Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 7 · NO. 4 | October 2008
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (18)
Editorial
Articles
J. Micro/Nanolith. MEMS MOEMS 7(4), 043001 (1 October 2008) https://doi.org/10.1117/1.2990735
TOPICS: Metals, Oxides, Scanning electron microscopy, Copper, Photoresist processing, Optical lithography, Etching, Double patterning technology, System on a chip, Immersion lithography
J. Micro/Nanolith. MEMS MOEMS 7(4), 043002 (1 October 2008) https://doi.org/10.1117/1.3033203
TOPICS: Polymerization, Diffusion, Two photon polymerization, Mathematical modeling, Pulsed laser operation, Polymers, Molecules, Absorption, Systems modeling, Laser systems engineering
J. Micro/Nanolith. MEMS MOEMS 7(4), 043003 (1 October 2008) https://doi.org/10.1117/1.3033210
TOPICS: Mirrors, Scanners, Laser scanners, 3D scanning, Laser based displays, Sensors, Silicon, Electromagnetism, Semiconducting wafers, Actuators
J. Micro/Nanolith. MEMS MOEMS 7(4), 043004 (1 October 2008) https://doi.org/10.1117/1.3040017
TOPICS: Extreme ultraviolet lithography, Extreme ultraviolet, Microelectromechanical systems, Electron beams, Mirrors, Aluminum, Plasma, Auroras, Bismuth, Gold
J. Micro/Nanolith. MEMS MOEMS 7(4), 043005 (1 October 2008) https://doi.org/10.1117/1.2990739
TOPICS: Extreme ultraviolet, Ultraviolet radiation, Semiconducting wafers, Etching, Lithography, Chemical mechanical planarization, Materials processing, Coating, Silicon, Dielectrics
J. Micro/Nanolith. MEMS MOEMS 7(4), 043006 (1 October 2008) https://doi.org/10.1117/1.2990738
TOPICS: Etching, Semiconducting wafers, Deep ultraviolet, Gold, Absorption, Photoresist developing, Photoresist materials, Optical lithography, Polymers, Chromium
J. Micro/Nanolith. MEMS MOEMS 7(4), 043007 (1 October 2008) https://doi.org/10.1117/1.2990733
TOPICS: Gold, Liquids, Electrodes, Silicon, Microelectromechanical systems, Etching, Semiconducting wafers, Aluminum, Switches, Photoresist materials
J. Micro/Nanolith. MEMS MOEMS 7(4), 043008 (1 October 2008) https://doi.org/10.1117/1.3013546
TOPICS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis
J. Micro/Nanolith. MEMS MOEMS 7(4), 043010 (1 October 2008) https://doi.org/10.1117/1.3013458
TOPICS: Inspection, Light, Spatial coherence, Optical inspection, Light sources, Photomasks, Imaging systems, Optical components, Transmittance, Neptunium
J. Micro/Nanolith. MEMS MOEMS 7(4), 043012 (1 October 2008) https://doi.org/10.1117/1.3033208
TOPICS: Polymethylmethacrylate, Microfluidics, Surface finishing, Microlens, Data modeling, Micromachining, Protactinium, Mathematical modeling, Scanning electron microscopy, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 7(4), 043013 (1 October 2008) https://doi.org/10.1117/1.3036201
TOPICS: Gold, Polymethylmethacrylate, Thin films, Interfaces, Silicon, Polymers, Scanning electron microscopy, Multilayers, Semiconducting wafers, Metals
J. Micro/Nanolith. MEMS MOEMS 7(4), 043014 (1 October 2008) https://doi.org/10.1117/1.3033207
TOPICS: Sensors, Silicon, Resistors, Etching, Resistance, Platinum, Titanium, Low pressure chemical vapor deposition, Infrared sensors, Temperature metrology
J. Micro/Nanolith. MEMS MOEMS 7(4), 043015 (1 October 2008) https://doi.org/10.1117/1.3013547
TOPICS: Actuators, Signal attenuation, Microelectromechanical systems, Mirrors, Variable optical attenuators, Semiconducting wafers, Silicon, Electromechanical design, Scanning electron microscopy, Gold
J. Micro/Nanolith. MEMS MOEMS 7(4), 043020 (1 October 2008) https://doi.org/10.1117/1.2990734
TOPICS: Microelectromechanical systems, Gold, Capacitance, Optical simulations, Silicon, Etching, Computer simulations, Oxides, Thin films, Silica
J. Micro/Nanolith. MEMS MOEMS 7(4), 043025 (1 October 2008) https://doi.org/10.1117/1.3013549
TOPICS: Actuators, Switches, Head, Microelectromechanical systems, Oxides, Etching, Chemical elements, 3D modeling, Silicon, Resistance
J. Micro/Nanolith. MEMS MOEMS 7(4), 043026 (1 October 2008) https://doi.org/10.1117/1.3010878
TOPICS: Actuators, Photomasks, Scanning electron microscopy, Interferometry, Dielectrics, Photomicroscopy, Microscopes, Polysomnography, Low pressure chemical vapor deposition, Profiling
J. Micro/Nanolith. MEMS MOEMS 7(4), 043030 (1 October 2008) https://doi.org/10.1117/1.3033209
TOPICS: Gyroscopes, Electrodes, Feedback control, Mechanical engineering, Capacitance, Control systems, Semiconducting wafers, Capacitors, Dynamical systems, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 7(4), 043035 (1 October 2008) https://doi.org/10.1117/1.3013457
TOPICS: Microfluidics, Silicon, Waveguides, Temperature metrology, Resistance, Computer aided design, Fluorescence resonance energy transfer, Semiconducting wafers, Etching, Control systems
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