Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-e-beam Maskless Lithography, or Nanoimprint?
Ultralow k1 oxide contact hole formation and metal filling using resist contact hole pattern by double line and space formation method
Modeling of temperature-dependent diffusion and polymerization kinetics and their effects on two-photon polymerization dynamics
High-accuracy correction of critical dimension errors taking sequence of large-scale integrated circuits fabrication processes into account
Extraction of Young's modulus and residual stress of structural materials through measurement of pull-in voltage and off-capacitance of beams
Low-friction large step-size micromotor driven by a scratch-drive actuator with bounceback mechanism