Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 8 · NO. 4 | October 2009
CONTENTS
Special Section on Extreme-Ultraviolet Lithography
J. Micro/Nanolith. MEMS MOEMS 8(4), 040901 (1 October 2009) https://doi.org/10.1117/1.3272639
TOPICS: Extreme ultraviolet lithography, Lithography, Integrated circuits, Scanners, Manufacturing, Photomasks, Electronic design automation, Optics manufacturing, Chemical elements, X-ray lithography
J. Micro/Nanolith. MEMS MOEMS 8(4), 041501 (1 October 2009) https://doi.org/10.1117/1.3273965
TOPICS: Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photomasks, Line edge roughness, Lithography, Light sources, Optics manufacturing, Integrated circuits, Deep ultraviolet
J. Micro/Nanolith. MEMS MOEMS 8(4), 041502 (1 October 2009) https://doi.org/10.1117/1.3238514
TOPICS: Mirrors, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Deep ultraviolet, Plasma, Data modeling, Ultraviolet radiation, Photomasks
J. Micro/Nanolith. MEMS MOEMS 8(4), 041503 (1 October 2009) https://doi.org/10.1117/1.3224901
TOPICS: Plasma, Extreme ultraviolet, Spherical lenses, Extreme ultraviolet lithography, Performance modeling, Computer simulations, Absorption, Computing systems, Tin, Systems modeling
J. Micro/Nanolith. MEMS MOEMS 8(4), 041504 (1 October 2009) https://doi.org/10.1117/1.3224942
TOPICS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources
J. Micro/Nanolith. MEMS MOEMS 8(4), 041505 (1 October 2009) https://doi.org/10.1117/1.3238515
TOPICS: Metrology, Fractal analysis, Point spread functions, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Calibration, Scanning electron microscopy, Visualization, Convolution
J. Micro/Nanolith. MEMS MOEMS 8(4), 041506 (1 October 2009) https://doi.org/10.1117/1.3238518
TOPICS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics
J. Micro/Nanolith. MEMS MOEMS 8(4), 041507 (1 October 2009) https://doi.org/10.1117/1.3238522
TOPICS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, EUV optics, Resolution enhancement technologies, Multilayers, Reflectivity, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 8(4), 041508 (1 October 2009) https://doi.org/10.1117/1.3238542
TOPICS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten
J. Micro/Nanolith. MEMS MOEMS 8(4), 041509 (1 October 2009) https://doi.org/10.1117/1.3238543
TOPICS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 8(4), 041510 (1 October 2009) https://doi.org/10.1117/1.3275786
TOPICS: Semiconducting wafers, Optical alignment, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist processing, Photomasks, Overlay metrology, Image processing, Semiconductors
Articles
J. Micro/Nanolith. MEMS MOEMS 8(4), 043001 (1 October 2009) https://doi.org/10.1117/1.3263702
TOPICS: Photomasks, Atrial fibrillation, Image quality, Photovoltaics, Lithography, Optical proximity correction, Semiconducting wafers, Phase shifts, Model-based design, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 8(4), 043002 (1 October 2009) https://doi.org/10.1117/1.3256131
TOPICS: Speckle, Speckle pattern, Line width roughness, Reticles, Optical lithography, Semiconducting wafers, Temporal coherence, Pulsed laser operation, Spatial coherence, Spatial frequencies
J. Micro/Nanolith. MEMS MOEMS 8(4), 043003 (1 October 2009) https://doi.org/10.1117/1.3256007
TOPICS: Speckle, Diffractive optical elements, Speckle pattern, Reticles, Lithographic illumination, Fourier transforms, Fiber optic illuminators, Excimers, Line edge roughness, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 8(4), 043004 (1 October 2009) https://doi.org/10.1117/1.3268365
TOPICS: Etching, Plasma etching, Line edge roughness, Anisotropic etching, Photoresist processing, 3D modeling, Line width roughness, Photoresist materials, Plasma, Silicon
J. Micro/Nanolith. MEMS MOEMS 8(4), 043005 (1 October 2009) https://doi.org/10.1117/1.3238544
TOPICS: Optical proximity correction, Computer simulations, Semiconducting wafers, Image quality, Photomasks, Lithography, Resolution enhancement technologies, Tolerancing, Diffusion, Image processing
J. Micro/Nanolith. MEMS MOEMS 8(4), 043007 (1 October 2009) https://doi.org/10.1117/1.3268422
TOPICS: Etching, Polymers, Fluorine, Ions, Plasma, Chemical species, Semiconducting wafers, Oxygen, Carbon, Silicon
J. Micro/Nanolith. MEMS MOEMS 8(4), 043010 (1 October 2009) https://doi.org/10.1117/1.3259205
TOPICS: Deep ultraviolet, Absorbance, Polymers, Energy efficiency, Photons, Electron beams, Spectroscopic ellipsometry, Extreme ultraviolet, Refractive index, Absorption
J. Micro/Nanolith. MEMS MOEMS 8(4), 043011 (1 October 2009) https://doi.org/10.1117/1.3274005
TOPICS: Polymers, Extreme ultraviolet, Polymethylmethacrylate, Electron beam lithography, Fluorine, Magnesium, Photomasks, Liquids, Chemistry, Lithography
J. Micro/Nanolith. MEMS MOEMS 8(4), 043012 (1 October 2009) https://doi.org/10.1117/1.3273966
TOPICS: Etching, Thin films, Photoresist materials, Silicon, Fresnel lenses, Reactive ion etching, Chalcogenide glass, Arsenic, Photomasks, Silver
J. Micro/Nanolith. MEMS MOEMS 8(4), 043015 (1 October 2009) https://doi.org/10.1117/1.3247857
TOPICS: Semiconducting wafers, Optical lithography, Lithography, Overlay metrology, Scanners, Shape analysis, Data modeling, Finite element methods, Error analysis, Chemical elements
J. Micro/Nanolith. MEMS MOEMS 8(4), 043020 (1 October 2009) https://doi.org/10.1117/1.3238545
TOPICS: Switches, Semiconducting wafers, Silicon, Wafer bonding, Gold, Electrodes, Photoresist materials, Glasses, Metals, Signal processing
J. Micro/Nanolith. MEMS MOEMS 8(4), 043025 (1 October 2009) https://doi.org/10.1117/1.3227904
TOPICS: Diffusion, Polymers, Microelectromechanical systems, In situ metrology, Optical testing, Fringe analysis, Calibration, Helium, Interferometry, Finite element methods
J. Micro/Nanolith. MEMS MOEMS 8(4), 043030 (1 October 2009) https://doi.org/10.1117/1.3249657
TOPICS: Laser damage threshold, Microelectromechanical systems, Continuous wave operation, Laser irradiation, Laser induced damage, Semiconductor lasers, Infrared radiation, Multilayers, Absorption, Thermography
J. Micro/Nanolith. MEMS MOEMS 8(4), 043035 (1 October 2009) https://doi.org/10.1117/1.3256006
TOPICS: Micromirrors, Adhesives, Optical switching, Mirrors, Microopto electromechanical systems, Computer programming, Machine vision, Computer vision technology, Microscopes, Printing
J. Micro/Nanolith. MEMS MOEMS 8(4), 043040 (1 October 2009) https://doi.org/10.1117/1.3249659
TOPICS: Capacitance, Feedback control, Mirrors, Control systems, Actuators, Microelectromechanical systems, Deformable mirrors, Oscillators, Capacitors, Electrodes
J. Micro/Nanolith. MEMS MOEMS 8(4), 043045 (1 October 2009) https://doi.org/10.1117/1.3256005
TOPICS: Magnetism, Actuators, Photomasks, Etching, Iron, Anisotropic etching, Silicon, Photoresist materials, Aluminum, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 8(4), 043046 (1 October 2009) https://doi.org/10.1117/1.3274611
TOPICS: Magnetism, Aluminum, Etching, Copper, Electroplating, Chromium, Photoresist materials, Electromagnetism, Photomasks, Iron
J. Micro/Nanolith. MEMS MOEMS 8(4), 043050 (1 October 2009) https://doi.org/10.1117/1.3268427
TOPICS: Oxides, Atomic force microscopy, Silicon, Nanolithography, Superposition, Humidity, Molecular assembly, Reliability, Surface roughness, Oxidation
J. Micro/Nanolith. MEMS MOEMS 8(4), 043055 (1 October 2009) https://doi.org/10.1117/1.3273963
TOPICS: Magnetism, Copper, Multilayers, Resistance, Electrodes, Silicon, Crystals, Magnetic sensors, Cobalt, Nanowires
J. Micro/Nanolith. MEMS MOEMS 8(4), 043060 (1 October 2009) https://doi.org/10.1117/1.3258487
TOPICS: Silicon, Etching, Resonators, Microrings, Chromium, Waveguides, Electron beam lithography, Plasma, Photomasks, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 8(4), 043065 (1 October 2009) https://doi.org/10.1117/1.3268366
TOPICS: Polymethylmethacrylate, Silicon, Actuators, Microactuators, Polymers, Polymeric actuators, Gold, Electrodes, Laser cutting, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 8(4), 043070 (1 October 2009) https://doi.org/10.1117/1.3275723
TOPICS: Semiconducting wafers, Photomasks, Diffraction, Waveguides, Lithography, Refractive index, Computer simulations, Optical proximity correction, Reflectivity, Photoresist materials
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