Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 8 · NO. 3 | July 2009
CONTENTS
Editorial
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 8(3), 030501 (1 July 2009) https://doi.org/10.1117/1.3158356
TOPICS: 3D modeling, Critical dimension metrology, Data modeling, Photomasks, Calibration, Cadmium, Optical proximity correction, Lithography, 3D acquisition, SRAF
Special Section on Reliability, Packaging, Testing, and Characterization of MEMS and MOEMS
J. Micro/Nanolith. MEMS MOEMS 8(3), 031301 (1 July 2009) https://doi.org/10.1117/1.3236753
TOPICS: Reliability, Packaging, Microelectromechanical systems, Microopto electromechanical systems, Nanofabrication
J. Micro/Nanolith. MEMS MOEMS 8(3), 031302 (1 July 2009) https://doi.org/10.1117/1.3152364
TOPICS: Far-field diffraction, Near field optics, Image sensors, Wafer-level optics, Diffraction, Semiconductor lasers, Silicon, Edge roughness, Statistical analysis, Optics manufacturing
J. Micro/Nanolith. MEMS MOEMS 8(3), 031303 (1 July 2009) https://doi.org/10.1117/1.3152362
TOPICS: Microelectromechanical systems, Dielectrics, Radiation effects, Silicon, Space operations, Sensors, Electrons, Switches, Particles, Electronics
J. Micro/Nanolith. MEMS MOEMS 8(3), 031304 (1 July 2009) https://doi.org/10.1117/1.3152363
TOPICS: Electromagnetism, Magnetism, Ceramics, Silver, Device simulation, Chemical elements, Process modeling, Prototyping, Microelectromechanical systems, Chemical analysis
J. Micro/Nanolith. MEMS MOEMS 8(3), 031305 (1 July 2009) https://doi.org/10.1117/1.3152368
TOPICS: Electrodes, Argon, Protactinium, Microelectromechanical systems, Helium, Aluminum, Electrons, Electrical breakdown, Nitrogen, Plasma
J. Micro/Nanolith. MEMS MOEMS 8(3), 031306 (1 July 2009) https://doi.org/10.1117/1.3158610
TOPICS: Carbon monoxide, Sensors, Humidity, Gas sensors, Reflectors, Phase shifts, Reflection, Polymers, Acoustics, Temperature metrology
J. Micro/Nanolith. MEMS MOEMS 8(3), 031307 (1 July 2009) https://doi.org/10.1117/1.3158064
TOPICS: Microelectromechanical systems, Hydrogen, Packaging, Gases, Carbon monoxide, Infrared sensors, Manufacturing, Zirconium, Sensors, Gyroscopes
J. Micro/Nanolith. MEMS MOEMS 8(3), 031308 (1 July 2009) https://doi.org/10.1117/1.3158067
TOPICS: Microelectromechanical systems, Actuators, Deformable mirrors, Mirrors, Surface finishing, Ceramics, Electronics, Optical components, Electrodes, Silicon
J. Micro/Nanolith. MEMS MOEMS 8(3), 031309 (1 July 2009) https://doi.org/10.1117/1.3167825
TOPICS: Resistors, Resistance, Oxides, Etching, Surface micromachining, Thin films, Reactive ion etching, Microelectronics, Wet etching, Profilometers
Special Section on Computational Lithography
J. Micro/Nanolith. MEMS MOEMS 8(3), 031401 (1 July 2009) https://doi.org/10.1117/1.3240492
TOPICS: Computational lithography, Lithography, Imaging systems, Optics manufacturing, Photoresist materials, Computer simulations, Image processing, Optical proximity correction, Computing systems, Optical design
J. Micro/Nanolith. MEMS MOEMS 8(3), 031402 (1 July 2009) https://doi.org/10.1117/1.3152372
TOPICS: Finite-difference time-domain method, Extreme ultraviolet, Photomasks, Computer simulations, Ray tracing, Extreme ultraviolet lithography, Lithography, Fourier transforms, Finite element methods, Near field
J. Micro/Nanolith. MEMS MOEMS 8(3), 031403 (1 July 2009) https://doi.org/10.1117/1.3158611
TOPICS: Photomasks, Interfaces, Waveguides, Computer simulations, Scattering, Electromagnetism, Finite-difference time-domain method, Lithography, Semiconducting wafers, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 8(3), 031404 (1 July 2009) https://doi.org/10.1117/1.3173803
TOPICS: Zernike polynomials, Polarization, Wavefronts, Apodization, Wave plates, Resolution enhancement technologies, Polarizers, Lithography, Critical dimension metrology, Imaging systems
J. Micro/Nanolith. MEMS MOEMS 8(3), 031405 (1 July 2009) https://doi.org/10.1117/1.3158613
TOPICS: Photomasks, Binary data, Wavelets, Lithography, Linear filtering, Visualization, Optical proximity correction, Inverse optics, Optical lithography, Resolution enhancement technologies
J. Micro/Nanolith. MEMS MOEMS 8(3), 031406 (1 July 2009) https://doi.org/10.1117/1.3206980
TOPICS: Fourier transforms, Linear filtering, Image transmission, Resolution enhancement technologies, Computer simulations, Phase shifting, Photomasks, Binary data, Coherence imaging, Lithography
J. Micro/Nanolith. MEMS MOEMS 8(3), 031407 (1 July 2009) https://doi.org/10.1117/1.3213237
TOPICS: Reconstruction algorithms, System on a chip, Projection systems, Photomasks, Matrices, Optical lithography, Image transmission, Optical proximity correction, Vector spaces, Statistical analysis
Articles
J. Micro/Nanolith. MEMS MOEMS 8(3), 033001 (1 July 2009) https://doi.org/10.1117/1.3158612
TOPICS: Photoresist developing, Stochastic processes, Photoresist materials, Surface roughness, Interfaces, Lithography, Polymers, Molecules, Etching, Line edge roughness
J. Micro/Nanolith. MEMS MOEMS 8(3), 033002 (1 July 2009) https://doi.org/10.1117/1.3158061
TOPICS: Semiconducting wafers, Double patterning technology, Lithography, Optical lithography, Etching, Photomasks, Optical proximity correction, Metals, Standards development, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 8(3), 033003 (1 July 2009) https://doi.org/10.1117/1.3190168
TOPICS: Monte Carlo methods, Scattering, Scanning electron microscopy, Silicon, Data modeling, Copper, Electron microscopes, Dielectrics, Model-based design, Binary data
J. Micro/Nanolith. MEMS MOEMS 8(3), 033004 (1 July 2009) https://doi.org/10.1117/1.3158307
TOPICS: Semiconducting wafers, Nanoimprint lithography, Waveguides, Etching, Semiconductor lasers, Lithography, Particles, Photomasks, Nanostructures, Electron beam lithography
J. Micro/Nanolith. MEMS MOEMS 8(3), 033005 (1 July 2009) https://doi.org/10.1117/1.3224949
TOPICS: Calibration, 3D modeling, Data modeling, SRAF, Photomasks, Printing, Cadmium sulfide, Lithography, Optical proximity correction, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 8(3), 033006 (1 July 2009) https://doi.org/10.1117/1.3224950
TOPICS: Microfluidics, Water, Microfluidic imaging, Semiconducting wafers, Immersion lithography, Crystals, Liquids, Quartz, Printing, Lithography
J. Micro/Nanolith. MEMS MOEMS 8(3), 033007 (1 July 2009) https://doi.org/10.1117/1.3213232
TOPICS: Tolerancing, Lithography, Photomasks, Semiconducting wafers, Feature extraction, Optical proximity correction, Manufacturing, Scanning electron microscopy, Metals, Etching
J. Micro/Nanolith. MEMS MOEMS 8(3), 033008 (1 July 2009) https://doi.org/10.1117/1.3210241
TOPICS: Semiconducting wafers, Overlay metrology, Scanners, Semiconductors, Optical alignment, Optical lithography, Metrology, Process control, Source mask optimization, Electronics
J. Micro/Nanolith. MEMS MOEMS 8(3), 033009 (1 July 2009) https://doi.org/10.1117/1.3222910
TOPICS: Optical filters, Nickel, Optical lithography, Photoresist materials, Dielectrics, Transmittance, Dielectric filters, Multilayers, Glasses, Chemical elements
J. Micro/Nanolith. MEMS MOEMS 8(3), 033010 (1 July 2009) https://doi.org/10.1117/1.3158617
TOPICS: X-rays, Photomasks, Polymethylmethacrylate, X-ray lithography, Silicon, Scanning electron microscopy, X-ray technology, Nickel, X-ray imaging, Self-assembled monolayers
J. Micro/Nanolith. MEMS MOEMS 8(3), 033011 (1 July 2009) https://doi.org/10.1117/1.3184795
TOPICS: Electrodes, Silicon, Brain, Tissues, Microelectromechanical systems, Semiconducting wafers, Chromium, Metals, Interfaces, Microfabrication
J. Micro/Nanolith. MEMS MOEMS 8(3), 033012 (1 July 2009) https://doi.org/10.1117/1.3158616
TOPICS: Etching, Microchannel plates, Silicon, Lamps, Semiconducting wafers, Scanning electron microscopy, Halogens, High aspect ratio silicon micromachining, Electrochemical etching, Scattering
J. Micro/Nanolith. MEMS MOEMS 8(3), 033013 (1 July 2009) https://doi.org/10.1117/1.3158071
TOPICS: Proteins, Microfluidics, Molecules, Luminescence, Chemistry, Diffusion, Glasses, Microfluidic imaging, Fluid dynamics, Imaging systems
J. Micro/Nanolith. MEMS MOEMS 8(3), 033014 (1 July 2009) https://doi.org/10.1117/1.3206971
TOPICS: Finite element methods, Silicon, Surgery, Etching, Semiconducting wafers, Microelectromechanical systems, Resistance, Microfluidics, Proteins, Silica
J. Micro/Nanolith. MEMS MOEMS 8(3), 033020 (1 July 2009) https://doi.org/10.1117/1.3158355
TOPICS: Capacitance, Aluminum, Microelectromechanical systems, Roads, Electromechanical design, Mechanical engineering, Beam analyzers, Instrument modeling, Manufacturing, Finite element methods
J. Micro/Nanolith. MEMS MOEMS 8(3), 033021 (1 July 2009) https://doi.org/10.1117/1.3184796
TOPICS: Sensors, Electrodes, Oxides, Reactive ion etching, Microelectromechanical systems, Silicon, Numerical simulations, Finite element methods, Photomasks, Etching
J. Micro/Nanolith. MEMS MOEMS 8(3), 033030 (1 July 2009) https://doi.org/10.1117/1.3158358
TOPICS: Silicon, Multilayers, Sputter deposition, Ion beams, Silicon carbide, Ions, Silicon films, Protactinium, Thin films, Mechanical engineering
J. Micro/Nanolith. MEMS MOEMS 8(3), 033040 (1 July 2009) https://doi.org/10.1117/1.3167840
TOPICS: Interferometry, Adaptive optics, Microelectromechanical systems, National Ignition Facility, Wavefronts, Laser beam diagnostics, Wavefront sensors, Mirrors, High power lasers, Optical simulations
J. Micro/Nanolith. MEMS MOEMS 8(3), 033050 (1 July 2009) https://doi.org/10.1117/1.3196547
TOPICS: Electrodes, Phase shifts, Semiconducting wafers, Silicon, Chlorine, Silver, Ions, Liquids, Solid state physics, Capacitance
J. Micro/Nanolith. MEMS MOEMS 8(3), 033060 (1 July 2009) https://doi.org/10.1117/1.3213247
TOPICS: Resonators, Geometrical optics, Dielectrics, Finite element methods, Waveguides, Microresonators, Refractive index, Error analysis, Extremely high frequency, Magnetism
J. Micro/Nanolith. MEMS MOEMS 8(3), 033070 (1 July 2009) https://doi.org/10.1117/1.3213252
TOPICS: Composites, Sensors, Picosecond phenomena, Silicon, Humidity, Crystals, Semiconducting wafers, Microelectromechanical systems, Scanning electron microscopy, Metals
J. Micro/Nanolith. MEMS MOEMS 8(3), 033071 (1 July 2009) https://doi.org/10.1117/1.3222918
TOPICS: Microelectromechanical systems, Sensors, Thermography, Optical sensors, Dielectrics, Optical spheres, Prototyping, Temperature metrology, Fiber couplers, Charged particle optics
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 8(3), 039701 (1 July 2009) https://doi.org/10.1117/1.3196431
TOPICS: Magnetostrictive materials, Magnetism, Thin films, Silicon, Actuators, Microelectromechanical systems, Capacitance, Iron, Sputter deposition, Thin film deposition
Back to Top