journal of micro nanolithography mems and moems
VOL. 7 · NO. 4 | October 2008
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (18)
Editorial
Articles
Hiroko Nakamura, Mitsuhiro Omura, Souichi Yamashita, Yasuyuki Taniguchi, Junko Abe, Satoshi Tanaka, Soichi Inoue
J. Micro/Nanolith. MEMS MOEMS 7(4), 043001 (1 October 2008) https://doi.org/10.1117/1.2990735
TOPICS: Metals, Oxides, Scanning electron microscopy, Copper, Photoresist processing, Optical lithography, Etching, Double patterning technology, System on a chip, Immersion lithography
J. Micro/Nanolith. MEMS MOEMS 7(4), 043002 (1 October 2008) https://doi.org/10.1117/1.3033203
TOPICS: Polymerization, Diffusion, Two photon polymerization, Mathematical modeling, Pulsed laser operation, Polymers, Molecules, Absorption, Systems modeling, Laser systems engineering
Hee-Moon Jeong, Yong-Hwa Park, Yong-Chul Cho, Jun-Sik Hwang, Seok-Mo Chang, Seok-Jin Kang, Hyun-Ku Jeong, Jun-O Kim, Jin-Ho Lee
J. Micro/Nanolith. MEMS MOEMS 7(4), 043003 (1 October 2008) https://doi.org/10.1117/1.3033210
TOPICS: Mirrors, Scanners, Laser scanners, 3D scanning, Laser based displays, Sensors, Silicon, Electromagnetism, Semiconducting wafers, Actuators
Hironari Yamada, Dorian Minkov, Norio Toyosugi, Masaki Morita, Daisuke Hasegawa, Ahsa Moon, Ejike Okoye
J. Micro/Nanolith. MEMS MOEMS 7(4), 043004 (1 October 2008) https://doi.org/10.1117/1.3040017
TOPICS: Extreme ultraviolet lithography, Extreme ultraviolet, Microelectromechanical systems, Electron beams, Mirrors, Aluminum, Plasma, Auroras, Bismuth, Gold
Satoshi Takei, Yusuke Horiguchi, Tomoya Ohashi, Yuichi Mano, Makoto Muramatsu, Mitsuaki Iwashita, Katsuhiro Tsuchiya, Akira Samura
J. Micro/Nanolith. MEMS MOEMS 7(4), 043005 (1 October 2008) https://doi.org/10.1117/1.2990739
TOPICS: Extreme ultraviolet, Ultraviolet radiation, Semiconducting wafers, Etching, Lithography, Chemical mechanical planarization, Materials processing, Coating, Silicon, Dielectrics
Robert Johnstone, Ian Foulds, M. Pallapa, Ash Parameswaran
J. Micro/Nanolith. MEMS MOEMS 7(4), 043006 (1 October 2008) https://doi.org/10.1117/1.2990738
TOPICS: Etching, Semiconducting wafers, Deep ultraviolet, Gold, Absorption, Photoresist developing, Photoresist materials, Optical lithography, Polymers, Chromium
Jaibir Sharma, Amitava DasGupta
J. Micro/Nanolith. MEMS MOEMS 7(4), 043007 (1 October 2008) https://doi.org/10.1117/1.2990733
TOPICS: Gold, Liquids, Electrodes, Silicon, Microelectromechanical systems, Etching, Semiconducting wafers, Aluminum, Switches, Photoresist materials
Takayuki Abe, Jun Yashima, Hayato Shibata, Yasuo Kato, Hiroshi Matsumoto, Tomohiro Iijama
J. Micro/Nanolith. MEMS MOEMS 7(4), 043008 (1 October 2008) https://doi.org/10.1117/1.3013546
TOPICS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis
J. Micro/Nanolith. MEMS MOEMS 7(4), 043010 (1 October 2008) https://doi.org/10.1117/1.3013458
TOPICS: Inspection, Light, Spatial coherence, Optical inspection, Light sources, Photomasks, Imaging systems, Optical components, Transmittance, Neptunium
Pun Pang Shiu, Mile Ostojic, George Knopf, Suwas Nikumb
J. Micro/Nanolith. MEMS MOEMS 7(4), 043012 (1 October 2008) https://doi.org/10.1117/1.3033208
TOPICS: Polymethylmethacrylate, Microfluidics, Surface finishing, Microlens, Data modeling, Micromachining, Protactinium, Mathematical modeling, Scanning electron microscopy, Manufacturing
C. T. Pan, Shieh-Chu Chen, Chun-Yu Lin
J. Micro/Nanolith. MEMS MOEMS 7(4), 043013 (1 October 2008) https://doi.org/10.1117/1.3036201
TOPICS: Gold, Polymethylmethacrylate, Thin films, Interfaces, Silicon, Polymers, Scanning electron microscopy, Multilayers, Semiconducting wafers, Metals
Shali Shi, Liang Yi, Dapeng Chen, Yi Ou, Yupeng Jing, Tianchun Ye, ZhongYu Cheng
J. Micro/Nanolith. MEMS MOEMS 7(4), 043014 (1 October 2008) https://doi.org/10.1117/1.3033207
TOPICS: Sensors, Silicon, Resistors, Etching, Resistance, Platinum, Titanium, Low pressure chemical vapor deposition, Infrared sensors, Temperature metrology
Max Hou, Jing-Yi Huang, Shiue-Shr Jiang, Jer-Liang Yeh
J. Micro/Nanolith. MEMS MOEMS 7(4), 043015 (1 October 2008) https://doi.org/10.1117/1.3013547
TOPICS: Actuators, Signal attenuation, Microelectromechanical systems, Mirrors, Variable optical attenuators, Semiconducting wafers, Silicon, Electromechanical design, Scanning electron microscopy, Gold
J. Micro/Nanolith. MEMS MOEMS 7(4), 043020 (1 October 2008) https://doi.org/10.1117/1.2990734
TOPICS: Microelectromechanical systems, Gold, Capacitance, Optical simulations, Silicon, Etching, Computer simulations, Oxides, Thin films, Silica
Jack Skinner, Paul Dentinger, Fabian Strong, Steven Gianoulakis
J. Micro/Nanolith. MEMS MOEMS 7(4), 043025 (1 October 2008) https://doi.org/10.1117/1.3013549
TOPICS: Actuators, Switches, Head, Microelectromechanical systems, Oxides, Etching, Chemical elements, 3D modeling, Silicon, Resistance
I-Yu Huang, Guan-Ming Chen, Yen-Chi Lee
J. Micro/Nanolith. MEMS MOEMS 7(4), 043026 (1 October 2008) https://doi.org/10.1117/1.3010878
TOPICS: Actuators, Photomasks, Scanning electron microscopy, Interferometry, Dielectrics, Photomicroscopy, Microscopes, Polysomnography, Low pressure chemical vapor deposition, Profiling
Nan-Chyuan Tsai, Chung-Yang Sue, Chih-Che Lin
J. Micro/Nanolith. MEMS MOEMS 7(4), 043030 (1 October 2008) https://doi.org/10.1117/1.3033209
TOPICS: Gyroscopes, Electrodes, Feedback control, Mechanical engineering, Capacitance, Control systems, Semiconducting wafers, Capacitors, Dynamical systems, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 7(4), 043035 (1 October 2008) https://doi.org/10.1117/1.3013457
TOPICS: Microfluidics, Silicon, Waveguides, Temperature metrology, Resistance, Computer aided design, Fluorescence resonance energy transfer, Semiconducting wafers, Etching, Control systems
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