journal of micro nanolithography mems and moems
VOL. 9 · NO. 2 | April 2010

Editorial (1)
Articles (14)
J. Micro/Nanolith. MEMS MOEMS 9(2), 020101 (1 April 2010) doi:10.1117/1.3454366
TOPICS: Nanoimprint lithography, Lithography, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Inspection, Stray light, Maskless lithography, Pellicles, Mirrors
Maurizio Dapor, Mauro Ciappa, Wolfgang Fichtner
J. Micro/Nanolith. MEMS MOEMS 9(2), 023001 (1 April 2010) doi:10.1117/1.3373517
TOPICS: Monte Carlo methods, Polymethylmethacrylate, Scattering, Molecules, Phonons, Polarons, Scanning electron microscopy, Solids, Molecular interactions, Dielectrics
Bin Yang, Chengkuo Lee, Wei Loon Kee, Siak-Piang Lim
J. Micro/Nanolith. MEMS MOEMS 9(2), 023002 (1 April 2010) doi:10.1117/1.3373516
TOPICS: Ferroelectric materials, Electromagnetism, Resistance, Magnetism, Microelectromechanical systems, Electrodes, Energy harvesting, Neodymium, Finite element methods, Ceramics
J. Micro/Nanolith. MEMS MOEMS 9(2), 023003 (1 April 2010) doi:10.1117/1.3373515
TOPICS: Photonic crystals, Polymers, Photomasks, Photoresist processing, Ultraviolet radiation, Calibration, Deep ultraviolet, Semiconductor manufacturing, Lithography, Image processing
J. Micro/Nanolith. MEMS MOEMS 9(2), 023004 (1 April 2010) doi:10.1117/1.3378152
TOPICS: Waveguides, Etching, Particles, Reactive ion etching, Nanolithography, Optical testing, Luminescence, Dielectrics, Nanoparticles, Ion beams
J. Micro/Nanolith. MEMS MOEMS 9(2), 023005 (1 April 2010) doi:10.1117/1.3378154
TOPICS: Photomasks, Etching, Extreme ultraviolet lithography, Image processing, Multilayers, Photoresist processing, Photovoltaics, Lithography, Extreme ultraviolet, Coating
I-Yu Huang, Yen-Chi Lee, Chang-Yu Lin, Pin-En Ho
J. Micro/Nanolith. MEMS MOEMS 9(2), 023006 (1 April 2010) doi:10.1117/1.3385769
TOPICS: 3D microstructuring, Thin films, Scanning electron microscopy, Curium, Temperature metrology, Photomicroscopy, Manufacturing, Microelectromechanical systems, Polysomnography, Plasma enhanced chemical vapor deposition
J. Micro/Nanolith. MEMS MOEMS 9(2), 023007 (1 April 2010) doi:10.1117/1.3386680
TOPICS: Lithography, Surface plasmons, Optical lithography, Photoresist materials, Plasmonics, Diffraction gratings, Interfaces, Dielectrics, Nanolithography, Metals
I-Yu Huang, Chang-Yu Lin, En-Chang Wu
J. Micro/Nanolith. MEMS MOEMS 9(2), 023008 (1 April 2010) doi:10.1117/1.3415495
TOPICS: Biosensors, Crystals, Quartz, Molecules, Molecular self-assembly, Magnesium, Surface roughness, Microsensors, Electrodes, Gold
J. Micro/Nanolith. MEMS MOEMS 9(2), 023009 (1 April 2010) doi:10.1117/1.3421948
TOPICS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography
Cho Jui Tay, Chenggen Quan, Huicong Liu, M. Gopal, Ramam Akkipeddi
J. Micro/Nanolith. MEMS MOEMS 9(2), 023010 (1 April 2010) doi:10.1117/1.3421968
TOPICS: Finite element methods, Interferometry, Indium gallium arsenide, Arsenic, Scanning electron microscopy, Image processing, Ferroelectric materials, Fabry–Perot interferometers, Reflectors, Metalorganic chemical vapor deposition
J. Micro/Nanolith. MEMS MOEMS 9(2), 023011 (1 April 2010) doi:10.1117/1.3427162
TOPICS: Photonic crystals, Gold, Reflectivity, Polymethylmethacrylate, Photomasks, Metals, X-rays, Numerical simulations, X-ray lithography, Lithography
J. Micro/Nanolith. MEMS MOEMS 9(2), 023012 (1 April 2010) doi:10.1117/1.3435350
TOPICS: Resonators, Silicon, Semiconducting wafers, Microresonators, Reactive ion etching, Electrodes, Capacitance, Silicon films, Domes, Plasma enhanced chemical vapor deposition
J. Micro/Nanolith. MEMS MOEMS 9(2), 023013 (1 April 2010) doi:10.1117/1.3453671
TOPICS: Waveguides, Fiber Bragg gratings, Composites, Optical filters, Polymers, Fabrication, Lithography, Optical lithography, Photoresist materials, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 9(2), 023014 (1 April 2010) doi:10.1117/1.3452319
TOPICS: Capacitance, Lithography, Optical proximity correction, Optical lithography, 3D modeling, Transistors, Nano opto mechanical systems, Logic, Diffusion, TCAD
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