journal of micro nanolithography mems and moems
VOL. 8 · NO. 3 | July 2009
CONTENTS
Editorial
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 8(3), 030501 (1 July 2009) https://doi.org/10.1117/1.3158356
TOPICS: 3D modeling, Critical dimension metrology, Data modeling, Photomasks, Calibration, Cadmium, Optical proximity correction, Lithography, 3D acquisition, SRAF
Special Section on Reliability, Packaging, Testing, and Characterization of MEMS and MOEMS
J. Micro/Nanolith. MEMS MOEMS 8(3), 031301 (1 July 2009) https://doi.org/10.1117/1.3236753
TOPICS: Reliability, Packaging, Microelectromechanical systems, Microopto electromechanical systems, Nanofabrication
Sarun Sumriddetchkajorn, Kosom Chaitavon
J. Micro/Nanolith. MEMS MOEMS 8(3), 031302 (1 July 2009) https://doi.org/10.1117/1.3152364
TOPICS: Far-field diffraction, Near field optics, Image sensors, Wafer-level optics, Diffraction, Semiconductor lasers, Silicon, Edge roughness, Statistical analysis, Optics manufacturing
J. Micro/Nanolith. MEMS MOEMS 8(3), 031303 (1 July 2009) https://doi.org/10.1117/1.3152362
TOPICS: Microelectromechanical systems, Dielectrics, Radiation effects, Silicon, Space operations, Sensors, Electrons, Switches, Particles, Electronics
C. Pan, Y. Chen, Sheng-Chih Shen
J. Micro/Nanolith. MEMS MOEMS 8(3), 031304 (1 July 2009) https://doi.org/10.1117/1.3152363
TOPICS: Electromagnetism, Magnetism, Ceramics, Silver, Device simulation, Chemical elements, Process modeling, Prototyping, Microelectromechanical systems, Chemical analysis
J. Micro/Nanolith. MEMS MOEMS 8(3), 031305 (1 July 2009) https://doi.org/10.1117/1.3152368
TOPICS: Electrodes, Argon, Protactinium, Microelectromechanical systems, Helium, Aluminum, Electrons, Electrical breakdown, Nitrogen, Plasma
Wen Wang, Chunbae Lim, Kee-Keun Lee, Sang Sik Yang
J. Micro/Nanolith. MEMS MOEMS 8(3), 031306 (1 July 2009) https://doi.org/10.1117/1.3158610
TOPICS: Carbon monoxide, Sensors, Humidity, Gas sensors, Reflectors, Phase shifts, Reflection, Polymers, Acoustics, Temperature metrology
J. Micro/Nanolith. MEMS MOEMS 8(3), 031307 (1 July 2009) https://doi.org/10.1117/1.3158064
TOPICS: Microelectromechanical systems, Hydrogen, Packaging, Gases, Carbon monoxide, Infrared sensors, Manufacturing, Zirconium, Sensors, Gyroscopes
J. Micro/Nanolith. MEMS MOEMS 8(3), 031308 (1 July 2009) https://doi.org/10.1117/1.3158067
TOPICS: Microelectromechanical systems, Actuators, Deformable mirrors, Mirrors, Surface finishing, Ceramics, Electronics, Optical components, Electrodes, Silicon
J. Micro/Nanolith. MEMS MOEMS 8(3), 031309 (1 July 2009) https://doi.org/10.1117/1.3167825
TOPICS: Resistors, Resistance, Oxides, Etching, Surface micromachining, Thin films, Reactive ion etching, Microelectronics, Wet etching, Profilometers
Special Section on Computational Lithography
J. Micro/Nanolith. MEMS MOEMS 8(3), 031401 (1 July 2009) https://doi.org/10.1117/1.3240492
TOPICS: Computational lithography, Lithography, Imaging systems, Optics manufacturing, Photoresist materials, Computer simulations, Image processing, Optical proximity correction, Computing systems, Optical design
J. Micro/Nanolith. MEMS MOEMS 8(3), 031402 (1 July 2009) https://doi.org/10.1117/1.3152372
TOPICS: Finite-difference time-domain method, Extreme ultraviolet, Photomasks, Computer simulations, Ray tracing, Extreme ultraviolet lithography, Lithography, Fourier transforms, Finite element methods, Near field
Ke Zong, Xuan Zeng, Xia Ji, Wei Cai
J. Micro/Nanolith. MEMS MOEMS 8(3), 031403 (1 July 2009) https://doi.org/10.1117/1.3158611
TOPICS: Photomasks, Interfaces, Waveguides, Computer simulations, Scattering, Electromagnetism, Finite-difference time-domain method, Lithography, Semiconducting wafers, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 8(3), 031404 (1 July 2009) https://doi.org/10.1117/1.3173803
TOPICS: Zernike polynomials, Polarization, Wavefronts, Apodization, Wave plates, Resolution enhancement technologies, Polarizers, Lithography, Critical dimension metrology, Imaging systems
J. Micro/Nanolith. MEMS MOEMS 8(3), 031405 (1 July 2009) https://doi.org/10.1117/1.3158613
TOPICS: Photomasks, Binary data, Wavelets, Lithography, Linear filtering, Visualization, Optical proximity correction, Inverse optics, Optical lithography, Resolution enhancement technologies
J. Micro/Nanolith. MEMS MOEMS 8(3), 031406 (1 July 2009) https://doi.org/10.1117/1.3206980
TOPICS: Fourier transforms, Linear filtering, Image transmission, Resolution enhancement technologies, Computer simulations, Phase shifting, Photomasks, Binary data, Coherence imaging, Lithography
J. Micro/Nanolith. MEMS MOEMS 8(3), 031407 (1 July 2009) https://doi.org/10.1117/1.3213237
TOPICS: Reconstruction algorithms, System on a chip, Projection systems, Photomasks, Matrices, Optical lithography, Image transmission, Optical proximity correction, Vector spaces, Statistical analysis
Articles
J. Micro/Nanolith. MEMS MOEMS 8(3), 033001 (1 July 2009) https://doi.org/10.1117/1.3158612
TOPICS: Photoresist developing, Stochastic processes, Photoresist materials, Surface roughness, Interfaces, Lithography, Polymers, Molecules, Etching, Line edge roughness
Kevin Lucas, Christopher Cork, Alexander Miloslavsky, Gerard Luk-Pat, Levi Barnes, John Hapli, John Lewellen, Gregory Rollins, Vincent Wiaux, Staf Verhaegen
J. Micro/Nanolith. MEMS MOEMS 8(3), 033002 (1 July 2009) https://doi.org/10.1117/1.3158061
TOPICS: Semiconducting wafers, Double patterning technology, Lithography, Optical lithography, Etching, Photomasks, Optical proximity correction, Metals, Standards development, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 8(3), 033003 (1 July 2009) https://doi.org/10.1117/1.3190168
TOPICS: Monte Carlo methods, Scattering, Scanning electron microscopy, Silicon, Data modeling, Copper, Electron microscopes, Dielectrics, Model-based design, Binary data
Jukka Viheriala, Milla-Riina Viljanen, Juha Kontio, Tomi Leinonen, Juha Tommila, Mihail Dumitrescu, Tapio Niemi, Markus Pessa
J. Micro/Nanolith. MEMS MOEMS 8(3), 033004 (1 July 2009) https://doi.org/10.1117/1.3158307
TOPICS: Semiconducting wafers, Nanoimprint lithography, Waveguides, Etching, Semiconductor lasers, Lithography, Particles, Photomasks, Nanostructures, Electron beam lithography
Ulrich Klostermann, Thomas Mülders, Denis Ponomarenco, Thomas Schmoeller, Jeroen Van de Kerkhove, Peter De Bisschop
J. Micro/Nanolith. MEMS MOEMS 8(3), 033005 (1 July 2009) https://doi.org/10.1117/1.3224949
TOPICS: Calibration, 3D modeling, Data modeling, SRAF, Photomasks, Printing, Cadmium sulfide, Lithography, Optical proximity correction, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 8(3), 033006 (1 July 2009) https://doi.org/10.1117/1.3224950
TOPICS: Microfluidics, Water, Microfluidic imaging, Semiconducting wafers, Immersion lithography, Crystals, Liquids, Quartz, Printing, Lithography
J. Micro/Nanolith. MEMS MOEMS 8(3), 033007 (1 July 2009) https://doi.org/10.1117/1.3213232
TOPICS: Tolerancing, Lithography, Photomasks, Semiconducting wafers, Feature extraction, Optical proximity correction, Manufacturing, Scanning electron microscopy, Metals, Etching
Jangho Shin, Sangmo Nam, Taekyu Kim, Yong-Kug Bae, Junghyeon Lee
J. Micro/Nanolith. MEMS MOEMS 8(3), 033008 (1 July 2009) https://doi.org/10.1117/1.3210241
TOPICS: Semiconducting wafers, Overlay metrology, Scanners, Semiconductors, Optical alignment, Optical lithography, Metrology, Process control, Source mask optimization, Electronics
Cheng-Chung Jaing, Chii-Rong Yang, Chun-Ming Chang, Chao-Te Lee, Chien-Nan Hsiao
J. Micro/Nanolith. MEMS MOEMS 8(3), 033009 (1 July 2009) https://doi.org/10.1117/1.3222910
TOPICS: Optical filters, Nickel, Optical lithography, Photoresist materials, Dielectrics, Transmittance, Dielectric filters, Multilayers, Glasses, Chemical elements
J. Micro/Nanolith. MEMS MOEMS 8(3), 033010 (1 July 2009) https://doi.org/10.1117/1.3158617
TOPICS: X-rays, Photomasks, Polymethylmethacrylate, X-ray lithography, Silicon, Scanning electron microscopy, X-ray technology, Nickel, X-ray imaging, Self-assembled monolayers
J. Micro/Nanolith. MEMS MOEMS 8(3), 033011 (1 July 2009) https://doi.org/10.1117/1.3184795
TOPICS: Electrodes, Silicon, Brain, Tissues, Microelectromechanical systems, Semiconducting wafers, Chromium, Metals, Interfaces, Microfabrication
Ding Yuan, Pengliang Ci, Fei Tian, Jing Shi, Shaohui Xu, Peisheng Xin, Lianwei Wang, Paul Chu
J. Micro/Nanolith. MEMS MOEMS 8(3), 033012 (1 July 2009) https://doi.org/10.1117/1.3158616
TOPICS: Etching, Microchannel plates, Silicon, Lamps, Semiconducting wafers, Scanning electron microscopy, Halogens, High aspect ratio silicon micromachining, Electrochemical etching, Scattering
Jean Montagu, Herman DeWeerd, Nathan Tyburczy, Natalia Rodionova, Peter Maimonis
J. Micro/Nanolith. MEMS MOEMS 8(3), 033013 (1 July 2009) https://doi.org/10.1117/1.3158071
TOPICS: Proteins, Microfluidics, Molecules, Luminescence, Chemistry, Diffusion, Glasses, Microfluidic imaging, Fluid dynamics, Imaging systems
Takahiro Kawashima, Takahiro Sakai, Norihisa Kato, Takayuki Shibata, Mitsuyoshi Nomura, Takashi Mineta, Eiji Makino
J. Micro/Nanolith. MEMS MOEMS 8(3), 033014 (1 July 2009) https://doi.org/10.1117/1.3206971
TOPICS: Finite element methods, Silicon, Surgery, Etching, Semiconducting wafers, Microelectromechanical systems, Resistance, Microfluidics, Proteins, Silica
Wan-Chun Chuang, Yuh-Chung Hu, Chi-Yuan Lee, Wen-Pin Shih, Pei-Zen Chang
J. Micro/Nanolith. MEMS MOEMS 8(3), 033020 (1 July 2009) https://doi.org/10.1117/1.3158355
TOPICS: Capacitance, Aluminum, Microelectromechanical systems, Roads, Electromechanical design, Mechanical engineering, Beam analyzers, Instrument modeling, Manufacturing, Finite element methods
Chieh-Tang Chuang, Rongshun Chen
J. Micro/Nanolith. MEMS MOEMS 8(3), 033021 (1 July 2009) https://doi.org/10.1117/1.3184796
TOPICS: Sensors, Electrodes, Oxides, Reactive ion etching, Microelectromechanical systems, Silicon, Numerical simulations, Finite element methods, Photomasks, Etching
Bo Hsiung Wu, Chen-Kuei Chung, T. Shih, Chi-Cheng Peng, U. Mohanty
J. Micro/Nanolith. MEMS MOEMS 8(3), 033030 (1 July 2009) https://doi.org/10.1117/1.3158358
TOPICS: Silicon, Multilayers, Sputter deposition, Ion beams, Silicon carbide, Ions, Silicon films, Protactinium, Thin films, Mechanical engineering
J. Micro/Nanolith. MEMS MOEMS 8(3), 033040 (1 July 2009) https://doi.org/10.1117/1.3167840
TOPICS: Interferometry, Adaptive optics, Microelectromechanical systems, National Ignition Facility, Wavefronts, Laser beam diagnostics, Wavefront sensors, Mirrors, High power lasers, Optical simulations
I-Yu Huang, Shih-Han Wang, Chi-Chih Chu, Chien-Tai Chiu
J. Micro/Nanolith. MEMS MOEMS 8(3), 033050 (1 July 2009) https://doi.org/10.1117/1.3196547
TOPICS: Electrodes, Phase shifts, Semiconducting wafers, Silicon, Chlorine, Silver, Ions, Liquids, Solid state physics, Capacitance
Haiyong Quan, Zhixiong Guo
J. Micro/Nanolith. MEMS MOEMS 8(3), 033060 (1 July 2009) https://doi.org/10.1117/1.3213247
TOPICS: Resonators, Geometrical optics, Dielectrics, Finite element methods, Waveguides, Microresonators, Refractive index, Error analysis, Extremely high frequency, Magnetism
J. Micro/Nanolith. MEMS MOEMS 8(3), 033070 (1 July 2009) https://doi.org/10.1117/1.3213252
TOPICS: Composites, Sensors, Picosecond phenomena, Silicon, Humidity, Crystals, Semiconducting wafers, Microelectromechanical systems, Scanning electron microscopy, Metals
J. Micro/Nanolith. MEMS MOEMS 8(3), 033071 (1 July 2009) https://doi.org/10.1117/1.3222918
TOPICS: Microelectromechanical systems, Sensors, Thermography, Optical sensors, Dielectrics, Optical spheres, Prototyping, Temperature metrology, Fiber couplers, Charged particle optics
COMMUNICATIONS
Heung-Shik Lee, Chongdu Cho, Dae-Seok Shin, Sung Pil Chang
J. Micro/Nanolith. MEMS MOEMS 8(3), 039701 (1 July 2009) https://doi.org/10.1117/1.3196431
TOPICS: Magnetostrictive materials, Magnetism, Thin films, Silicon, Actuators, Microelectromechanical systems, Capacitance, Iron, Sputter deposition, Thin film deposition
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