Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 8 · NO. 1 | January 2009
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 8(1), 010101 (1 January 2009) https://doi.org/10.1117/1.3098441
TOPICS: Double patterning technology, Photomasks, Scanners, Optical lithography, Laser scanners, 3D scanning, Beam splitters, Reticles, Lithography, Logic
Special Section on Double-Patterning Lithography
J. Micro/Nanolith. MEMS MOEMS 8(1), 011001 (1 January 2009) https://doi.org/10.1117/1.3092834
TOPICS: Lithography, Double patterning technology, Optical lithography, Photoresist processing, Etching, Photomasks, Manufacturing, Overlay metrology, Critical dimension metrology, Semiconductors
J. Micro/Nanolith. MEMS MOEMS 8(1), 011002 (1 January 2009) https://doi.org/10.1117/1.3079349
TOPICS: Double patterning technology, Critical dimension metrology, Etching, Lithography, Photomasks, Reticles, Semiconducting wafers, Overlay metrology, Scanners, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 8(1), 011003 (1 January 2009) https://doi.org/10.1117/1.3023077
TOPICS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes
J. Micro/Nanolith. MEMS MOEMS 8(1), 011004 (1 January 2009) https://doi.org/10.1117/1.3023078
TOPICS: Photomasks, Reticles, Semiconducting wafers, Overlay metrology, Double patterning technology, Lithography, Image registration, Metrology, Critical dimension metrology, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 8(1), 011005 (1 January 2009) https://doi.org/10.1117/1.3066296
TOPICS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon
J. Micro/Nanolith. MEMS MOEMS 8(1), 011006 (1 January 2009) https://doi.org/10.1117/1.3042219
TOPICS: Double patterning technology, Image processing, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Printing, Reticles, Cadmium, Lithography, Line width roughness
J. Micro/Nanolith. MEMS MOEMS 8(1), 011007 (1 January 2009) https://doi.org/10.1117/1.3066632
TOPICS: Etching, Critical dimension metrology, Optical lithography, Optical proximity correction, Metals, Scanning electron microscopy, Semiconducting wafers, Photomasks, Double patterning technology, Tin
J. Micro/Nanolith. MEMS MOEMS 8(1), 011008 (1 January 2009) https://doi.org/10.1117/1.3023079
TOPICS: Overlay metrology, Double patterning technology, Tolerancing, Optical alignment, Semiconducting wafers, Optical lithography, Metrology, Control systems, Photomasks, Image processing
J. Micro/Nanolith. MEMS MOEMS 8(1), 011009 (1 January 2009) https://doi.org/10.1117/1.3059550
TOPICS: Lithography, Photomasks, Etching, Optical lithography, Critical dimension metrology, Anisotropic etching, Silicon, Amorphous silicon, Chemical vapor deposition, Transistors
J. Micro/Nanolith. MEMS MOEMS 8(1), 011010 (1 January 2009) https://doi.org/10.1117/1.3094746
TOPICS: Double patterning technology, Photoresist materials, Finite element methods, Photoresist processing, Scanning electron microscopy, Etching, Lithography, Optical lithography, Ultraviolet radiation, Image analysis
J. Micro/Nanolith. MEMS MOEMS 8(1), 011011 (1 January 2009) https://doi.org/10.1117/1.3095589
TOPICS: Lithography, Picture Archiving and Communication System, Photomasks, Nonlinear response, Computer simulations, Imaging systems, Photons, Electroluminescence, Photoresist developing, Absorbance
Articles
J. Micro/Nanolith. MEMS MOEMS 8(1), 013003 (1 January 2009) https://doi.org/10.1117/1.3059551
TOPICS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 8(1), 013004 (1 January 2009) https://doi.org/10.1117/1.3079782
TOPICS: Data modeling, Line width roughness, Critical dimension metrology, Nanoimprint lithography, Lithography, Process modeling, Optical lithography, Lithographic illumination, Semiconducting wafers, Inspection
J. Micro/Nanolith. MEMS MOEMS 8(1), 013010 (1 January 2009) https://doi.org/10.1117/1.3066798
TOPICS: Photoresist materials, Analog electronics, Modulation, Photoresist developing, Photomasks, Refractive index, Optical components, Overlay metrology, Scanning electron microscopy, Electron beam lithography
J. Micro/Nanolith. MEMS MOEMS 8(1), 013011 (1 January 2009) https://doi.org/10.1117/1.3066521
TOPICS: Silicon, Nanoimprint lithography, Chromophores, Second-harmonic generation, Self-assembled monolayers, Nonlinear optics, Reactive ion etching, Waveguides, Etching, Photonic crystals
J. Micro/Nanolith. MEMS MOEMS 8(1), 013012 (1 January 2009) https://doi.org/10.1117/1.3074832
TOPICS: Silicon, Etching, Photomasks, Wet etching, Scanning electron microscopy, Silicon films, Confocal microscopy, Isotropic etching, Photomicroscopy, Titanium dioxide
J. Micro/Nanolith. MEMS MOEMS 8(1), 013013 (1 January 2009) https://doi.org/10.1117/1.3082185
TOPICS: Ions, Etching, Aluminum, Copper, Gold, Sputter deposition, Scanning electron microscopy, Dielectrics, Quartz, Sapphire
J. Micro/Nanolith. MEMS MOEMS 8(1), 013015 (1 January 2009) https://doi.org/10.1117/1.3099700
TOPICS: Reticles, Photomasks, Critical dimension metrology, Diffraction, Phase shifts, Semiconducting wafers, Numerical simulations, Solids, Optical lithography, Error analysis
J. Micro/Nanolith. MEMS MOEMS 8(1), 013020 (1 January 2009) https://doi.org/10.1117/1.3094745
TOPICS: Silicon, Etching, Photoresist materials, Crystals, Nanolithography, Polymerization, Polymers, Dry etching, Fullerenes, Nanowires
J. Micro/Nanolith. MEMS MOEMS 8(1), 013030 (1 January 2009) https://doi.org/10.1117/1.3082186
TOPICS: Mirrors, Micromirrors, Silicon, Platinum, Reflectivity, Aluminum, Temperature metrology, Endoscopy, Optical coherence tomography, Etching
J. Micro/Nanolith. MEMS MOEMS 8(1), 013040 (1 January 2009) https://doi.org/10.1117/1.3081417
TOPICS: Resistance, Copper, Particles, Plating, Electroplating, 3D modeling, Silicon, Semiconducting wafers, Scanning electron microscopy, Metals
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