journal of micro nanolithography mems and moems
VOL. 8 · NO. 4 | October 2009
CONTENTS
Special Section on Extreme-Ultraviolet Lithography
J. Micro/Nanolith. MEMS MOEMS 8(4), 040901 (1 October 2009) doi:10.1117/1.3272639
TOPICS: Extreme ultraviolet lithography, Lithography, Integrated circuits, Scanners, Manufacturing, Photomasks, Electronic design automation, Optics manufacturing, Chemical elements, X-ray lithography
J. Micro/Nanolith. MEMS MOEMS 8(4), 041501 (1 October 2009) doi:10.1117/1.3273965
TOPICS: Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photomasks, Line edge roughness, Lithography, Light sources, Optics manufacturing, Integrated circuits, Deep ultraviolet
J. Micro/Nanolith. MEMS MOEMS 8(4), 041502 (1 October 2009) doi:10.1117/1.3238514
TOPICS: Mirrors, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Deep ultraviolet, Plasma, Data modeling, Ultraviolet radiation, Photomasks
J. Micro/Nanolith. MEMS MOEMS 8(4), 041503 (1 October 2009) doi:10.1117/1.3224901
TOPICS: Plasma, Extreme ultraviolet, Spherical lenses, Extreme ultraviolet lithography, Performance modeling, Computer simulations, Absorption, Computing systems, Tin, Systems modeling
J. Micro/Nanolith. MEMS MOEMS 8(4), 041504 (1 October 2009) doi:10.1117/1.3224942
TOPICS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources
J. Micro/Nanolith. MEMS MOEMS 8(4), 041505 (1 October 2009) doi:10.1117/1.3238515
TOPICS: Metrology, Fractal analysis, Point spread functions, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Calibration, Scanning electron microscopy, Visualization, Convolution
J. Micro/Nanolith. MEMS MOEMS 8(4), 041506 (1 October 2009) doi:10.1117/1.3238518
TOPICS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa
J. Micro/Nanolith. MEMS MOEMS 8(4), 041507 (1 October 2009) doi:10.1117/1.3238522
TOPICS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, EUV optics, Resolution enhancement technologies, Multilayers, Reflectivity, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 8(4), 041508 (1 October 2009) doi:10.1117/1.3238542
TOPICS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten
J. Micro/Nanolith. MEMS MOEMS 8(4), 041509 (1 October 2009) doi:10.1117/1.3238543
TOPICS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction
Kazuo Tawarayama, Hajime Aoyama, Shunko Magoshi, Yuusuke Tanaka, Seiichiro Shirai, Hiroyuki Tanaka
J. Micro/Nanolith. MEMS MOEMS 8(4), 041510 (1 October 2009) doi:10.1117/1.3275786
TOPICS: Semiconducting wafers, Optical alignment, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist processing, Photomasks, Overlay metrology, Image processing, Semiconductors
Articles
J. Micro/Nanolith. MEMS MOEMS 8(4), 043001 (1 October 2009) doi:10.1117/1.3263702
TOPICS: Photomasks, Atrial fibrillation, Image quality, Photovoltaics, Lithography, Optical proximity correction, Semiconducting wafers, Phase shifts, Model-based design, Lithographic illumination
Oscar Noordman, Andrey Tychkov, Jan Baselmans, James Tsacoyeanes, Gary Politi, Michael Patra, Vladan Blahnik, Manfred Maul
J. Micro/Nanolith. MEMS MOEMS 8(4), 043002 (1 October 2009) doi:10.1117/1.3256131
TOPICS: Speckle, Speckle pattern, Line width roughness, Reticles, Optical lithography, Semiconducting wafers, Temporal coherence, Pulsed laser operation, Spatial coherence, Spatial frequencies
Gregg Gallatin, Naonori Kita, Tomoko Ujike, William Partlo
J. Micro/Nanolith. MEMS MOEMS 8(4), 043003 (1 October 2009) doi:10.1117/1.3256007
TOPICS: Speckle, Diffractive optical elements, Speckle pattern, Reticles, Lithographic illumination, Fourier transforms, Fiber optic illuminators, Excimers, Line edge roughness, Semiconducting wafers
Vassilios Constantoudis, George Kokkoris, Panayiota Xydi, Evangelos Gogolides, Erwine Pargon, Mickael Martin
J. Micro/Nanolith. MEMS MOEMS 8(4), 043004 (1 October 2009) doi:10.1117/1.3268365
TOPICS: Etching, Plasma etching, Line edge roughness, Anisotropic etching, Photoresist processing, 3D modeling, Line width roughness, Photoresist materials, Plasma, Silicon
Liang Zhu, Xiaohui Kang, Yili Gu, Steve Yang
J. Micro/Nanolith. MEMS MOEMS 8(4), 043005 (1 October 2009) doi:10.1117/1.3238544
TOPICS: Optical proximity correction, Computer simulations, Semiconducting wafers, Image quality, Photomasks, Lithography, Resolution enhancement technologies, Tolerancing, Diffusion, Image processing
Valeriy Sukharev, Ara Markosian, Armen Kteyan, Levon Manukyan, Nikolay Khachatryan, Jun-Ho Choy, Hasmik Lazaryan, Henrik Hovsepyan, Seiji Onoue, Takuo Kikuchi, Tetsuya Kamigaki
J. Micro/Nanolith. MEMS MOEMS 8(4), 043007 (1 October 2009) doi:10.1117/1.3268422
TOPICS: Etching, Polymers, Fluorine, Ions, Plasma, Chemical species, Semiconducting wafers, Oxygen, Carbon, Silicon
J. Micro/Nanolith. MEMS MOEMS 8(4), 043010 (1 October 2009) doi:10.1117/1.3259205
TOPICS: Deep ultraviolet, Absorbance, Polymers, Energy efficiency, Photons, Electron beams, Spectroscopic ellipsometry, Extreme ultraviolet, Refractive index, Absorption
Jeffrey Strahan, Jacob Adams, Kane Jen, Anja Vanleenhove, Colin Neikirk, Timothy Rochelle, Roel Gronheid, Carlton Willson
J. Micro/Nanolith. MEMS MOEMS 8(4), 043011 (1 October 2009) doi:10.1117/1.3274005
TOPICS: Polymers, Extreme ultraviolet, Polymethylmethacrylate, Electron beam lithography, Fluorine, Magnesium, Photomasks, Liquids, Chemistry, Lithography
Andriy Kovalskyy, Jiri Cech, Miroslav Vlcek, Christopher Waits, Madan Dubey, William Heffner, Himanshu Jain
J. Micro/Nanolith. MEMS MOEMS 8(4), 043012 (1 October 2009) doi:10.1117/1.3273966
TOPICS: Etching, Thin films, Photoresist materials, Silicon, Fresnel lenses, Reactive ion etching, Chalcogenide glass, Arsenic, Photomasks, Silver
J. Micro/Nanolith. MEMS MOEMS 8(4), 043015 (1 October 2009) doi:10.1117/1.3247857
TOPICS: Semiconducting wafers, Optical lithography, Lithography, Overlay metrology, Scanners, Shape analysis, Data modeling, Finite element methods, Error analysis, Chemical elements
Jongseok Kim, Sangwook Kwan, Youngtack Hong, Insang Song, Hee-Moon Jeong, Hyung Choi, Byeong-Kwon Ju
J. Micro/Nanolith. MEMS MOEMS 8(4), 043020 (1 October 2009) doi:10.1117/1.3238545
TOPICS: Switches, Semiconducting wafers, Silicon, Wafer bonding, Gold, Electrodes, Photoresist materials, Glasses, Metals, Signal processing
Changsoo Jang, Arindam Goswami, Bongtae Han, Suk-Jin Ham
J. Micro/Nanolith. MEMS MOEMS 8(4), 043025 (1 October 2009) doi:10.1117/1.3227904
TOPICS: Diffusion, Polymers, Microelectromechanical systems, In situ metrology, Optical testing, Fringe analysis, Calibration, Helium, Interferometry, Finite element methods
Justin Serrano, Leslie Phinney
J. Micro/Nanolith. MEMS MOEMS 8(4), 043030 (1 October 2009) doi:10.1117/1.3249657
TOPICS: Laser damage threshold, Microelectromechanical systems, Continuous wave operation, Laser irradiation, Laser induced damage, Semiconductor lasers, Infrared radiation, Multilayers, Absorption, Thermography
Lidai Wang, James Mills, William Cleghorn
J. Micro/Nanolith. MEMS MOEMS 8(4), 043035 (1 October 2009) doi:10.1117/1.3256006
TOPICS: Micromirrors, Adhesives, Optical switching, Mirrors, Microopto electromechanical systems, Computer programming, Machine vision, Computer vision technology, Microscopes, Printing
Sarah Lukes, Phillip Himmer, Eric Moog, Steven Shaw, David Dickensheets
J. Micro/Nanolith. MEMS MOEMS 8(4), 043040 (1 October 2009) doi:10.1117/1.3249659
TOPICS: Capacitance, Feedback control, Mirrors, Control systems, Actuators, Microelectromechanical systems, Deformable mirrors, Oscillators, Capacitors, Electrodes
Nan-Chyuan Tsai, Bing-Hong Liou, Chih-Che Lin
J. Micro/Nanolith. MEMS MOEMS 8(4), 043045 (1 October 2009) doi:10.1117/1.3256005
TOPICS: Magnetism, Actuators, Photomasks, Etching, Iron, Anisotropic etching, Silicon, Photoresist materials, Aluminum, Semiconducting wafers
Nan-Chyuan Tsai, Jiun-Sheng Liou, Chih-Che Lin, Tuan Li
J. Micro/Nanolith. MEMS MOEMS 8(4), 043046 (1 October 2009) doi:10.1117/1.3274611
TOPICS: Magnetism, Aluminum, Etching, Copper, Electroplating, Chromium, Photoresist materials, Electromagnetism, Photomasks, Iron
Ampere Tseng, Tae-Woo Lee, Andrea Notargiacomo, Tupei Chen
J. Micro/Nanolith. MEMS MOEMS 8(4), 043050 (1 October 2009) doi:10.1117/1.3268427
TOPICS: Oxides, Atomic force microscopy, Silicon, Nanolithography, Superposition, Humidity, Molecular assembly, Reliability, Surface roughness, Oxidation
Thong Le, Hargsoon Yoon, Linfeng Chen, Roy McCann, Vijay Varadan
J. Micro/Nanolith. MEMS MOEMS 8(4), 043055 (1 October 2009) doi:10.1117/1.3273963
TOPICS: Magnetism, Copper, Multilayers, Resistance, Electrodes, Silicon, Crystals, Magnetic sensors, Cobalt, Nanowires
Yao Chen, Junbo Feng, Zhiping Zhou, Jun Yu, Christopher Summers, David Citrin
J. Micro/Nanolith. MEMS MOEMS 8(4), 043060 (1 October 2009) doi:10.1117/1.3258487
TOPICS: Silicon, Etching, Resonators, Microrings, Chromium, Waveguides, Electron beam lithography, Plasma, Photomasks, Scanning electron microscopy
Satoshi Amaya, Dzung Dao, Susumu Sugiyama
J. Micro/Nanolith. MEMS MOEMS 8(4), 043065 (1 October 2009) doi:10.1117/1.3268366
TOPICS: Polymethylmethacrylate, Silicon, Actuators, Microactuators, Polymers, Polymeric actuators, Gold, Electrodes, Laser cutting, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 8(4), 043070 (1 October 2009) doi:10.1117/1.3275723
TOPICS: Semiconducting wafers, Photomasks, Diffraction, Waveguides, Lithography, Refractive index, Computer simulations, Optical proximity correction, Reflectivity, Photoresist materials
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