Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 7 · NO. 2 | April 2008
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 7(2), 020501 (1 April 2008)
TOPICS: Photomasks, Lithography, Semiconducting wafers, Diffraction, Resonance enhancement, Tantalum, Dielectrics, Critical dimension metrology, Electromagnetism, Radio propagation
Special Section on Silicon-Based MOEMS and Their Applications
J. Micro/Nanolith. MEMS MOEMS 7(2), 021001 (1 April 2008)
TOPICS: Mirrors, Projection systems, Modulation, Video, Laser sources, Semiconductor lasers, LCDs, Image resolution, Microopto electromechanical systems, RGB color model
J. Micro/Nanolith. MEMS MOEMS 7(2), 021002 (1 April 2008)
TOPICS: Mirrors, Motion models, Microelectromechanical systems, Actuators, Micromirrors, Oscillators, Data modeling, Stochastic processes, Motion measurement, Motion estimation
J. Micro/Nanolith. MEMS MOEMS 7(2), 021003 (1 April 2008)
TOPICS: Signal attenuation, Microelectromechanical systems, Mirrors, Actuators, Camera shutters, Microopto electromechanical systems, Reflectivity, Silicon, Micromirrors, Optical alignment
J. Micro/Nanolith. MEMS MOEMS 7(2), 021004 (1 April 2008)
TOPICS: Reflectors, Tunable filters, Optical filters, Electronic filtering, Infrared detectors, Refractive index, Sensors, Silicon, Reflectivity, Transmittance
J. Micro/Nanolith. MEMS MOEMS 7(2), 021005 (1 April 2008)
TOPICS: Spectroscopy, Silicon, Etching, Near infrared, Diffraction gratings, Diodes, Semiconducting wafers, Signal processing, Mirrors, Monochromators
J. Micro/Nanolith. MEMS MOEMS 7(2), 021006 (1 April 2008)
TOPICS: Mirrors, FT-IR spectroscopy, Microopto electromechanical systems, Protactinium, Spectrometers, Actuators, Infrared radiation, Microelectromechanical systems, Spectral resolution, Signal to noise ratio
J. Micro/Nanolith. MEMS MOEMS 7(2), 021007 (1 April 2008)
TOPICS: Silicon, Sensors, Microfabrication, Aluminum, Etching, Gold, Fiber optics, Diffraction gratings, Fiber optics sensors, Micromachining
J. Micro/Nanolith. MEMS MOEMS 7(2), 021008 (1 April 2008)
TOPICS: Mirrors, Monochromatic aberrations, Optical coherence tomography, Confocal microscopy, Imaging systems, Tissues, Objectives, Optical components, Microelectromechanical systems, Microscopes
J. Micro/Nanolith. MEMS MOEMS 7(2), 021009 (1 April 2008)
TOPICS: Deformable mirrors, Actuators, Mirrors, Microelectromechanical systems, Image quality, Optical microscopes, Cameras, Calibration, Scanners, Optical design
J. Micro/Nanolith. MEMS MOEMS 7(2), 021010 (1 April 2008)
TOPICS: Semiconductor lasers, Silicon, Ferroelectric materials, Rubidium, Actuators, Temperature metrology, Doppler effect, Copper, Laser systems engineering, Laser development
J. Micro/Nanolith. MEMS MOEMS 7(2), 021011 (1 April 2008)
TOPICS: Mirrors, Electrodes, Spatial light modulators, Micromirrors, Deep ultraviolet, Oxides, Actuators, Analog electronics, Titanium, Silicon
J. Micro/Nanolith. MEMS MOEMS 7(2), 021012 (1 April 2008)
TOPICS: Actuators, Mirrors, Aluminum, Reflectivity, Micromirrors, CMOS technology, Analog electronics, Deep ultraviolet, Multilayers, Etching
J. Micro/Nanolith. MEMS MOEMS 7(2), 021013 (1 April 2008)
TOPICS: Diffractive optical elements, Silicon, Actuators, Mirrors, Multilayers, Optical components, Scanning electron microscopy, Diffraction, Microopto electromechanical systems, Electrochemical etching
J. Micro/Nanolith. MEMS MOEMS 7(2), 021014 (1 April 2008)
TOPICS: Mirrors, Micromirrors, Electrodes, Cryogenics, Astronomical imaging, Semiconducting wafers, Spectroscopy, Deep reactive ion etching, Coating, Spectrographs
J. Micro/Nanolith. MEMS MOEMS 7(2), 023001 (1 April 2008)
TOPICS: Chromium, Etching, Line edge roughness, Double patterning technology, Photomasks, Photoresist processing, Refractive index, Image registration, Lithography, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 7(2), 023002 (1 April 2008)
TOPICS: Line width roughness, Nanoimprint lithography, Electroluminescence, Diffusion, Photoresist materials, Absorbance, Extreme ultraviolet, Lithography, Photoresist processing, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 7(2), 023003 (1 April 2008)
TOPICS: Deep ultraviolet, Data modeling, Semiconducting wafers, Microelectromechanical systems, Absorbance, Absorption, Polymers, Etching, Standards development, Wafer-level optics
J. Micro/Nanolith. MEMS MOEMS 7(2), 023004 (1 April 2008)
TOPICS: Mirrors, Microelectromechanical systems, Chemical elements, Thermal modeling, Resonators, Finite element methods, Analytical research, Computer engineering, Micromirrors, Nanoelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 7(2), 023005 (1 April 2008)
TOPICS: Refraction, Water, Prisms, Refractive index, Thermal optics, Microfluidics, Lithography, Absorbance, Temperature metrology, Electrodes
J. Micro/Nanolith. MEMS MOEMS 7(2), 023006 (1 April 2008)
TOPICS: Critical dimension metrology, Computed tomography, Forward error correction, Convolution, Modulation, Fourier transforms, Semiconducting wafers, Erbium, Lithography, Numerical analysis
J. Micro/Nanolith. MEMS MOEMS 7(2), 023007 (1 April 2008)
TOPICS: Microwave radiation, Adhesives, Quartz, Semiconducting wafers, Silicon, Particles, Gold, Resistance, Signal attenuation, Epoxies
J. Micro/Nanolith. MEMS MOEMS 7(2), 023008 (1 April 2008)
TOPICS: Etching, Silicon, Lithography, Capillaries, Ultraviolet radiation, Coating, Liquids, Polymers, Optical lithography, Data modeling
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