Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 9 · NO. 1 | January 2010
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (17)
Errata (2)
Editorial
J. Micro/Nanolith. MEMS MOEMS 9(1), 010101 (1 January 2010) https://doi.org/10.1117/1.3372719
TOPICS: Semiconductors, Microelectromechanical systems, Lithography, Printing, Optical lithography, Nanoelectromechanical systems, Electron beam lithography, Projection systems, Semiconducting wafers, Photomasks
Articles
J. Micro/Nanolith. MEMS MOEMS 9(1), 013001 (1 January 2010) https://doi.org/10.1117/1.3302125
TOPICS: Resolution enhancement technologies, Lithography, Printing, Optical lithography, Image processing, Optical proximity correction, Polarization, Transistors, Line edge roughness, Photoresist processing
J. Micro/Nanolith. MEMS MOEMS 9(1), 013005 (1 January 2010) https://doi.org/10.1117/1.3302124
TOPICS: Photomasks, Diffraction, Extreme ultraviolet, Refractive index, Monochromatic aberrations, Extreme ultraviolet lithography, Lithographic illumination, Lithography, Wavefronts, Electromagnetism
J. Micro/Nanolith. MEMS MOEMS 9(1), 013010 (1 January 2010) https://doi.org/10.1117/1.3295712
TOPICS: Photomasks, Binary data, Optical proximity correction, Lithography, Opacity, Semiconducting wafers, Data modeling, Electromagnetism, Calibration, Phase shifting
J. Micro/Nanolith. MEMS MOEMS 9(1), 013012 (1 January 2010) https://doi.org/10.1117/1.3366559
TOPICS: Adsorption, Explosives, Proteins, Self-assembled monolayers, Sensors, Silicon, Atomic force microscopy, Fluorine, Coating, Microsensors
J. Micro/Nanolith. MEMS MOEMS 9(1), 013015 (1 January 2010) https://doi.org/10.1117/1.3280258
TOPICS: Line edge roughness, Glasses, Diffusion, Electron beam lithography, Line width roughness, Molecules, Polymers, Photoresist materials, Silicon, Silicon films
J. Micro/Nanolith. MEMS MOEMS 9(1), 013016 (1 January 2010) https://doi.org/10.1117/1.3358383
TOPICS: Line edge roughness, Diffusion, Monte Carlo methods, Optical spheres, Molecular aggregates, Performance modeling, Stochastic processes, Molecules, 3D modeling, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 9(1), 013020 (1 January 2010) https://doi.org/10.1117/1.3302123
TOPICS: Ions, Ion implantation, Photoresist processing, System on a chip, Optical lithography, Double patterning technology, Etching, Antireflective coatings, Scanning electron microscopy, Photomasks
J. Micro/Nanolith. MEMS MOEMS 9(1), 013025 (1 January 2010) https://doi.org/10.1117/1.3293969
TOPICS: Lithography, Semiconducting wafers, Micro optics, Refractive index, Polymers, Photoresist processing, Microlens, Silicon, Photomasks, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 9(1), 013026 (1 January 2010) https://doi.org/10.1117/1.3309711
TOPICS: Ferroelectric materials, Optical modulators, Actuators, Diffraction, Aluminum, Mirrors, Thermal effects, Silicon, Semiconducting wafers, Image quality
J. Micro/Nanolith. MEMS MOEMS 9(1), 013030 (1 January 2010) https://doi.org/10.1117/1.3280264
TOPICS: Micromirrors, Phase shifts, Mirrors, Microopto electromechanical systems, Etching, Actuators, Array processing, Silicon, Silica, Reflectivity
J. Micro/Nanolith. MEMS MOEMS 9(1), 013031 (1 January 2010) https://doi.org/10.1117/1.3295714
TOPICS: Metals, Capacitance, Deep reactive ion etching, Silicon, Amplifiers, Sensors, Capacitors, Modulation, Microfabrication, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 9(1), 013035 (1 January 2010) https://doi.org/10.1117/1.3280261
TOPICS: Plasma, Head-mounted displays, Plasma treatment, Silicon, Surface roughness, Surface properties, Roads, Coating, Velocity measurements, Oxides
J. Micro/Nanolith. MEMS MOEMS 9(1), 013040 (1 January 2010) https://doi.org/10.1117/1.3280262
TOPICS: Silicon, Micromachining, Semiconducting wafers, Copper, Process modeling, Prototyping, Control systems, Sensors, Process control, Semiconductor materials
J. Micro/Nanolith. MEMS MOEMS 9(1), 013045 (1 January 2010) https://doi.org/10.1117/1.3290239
TOPICS: Fiber optic gyroscopes, Fiber optics, Gyroscopes, Inspection, Fiber optics tests, Velocity measurements, Navigation systems, Safety, Measurement devices, Sensors
J. Micro/Nanolith. MEMS MOEMS 9(1), 013050 (1 January 2010) https://doi.org/10.1117/1.3309710
TOPICS: Microfluidics, Electrodes, Capillaries, Polymers, Liquids, Ions, Interfaces, Manufacturing, Microscopes, Fabrication
J. Micro/Nanolith. MEMS MOEMS 9(1), 013052 (1 January 2010) https://doi.org/10.1117/1.3316406
TOPICS: Magnetism, Silver, Ceramics, Electromagnetism, Resistance, Lutetium, Copper, Phase modulation, Resistors, Positron emission tomography
J. Micro/Nanolith. MEMS MOEMS 9(1), 013055 (1 January 2010) https://doi.org/10.1117/1.3366553
TOPICS: Semiconducting wafers, Maskless lithography, Data communications, Image compression, Lithography, Computer programming, Visualization, Algorithm development, Raster graphics, Terbium
Errata
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