journal of micro nanolithography mems and moems
VOL. 9 · NO. 4 | November 2010
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 9(4), 040101 (1 October 2010) doi:10.1117/1.3511517
TOPICS: Iterated function systems
Special Section on Reliability, Packaging, Testing, and Characterization of MEMS and MOEMS II
J. Micro/Nanolith. MEMS MOEMS 9(4), 041101 (1 October 2010) doi:10.1117/1.3533418
TOPICS: Packaging, Reliability, Microelectromechanical systems, Microopto electromechanical systems, New and emerging technologies, Switches, Nanomaterials, Sensors, Dielectric breakdown, Deformable mirrors
Adrien Broué, Jérémie Dhennin, Frédéric Courtade, Christel Dieppedal, Patrick Pons, Xavier Lafontan, Robert Plana
J. Micro/Nanolith. MEMS MOEMS 9(4), 041102 (1 October 2010) doi:10.1117/1.3504663
TOPICS: Resistance, Switches, Microelectromechanical systems, Interfaces, Gold, Physics, Ruthenium, Metals, Reliability
J. Micro/Nanolith. MEMS MOEMS 9(4), 041103 (1 October 2010) doi:10.1117/1.3492411
TOPICS: Graphene, Sensors, Actuators, Electronics, Nanolithography, Nanoelectronics, Nickel, Nanomaterials, Carbon nanotubes, Nanowires
Joel Plawsky, William Gill, Ravi Achanta
J. Micro/Nanolith. MEMS MOEMS 9(4), 041104 (1 November 2010) doi:10.1117/1.3492412
TOPICS: Dielectrics, Copper, Ions, Dielectric breakdown, Interfaces, Diffusion, Electrons, Metals, Electrical breakdown, Sodium
J. Micro/Nanolith. MEMS MOEMS 9(4), 041105 (1 November 2010) doi:10.1117/1.3492413
J. Micro/Nanolith. MEMS MOEMS 9(4), 041106 (1 November 2010) doi:10.1117/1.3497576
TOPICS: Actuators, Microelectromechanical systems, Adaptive optics, Mirrors, Deformable mirrors, Interferometers, Semiconducting wafers, Finite element methods, Gold, Astronomy
J. Micro/Nanolith. MEMS MOEMS 9(4), 041107 (1 October 2010) doi:10.1117/1.3500747
TOPICS: Interfaces, Silicon, Annealing, Semiconducting wafers, Plasma, Microelectromechanical systems, Reactive ion etching, Packaging, Oxides, Microfluidics
Jakob Gakkestad, Per Dalsjo, Helge Kristiansen, Rolf Johannessen, Maaike Visser Taklo
J. Micro/Nanolith. MEMS MOEMS 9(4), 041108 (1 October 2010) doi:10.1117/1.3504691
TOPICS: Adhesives, Optical spheres, Resistance, Microelectromechanical systems, Independent component analysis, Particles, Polymers, Printing, Packaging, Silver
Marco Sisto, Sonia García-Blanco, Loic Le Noc, Bruno Tremblay, Yan Desroches, Jean-Sol Caron, Francis Provencal, Francis Picard
J. Micro/Nanolith. MEMS MOEMS 9(4), 041109 (1 November 2010) doi:10.1117/1.3506744
TOPICS: Microsensors, Temperature metrology, Sensors, Calibration, Indium oxide, Bolometers, Infrared bolometers, Resistance, Infrared sensors, Environmental sensing
Onny Setyawati, Markus Engenhorst, Martin Bartels, Vadim Daneker, Stefan Wittzack, Tatjana Woit, Florestan Köhler, Harmut Hillmer
J. Micro/Nanolith. MEMS MOEMS 9(4), 041110 (1 October 2010) doi:10.1117/1.3524828
TOPICS: Etching, Mirrors, Dry etching, Photomasks, Reactive ion etching, Photoresist materials, Distributed Bragg reflectors, Optical filters, Plasma, Ions
Special Section on Line-Edge Roughness
J. Micro/Nanolith. MEMS MOEMS 9(4), 041201 (1 October 2010) doi:10.1117/1.3532953
TOPICS: Line edge roughness, Manufacturing, Semiconductors, Direct write lithography, Control systems, Measurement devices, Photomasks, Chemical species, Optical lithography, Line width roughness
J. Micro/Nanolith. MEMS MOEMS 9(4), 041202 (1 November 2010) doi:10.1117/1.3494607
TOPICS: Photoresist developing, Photoresist materials, Stochastic processes, 3D modeling, Surface roughness, Interfaces, Etching, Lithography, Line edge roughness, Algorithm development
J. Micro/Nanolith. MEMS MOEMS 9(4), 041203 (1 October 2010) doi:10.1117/1.3494614
TOPICS: Etching, Semiconducting wafers, Critical dimension metrology, Photoresist processing, Ion beams, Sputter deposition, Standards development, Line width roughness, Microelectromechanical systems, Microopto electromechanical systems
J. Micro/Nanolith. MEMS MOEMS 9(4), 041204 (1 October 2010) doi:10.1117/1.3494618
TOPICS: Photomasks, Line width roughness, Image processing, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Tolerancing
J. Micro/Nanolith. MEMS MOEMS 9(4), 041205 (1 October 2010) doi:10.1117/1.3491512
TOPICS: Line width roughness, Extreme ultraviolet, Charge-coupled devices, Photomasks, Reticles, Extreme ultraviolet lithography, Microscopes, Inspection, Microscopy, Scanning electron microscopy
Yongchan Ban, Savithri Sundareswaran, David Pan
J. Micro/Nanolith. MEMS MOEMS 9(4), 041206 (1 October 2010) doi:10.1117/1.3500746
TOPICS: Line edge roughness, Lithography, Diffusion, Device simulation, TCAD, Image segmentation, Nano opto mechanical systems, Transistors, Etching, Silicon
Vassilios Constantoudis, George Patsis, Evangelos Gogolides
J. Micro/Nanolith. MEMS MOEMS 9(4), 041207 (1 October 2010) doi:10.1117/1.3497580
TOPICS: Polymers, Stochastic processes, Molecules, Surface roughness, Diffusion, Fractal analysis, Ionization, Laser sintering, Lab on a chip, Lithography
J. Micro/Nanolith. MEMS MOEMS 9(4), 041208 (1 October 2010) doi:10.1117/1.3497607
TOPICS: Line edge roughness, Speckle, Photomasks, Statistical analysis, Surface roughness, Extreme ultraviolet lithography, Microelectromechanical systems, Microopto electromechanical systems, Spatial frequencies, Edge roughness
Vassilios Constantoudis, George Kokkoris, Evangelos Gogolides, Erwine Pargon, M. Martin
J. Micro/Nanolith. MEMS MOEMS 9(4), 041209 (1 November 2010) doi:10.1117/1.3497601
Atsushi Hiraiwa, Akio Nishida
J. Micro/Nanolith. MEMS MOEMS 9(4), 041210 (1 October 2010) doi:10.1117/1.3504358
TOPICS: Statistical analysis, Line width roughness, Error analysis, Solids, Edge detection, Fourier transforms, Microelectromechanical systems, Microopto electromechanical systems, Line edge roughness, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 9(4), 041211 (1 October 2010) doi:10.1117/1.3504697
TOPICS: Resistance, Lithography, TCAD, Manufacturing, Design for manufacturability, Line edge roughness, Instrument modeling, Optical lithography, Edge roughness, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 9(4), 041212 (1 October 2010) doi:10.1117/1.3517090
TOPICS: Stochastic processes, Critical dimension metrology, Line width roughness, Data modeling, Calibration, Computer simulations, Scanning electron microscopy, Lithography, Photons, Molecules
Hiroshi Morita, Masao Doi
J. Micro/Nanolith. MEMS MOEMS 9(4), 041213 (1 October 2010) doi:10.1117/1.3530593
TOPICS: Polymers, Particles, Liquids, Picosecond phenomena, Line edge roughness, Polymer thin films, Photoresist processing, Interfaces, Lithography, Computer simulations
Special Section on Metrology
J. Micro/Nanolith. MEMS MOEMS 9(4), 041301 (1 October 2010) doi:10.1117/1.3540417
TOPICS: Metrology, Critical dimension metrology, Overlay metrology, Semiconductors, Tolerancing, Silicon, Chemical species, Lithography, Calibration, Standards development
Peter De Bisschop, Jeroen Van de Kerkhove
J. Micro/Nanolith. MEMS MOEMS 9(4), 041302 (1 October 2010) doi:10.1117/1.3514704
TOPICS: Optical proximity correction, Scanning electron microscopy, Calibration, Electron microscopes, Reticles, Optical alignment, Distance measurement, Critical dimension metrology, Visualization, Data modeling
Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli, Edward Conrad, James Bruce, Sajan Marokkey
J. Micro/Nanolith. MEMS MOEMS 9(4), 041303 (1 October 2010) doi:10.1117/1.3514703
TOPICS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Image processing, Optical simulations, Wafer-level optics, Optical components, Critical dimension metrology
Miyako Matsui, Takayuki Odaka, Hiroshi Nagaishi, Koichi Sakurai
J. Micro/Nanolith. MEMS MOEMS 9(4), 041304 (1 October 2010) doi:10.1117/1.3514702
TOPICS: Resistance, Semiconducting wafers, Scanning electron microscopy, Calibration, Inspection, Silicon, Manufacturing, Transmission electron microscopy, Electron microscopes, Linear filtering
J. Micro/Nanolith. MEMS MOEMS 9(4), 041305 (1 October 2010) doi:10.1117/1.3514708
TOPICS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Nanoimprint lithography, Calibration, Spectroscopic ellipsometry, Scanning electron microscopy, Photoresist processing, Metrology, Polarization
Alok Vaid, Matthew Sendelbach, Daniel Moore, Timothy Brunner, Nelson Felix, Pawan Rawat, Cornel Bozdog, Hyang Kyun Kim, Michael Sendler, Stanislav Stepanov, Victor Kucerov
J. Micro/Nanolith. MEMS MOEMS 9(4), 041306 (1 October 2010) doi:10.1117/1.3514707
TOPICS: Scatterometry, Semiconducting wafers, Optical properties, Critical dimension metrology, Optical testing, Finite element methods, Diffractive optical elements, Lithography, Data modeling, Metrology
J. Micro/Nanolith. MEMS MOEMS 9(4), 041308 (1 October 2010) doi:10.1117/1.3531982
TOPICS: Line width roughness, Metrology, Extreme ultraviolet lithography, Image analysis, Line edge roughness, Lithography, Critical dimension metrology, Scanning electron microscopy, Photomasks, Edge detection
J. Micro/Nanolith. MEMS MOEMS 9(4), 041309 (1 October 2010) doi:10.1117/1.3531999
TOPICS: Scatterometry, Critical dimension metrology, Double patterning technology, Semiconducting wafers, Etching, Reflectance spectroscopy, Metrology, Spectroscopy, Reflectometry, Lithography
Bernhard Liegl, Brian Sapp, Stephen Greco, Timothy Brunner, Nelson Felix, Ian Stobert, Kourosh Nafisi, Chandra Sarma
J. Micro/Nanolith. MEMS MOEMS 9(4), 041311 (1 October 2010) doi:10.1117/1.3530580
TOPICS: Semiconducting wafers, Scatterometry, Image processing, Scanners, Error analysis, Scatter measurement, Silicon, Metrology, Sensors, Lithography
Articles
J. Micro/Nanolith. MEMS MOEMS 9(4), 043001 (1 November 2010) doi:10.1117/1.3496030
TOPICS: Data modeling, Calibration, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Optical proximity correction, Extreme ultraviolet, Critical dimension metrology, Reticles, Modulation
Shih-Hao Huang, Zheng-Yu Yu, Chia-Kai Lin, Kuo-Yung Hung
J. Micro/Nanolith. MEMS MOEMS 9(4), 043002 (1 October 2010) doi:10.1117/1.3497586
TOPICS: Microlens, Microlens array, Ultraviolet radiation, Modulation, Photomasks, Absorption, Index matching antireflective coatings, Microfluidics, Liquids, Refractive index
J. Micro/Nanolith. MEMS MOEMS 9(4), 043003 (1 October 2010) doi:10.1117/1.3503532
TOPICS: Extreme ultraviolet, Finite-difference time-domain method, Reflectivity, Refractive index, Scattering, Computer simulations, Silicon, Photomasks, Molybdenum, Surface roughness
Po-Tsung Hsieh, Tao-Hsing Chen, Chao-Yu Huang, Ji-Quan Wang, Ricky-Wenkuei Chuang
J. Micro/Nanolith. MEMS MOEMS 9(4), 043004 (1 October 2010) doi:10.1117/1.3514706
TOPICS: Sputter deposition, Thin films, Zinc oxide, Molybdenum, Nanocomposites, Transmittance, Chemical species, Thin film deposition, Chemical elements, Chemical analysis
Xiangmeng Jing, Di Chen, Xiang Chen, Jianmin Miao, Jingquan Liu, Jun Zhu
J. Micro/Nanolith. MEMS MOEMS 9(4), 043005 (1 October 2010) doi:10.1117/1.3517100
TOPICS: Silicon, Microelectromechanical systems, Copper, Metals, Resistance, Semiconducting wafers, Electroplating, Nickel, Oxides, Etching
Jee-Gong Chang, Chien-Wei Liu, Wang-Long Li, Jian-Ming Lu, Yu-Bin Fang
J. Micro/Nanolith. MEMS MOEMS 9(4), 043006 (1 October 2010) doi:10.1117/1.3517108
TOPICS: Waveguides, Nickel, Diffusers, Silicon, Optical design, Microelectromechanical systems, Etching, Microopto electromechanical systems, Scanning electron microscopy, Wet etching
J. Micro/Nanolith. MEMS MOEMS 9(4), 043007 (1 October 2010) doi:10.1117/1.3524829
TOPICS: Photomasks, Printing, Scanning electron microscopy, Etching, Double patterning technology, Optical lithography, Semiconducting wafers, Lithography, Electroluminescence, Metals
Yu-Che Huang, Ben-Hwa Jang, Weileun Fang
J. Micro/Nanolith. MEMS MOEMS 9(4), 043008 (1 November 2010) doi:10.1117/1.3528431
Ruixia Yang, Huaibo Qu, Peng Gao, Hanmin Tian
J. Micro/Nanolith. MEMS MOEMS 9(4), 043009 (1 October 2010) doi:10.1117/1.3514710
TOPICS: Microfluidics, Silicon, Lithography, Polymethylmethacrylate, Biological research, Semiconducting wafers, Plasma etching, Chemical analysis, Polymers, Silicon films
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