journal of micro nanolithography mems and moems
VOL. 8 · NO. 1 | January 2009
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 8(1), 010101 (1 January 2009) doi:10.1117/1.3098441
TOPICS: Double patterning technology, Photomasks, Scanners, Optical lithography, Laser scanners, 3D scanning, Beam splitters, Reticles, Lithography, Logic
Special Section on Double-Patterning Lithography
J. Micro/Nanolith. MEMS MOEMS 8(1), 011001 (1 January 2009) doi:10.1117/1.3092834
TOPICS: Lithography, Double patterning technology, Optical lithography, Photoresist processing, Etching, Photomasks, Manufacturing, Overlay metrology, Critical dimension metrology, Semiconductors
J. Micro/Nanolith. MEMS MOEMS 8(1), 011002 (1 January 2009) doi:10.1117/1.3079349
TOPICS: Double patterning technology, Critical dimension metrology, Etching, Lithography, Photomasks, Reticles, Semiconducting wafers, Overlay metrology, Scanners, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 8(1), 011003 (1 January 2009) doi:10.1117/1.3023077
TOPICS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes
J. Micro/Nanolith. MEMS MOEMS 8(1), 011004 (1 January 2009) doi:10.1117/1.3023078
TOPICS: Photomasks, Reticles, Semiconducting wafers, Overlay metrology, Double patterning technology, Lithography, Image registration, Metrology, Critical dimension metrology, Extreme ultraviolet lithography
Christoph Noelscher, Marcel Heller, Matthias Markert, Dietmar Temmler, Franck Jauzion-Graverolle, Nicolo Morgana, Ulrich Scheler, Bee-Kim Hong, Ulrich Egger, Vadim Timoshkov, Mirko Vogt
J. Micro/Nanolith. MEMS MOEMS 8(1), 011005 (1 January 2009) doi:10.1117/1.3066296
TOPICS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon
J. Micro/Nanolith. MEMS MOEMS 8(1), 011006 (1 January 2009) doi:10.1117/1.3042219
TOPICS: Double patterning technology, Image processing, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Printing, Reticles, Cadmium, Lithography, Line width roughness
Janko Versluijs, Jean-Francois de Marneffe, Danny Goossens, Tom Vandeweyer, Vincent Wiaux, Herbert Struyf, Mireille Maenhoudt, Mohand Brouri, Johan Vertommen, Jisoo Kim, Helen Zhu, Helen Zhu
J. Micro/Nanolith. MEMS MOEMS 8(1), 011007 (1 January 2009) doi:10.1117/1.3066632
TOPICS: Etching, Critical dimension metrology, Optical lithography, Optical proximity correction, Metals, Scanning electron microscopy, Semiconducting wafers, Photomasks, Double patterning technology, Tin
J. Micro/Nanolith. MEMS MOEMS 8(1), 011008 (1 January 2009) doi:10.1117/1.3023079
TOPICS: Overlay metrology, Double patterning technology, Tolerancing, Optical alignment, Semiconducting wafers, Optical lithography, Metrology, Control systems, Photomasks, Image processing
J. Micro/Nanolith. MEMS MOEMS 8(1), 011009 (1 January 2009) doi:10.1117/1.3059550
TOPICS: Lithography, Photomasks, Etching, Optical lithography, Critical dimension metrology, Anisotropic etching, Silicon, Amorphous silicon, Chemical vapor deposition, Transistors
J. Micro/Nanolith. MEMS MOEMS 8(1), 011010 (1 January 2009) doi:10.1117/1.3094746
TOPICS: Double patterning technology, Photoresist materials, Finite element methods, Photoresist processing, Scanning electron microscopy, Etching, Lithography, Optical lithography, Ultraviolet radiation, Image analysis
Saul Lee, Kane Jen, C. Grant Willson, Jeffrey Byers, Paul Zimmerman, Nicholas Turro
J. Micro/Nanolith. MEMS MOEMS 8(1), 011011 (1 January 2009) doi:10.1117/1.3095589
TOPICS: Lithography, Picture Archiving and Communication System, Photomasks, Nonlinear response, Computer simulations, Imaging systems, Photons, Electroluminescence, Photoresist developing, Absorbance
Articles
Minoru Yoshii, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Seiji Takeuchi, Tokuyuki Honda, Toyohiko Yatagai
J. Micro/Nanolith. MEMS MOEMS 8(1), 013003 (1 January 2009) doi:10.1117/1.3059551
TOPICS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 8(1), 013004 (1 January 2009) doi:10.1117/1.3079782
TOPICS: Data modeling, Line width roughness, Critical dimension metrology, Nanoimprint lithography, Lithography, Process modeling, Optical lithography, Lithographic illumination, Semiconducting wafers, Inspection
J. Micro/Nanolith. MEMS MOEMS 8(1), 013010 (1 January 2009) doi:10.1117/1.3066798
TOPICS: Photoresist materials, Analog electronics, Modulation, Photoresist developing, Photomasks, Refractive index, Optical components, Overlay metrology, Scanning electron microscopy, Electron beam lithography
Aruna Kroetch, Stephen Buswell, Stephane Evoy, Cemil Durak, James Heflin, Vladimir Kochergin, Roger Duncan
J. Micro/Nanolith. MEMS MOEMS 8(1), 013011 (1 January 2009) doi:10.1117/1.3066521
TOPICS: Silicon, Nanoimprint lithography, Chromophores, Second-harmonic generation, Self-assembled monolayers, Nonlinear optics, Reactive ion etching, Waveguides, Etching, Photonic crystals
Xiaoming Yu, Bingsen Zhang, Jing Guo, Huazhe Yang, Ying Zhang, Shimin Shen, Yang Qi
J. Micro/Nanolith. MEMS MOEMS 8(1), 013012 (1 January 2009) doi:10.1117/1.3074832
TOPICS: Silicon, Etching, Photomasks, Wet etching, Scanning electron microscopy, Silicon films, Confocal microscopy, Isotropic etching, Photomicroscopy, Titanium dioxide
Gary Glass, Johnny Dias, Alexander Dymnikov, Louis Houston, Bibhudutta Rout
J. Micro/Nanolith. MEMS MOEMS 8(1), 013013 (1 January 2009) doi:10.1117/1.3082185
TOPICS: Ions, Etching, Aluminum, Copper, Gold, Sputter deposition, Scanning electron microscopy, Dielectrics, Quartz, Sapphire
Ming-chuan Yang
J. Micro/Nanolith. MEMS MOEMS 8(1), 013015 (1 January 2009) doi:10.1117/1.3099700
TOPICS: Reticles, Photomasks, Critical dimension metrology, Diffraction, Phase shifts, Semiconducting wafers, Numerical simulations, Solids, Optical lithography, Error analysis
Toshiyuki Tsuchiya, Yasutake Ura, Yomoya Jomori, Koji Sugano, Osamu Tabata
J. Micro/Nanolith. MEMS MOEMS 8(1), 013020 (1 January 2009) doi:10.1117/1.3094745
TOPICS: Silicon, Etching, Photoresist materials, Crystals, Nanolithography, Polymerization, Polymers, Dry etching, Fullerenes, Nanowires
J. Micro/Nanolith. MEMS MOEMS 8(1), 013030 (1 January 2009) doi:10.1117/1.3082186
TOPICS: Mirrors, Micromirrors, Silicon, Platinum, Reflectivity, Aluminum, Temperature metrology, Endoscopy, Optical coherence tomography, Etching
Jae-Woong Kim, Seung-Boo Jung
J. Micro/Nanolith. MEMS MOEMS 8(1), 013040 (1 January 2009) doi:10.1117/1.3081417
TOPICS: Resistance, Copper, Particles, Plating, Electroplating, 3D modeling, Silicon, Semiconducting wafers, Scanning electron microscopy, Metals
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