journal of micro nanolithography mems and moems
VOL. 9 · NO. 1 | January 2010
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (17)
Errata (2)
Editorial
J. Micro/Nanolith. MEMS MOEMS 9(1), 010101 (1 January 2010) doi:10.1117/1.3372719
TOPICS: Semiconductors, Microelectromechanical systems, Lithography, Printing, Optical lithography, Nanoelectromechanical systems, Electron beam lithography, Projection systems, Semiconducting wafers, Photomasks
Articles
J. Micro/Nanolith. MEMS MOEMS 9(1), 013001 (1 January 2010) doi:10.1117/1.3302125
TOPICS: Resolution enhancement technologies, Lithography, Printing, Optical lithography, Image processing, Optical proximity correction, Polarization, Transistors, Line edge roughness, Photoresist processing
J. Micro/Nanolith. MEMS MOEMS 9(1), 013005 (1 January 2010) doi:10.1117/1.3302124
TOPICS: Photomasks, Diffraction, Extreme ultraviolet, Refractive index, Monochromatic aberrations, Extreme ultraviolet lithography, Lithographic illumination, Lithography, Wavefronts, Electromagnetism
J. Micro/Nanolith. MEMS MOEMS 9(1), 013010 (1 January 2010) doi:10.1117/1.3295712
TOPICS: Photomasks, Binary data, Optical proximity correction, Lithography, Opacity, Semiconducting wafers, Data modeling, Electromagnetism, Calibration, Phase shifting
Toshikazu Kawaguchi, Hiroyuki Iwasaka, Kiyoshi Matsumoto, Kiyoshi Toko, Norio Miura
J. Micro/Nanolith. MEMS MOEMS 9(1), 013012 (1 January 2010) doi:10.1117/1.3366559
TOPICS: Adsorption, Explosives, Proteins, Self-assembled monolayers, Sensors, Silicon, Atomic force microscopy, Fluorine, Coating, Microsensors
J. Micro/Nanolith. MEMS MOEMS 9(1), 013015 (1 January 2010) doi:10.1117/1.3280258
TOPICS: Line edge roughness, Glasses, Diffusion, Electron beam lithography, Line width roughness, Molecules, Polymers, Photoresist materials, Silicon, Silicon films
J. Micro/Nanolith. MEMS MOEMS 9(1), 013016 (1 January 2010) doi:10.1117/1.3358383
TOPICS: Line edge roughness, Diffusion, Monte Carlo methods, Optical spheres, Molecular aggregates, Performance modeling, Stochastic processes, Molecules, 3D modeling, Optical lithography
Hiroko Nakamura, Takeshi Shibata, Katsumi Rikimaru, Sanae Ito, Satoshi Tanaka, Soichi Inoue
J. Micro/Nanolith. MEMS MOEMS 9(1), 013020 (1 January 2010) doi:10.1117/1.3302123
TOPICS: Ions, Ion implantation, Photoresist processing, System on a chip, Optical lithography, Double patterning technology, Etching, Antireflective coatings, Scanning electron microscopy, Photomasks
J. Micro/Nanolith. MEMS MOEMS 9(1), 013025 (1 January 2010) doi:10.1117/1.3293969
TOPICS: Lithography, Semiconducting wafers, Micro optics, Refractive index, Polymers, Photoresist processing, Microlens, Silicon, Photomasks, Optical lithography
Jong Hyeong Song, Sang Kyeong Yun, Hee-Yeoun Kim, Seungdo An, Heung-Woo Park, Yoon Joon Choi, Victor Yurlov, Anatoly Lapchuk, Chung Mo Yang, Sung Jun Lee, Jae Wook Jang, Ki Un Lee, Ki Suk Woo, El Bourim
J. Micro/Nanolith. MEMS MOEMS 9(1), 013026 (1 January 2010) doi:10.1117/1.3309711
TOPICS: Ferroelectric materials, Optical modulators, Actuators, Diffraction, Aluminum, Mirrors, Thermal effects, Silicon, Semiconducting wafers, Image quality
Jin-Chern Chiou, Chen-Chun Hung, Li-Jung Shieh, Zhao-Long Tsai
J. Micro/Nanolith. MEMS MOEMS 9(1), 013030 (1 January 2010) doi:10.1117/1.3280264
TOPICS: Micromirrors, Phase shifts, Mirrors, Microopto electromechanical systems, Etching, Actuators, Array processing, Silicon, Silica, Reflectivity
Mohd Haris, Hongwei Qu
J. Micro/Nanolith. MEMS MOEMS 9(1), 013031 (1 January 2010) doi:10.1117/1.3295714
TOPICS: Metals, Capacitance, Deep reactive ion etching, Silicon, Amplifiers, Sensors, Capacitors, Modulation, Microfabrication, Microelectromechanical systems
Yung-Chiang Chung, Guo-Yuan Hess, Fu-Wen Yeh, Hsieh-Cheng Han, Chien-Yuan Chen, Ching-Jiun Lee, Horn-Jiunn Sheen, Lung Jieh Yang
J. Micro/Nanolith. MEMS MOEMS 9(1), 013035 (1 January 2010) doi:10.1117/1.3280261
TOPICS: Plasma, Head-mounted displays, Plasma treatment, Silicon, Surface roughness, Surface properties, Roads, Coating, Velocity measurements, Oxides
Muralidhara Rao, Nilesh Vasa, Makram Singaperumal
J. Micro/Nanolith. MEMS MOEMS 9(1), 013040 (1 January 2010) doi:10.1117/1.3280262
TOPICS: Silicon, Micromachining, Semiconducting wafers, Copper, Process modeling, Prototyping, Control systems, Sensors, Process control, Semiconductor materials
Zhan Gao, Qibo Feng, Sijin Wu, Fei Cheng, Jianying Cui, Shiqian Chen, Shiqing Jia, Jianjun Liu
J. Micro/Nanolith. MEMS MOEMS 9(1), 013045 (1 January 2010) doi:10.1117/1.3290239
TOPICS: Fiber optic gyroscopes, Fiber optics, Gyroscopes, Inspection, Fiber optics tests, Velocity measurements, Navigation systems, Safety, Measurement devices, Sensors
Sana Malahat, Pio Iovenitti, Igor Sbarski
J. Micro/Nanolith. MEMS MOEMS 9(1), 013050 (1 January 2010) doi:10.1117/1.3309710
TOPICS: Microfluidics, Electrodes, Capillaries, Polymers, Liquids, Ions, Interfaces, Manufacturing, Microscopes, Fabrication
Y. M. Hwang, W. L. Lu, C.T. Pan
J. Micro/Nanolith. MEMS MOEMS 9(1), 013052 (1 January 2010) doi:10.1117/1.3316406
TOPICS: Magnetism, Silver, Ceramics, Electromagnetism, Resistance, Lutetium, Copper, Phase modulation, Resistors, Positron emission tomography
J. Micro/Nanolith. MEMS MOEMS 9(1), 013055 (1 January 2010) doi:10.1117/1.3366553
TOPICS: Semiconducting wafers, Maskless lithography, Data communications, Image compression, Lithography, Computer programming, Visualization, Algorithm development, Raster graphics, Terbium
Errata
Valeriy Sukharev, Ara Markosian, Armen Kteyan, Jun-Ho Choy, Henrik Hovsepyan, Seiji Onoue, Takuo Kikuchi, Levon Manukyan, Nikolay Khachatryan, Hasmik Lazaryan, Tetsuya Kamigaki
J. Micro/Nanolith. MEMS MOEMS 9(1), 019801 (1 January 2010) doi:10.1117/1.3314279
J. Micro/Nanolith. MEMS MOEMS 9(1), 019802 (1 January 2010) doi:10.1117/1.3322187
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