Dual-dome micromechanical resonator fabricated with reactive ion etching and plasma-enhanced chemical vapor deposition techniques

Sami K. Myllymaki

doi:10.1117/1.3435350

1 April 2010 Dual-dome micromechanical resonator fabricated with reactive ion etching and plasma-enhanced chemical vapor deposition techniques

Sami K. Myllymaki

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 2, 023012 (April 2010). https://doi.org/10.1117/1.3435350

Abstract

A novel dual-dome micromechanical resonator and a method for fabricating it into a single or amorphous crystal silicon film layer is demonstrated. An electrostatic effect on the input resonator induces high-frequency resonant mechanical motion in the first dome plate, which is mechanically conducted into the second equivalent dome plate. Transduction from the input resonator to the output resonator is mechanically performed not by using coupling rods but by overlapping the plates. Oscillations are obtained at 8.5 MHz and 17 MHz when the resonator is buffered with a high-impedance junction gate field-effect transistor amplifier.

©(2010) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Sami K. Myllymaki "Dual-dome micromechanical resonator fabricated with reactive ion etching and plasma-enhanced chemical vapor deposition techniques," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(2), 023012 (1 April 2010). https://doi.org/10.1117/1.3435350

Published: 1 April 2010

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