance, Optical properties, Refractive index, Refraction, Polymers, Silicon, Data modeling, Silicon films
Ke-Min Liao, Rongshun Chen
J. Micro/Nanolith. MEMS MOEMS 7(3), 033011 (1 July 2008) doi:10.1117/1.2959849
TOPICS: Sensors, Liquids, Temperature sensors, Prototyping, Microfluidics, Computing systems, Signal detection, Resistors, Physics, Temperature metrology
S. Sudheer, Devesh Kothwala, S. Prathibha, Chhaya Engineer, Ankur Raval, Haresh Kotadia
J. Micro/Nanolith. MEMS MOEMS 7(3), 033012 (1 July 2008) doi:10.1117/1.2965539
TOPICS: Laser cutting, Modulation, Nd:YAG lasers, Microfabrication, Scanning electron microscopy, Pulsed laser operation, Metals, Bragg cells, Biomedical optics, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 7(3), 033013 (1 July 2008) doi:10.1117/1.2964288
TOPICS: Cesium, Absorption, Silicon, Glasses, Atomic clocks, Semiconducting wafers, Etching, Modulation, Microelectromechanical systems, Chemical species
Meltem Erdamar, Karthikeyan Shanmugasundaram, Paul Roman, Paul Mumbauer, Maria Klimkiewicz, Jerzy Ruzyllo
J. Micro/Nanolith. MEMS MOEMS 7(3), 033014 (1 July 2008) doi:10.1117/1.2959177
TOPICS: Etching, Semiconducting wafers, Microelectromechanical systems, Silicon, Oxides, Chemistry, Scanning electron microscopy, Wet etching, Reactive ion etching, Silica
Deepak Marla, Suhas Joshi, Sushanta Mitra
J. Micro/Nanolith. MEMS MOEMS 7(3), 033015 (1 July 2008) doi:10.1117/1.2964215
TOPICS: Ions, Micromachining, Electrodes, Metals, Data modeling, Diffusion, Capacitors, Resistance, Power supplies, Copper
Cho Jui Tay, Ramam Akkipeddi, M. Gopal
J. Micro/Nanolith. MEMS MOEMS 7(3), 033016 (1 July 2008) doi:10.1117/1.2959175
TOPICS: Phonons, Microopto electromechanical systems, Raman spectroscopy, Microelectromechanical systems, Interferometry, Optical filters, Micro raman spectroscopy, Indium gallium arsenide, Semiconducting wafers, Calibration
Yasser Anis, James Mills, William Cleghorn
J. Micro/Nanolith. MEMS MOEMS 7(3), 033017 (1 July 2008) doi:10.1117/1.2970145
TOPICS: Visualization, Robotics, Control systems, Fuzzy logic, Microelectromechanical systems, Interfaces, Process control, Digital filtering, Motion controllers, Computer programming
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 7(3), 039701 (1 July 2008) doi:10.1117/1.2959178
TOPICS: Electrodes, Crystals, Lithium niobate, Nanodomains, Nanolithography, Wet etching, Atomic force microscopy, Fabrication, Metals, Atomic force microscope
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