Fabrication of silicon microring resonator with smooth sidewalls

Yao Chen; Junbo Feng; Zhiping Zhou; Jun Yu; Christopher J. Summers; David S. Citrin

doi:10.1117/1.3258487

1 October 2009 Fabrication of silicon microring resonator with smooth sidewalls

Yao Chen, Junbo Feng, Zhiping Zhou, Jun Yu, Christopher J. Summers, David S. Citrin

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 4, 043060 (October 2009). https://doi.org/10.1117/1.3258487

Abstract

Fabrication of silicon microring resonators was optimized by using electron-beam lithography (EBL) and inductively coupled plasma (ICP) etching with different mask materials. Sidewall roughness of less than 10 nm was revealed by high-resolution scanning electron microscopy (SEM) without any post-etch process. The fabrication processes are described in detail, and comparisons are made in consideration of process complexity, process latitude, and sidewall roughness.

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Yao Chen, Junbo Feng, Zhiping Zhou, Jun Yu, Christopher J. Summers, and David S. Citrin "Fabrication of silicon microring resonator with smooth sidewalls," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(4), 043060 (1 October 2009). https://doi.org/10.1117/1.3258487

Published: 1 October 2009

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