Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 9 · NO. 4 | November 2010
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 9(4), 040101 (1 October 2010) https://doi.org/10.1117/1.3511517
TOPICS: Iterated function systems
Special Section on Reliability, Packaging, Testing, and Characterization of MEMS and MOEMS II
J. Micro/Nanolith. MEMS MOEMS 9(4), 041101 (1 October 2010) https://doi.org/10.1117/1.3533418
TOPICS: Packaging, Reliability, Microelectromechanical systems, Microopto electromechanical systems, Switches, Nanomaterials, Sensors, Dielectric breakdown, Deformable mirrors
J. Micro/Nanolith. MEMS MOEMS 9(4), 041102 (1 October 2010) https://doi.org/10.1117/1.3504663
TOPICS: Resistance, Switches, Microelectromechanical systems, Interfaces, Gold, Physics, Ruthenium, Metals, Reliability
J. Micro/Nanolith. MEMS MOEMS 9(4), 041103 (1 October 2010) https://doi.org/10.1117/1.3492411
TOPICS: Graphene, Sensors, Actuators, Electronics, Nanolithography, Nanoelectronics, Nickel, Nanomaterials, Carbon nanotubes, Nanowires
J. Micro/Nanolith. MEMS MOEMS 9(4), 041104 (1 November 2010) https://doi.org/10.1117/1.3492412
TOPICS: Dielectrics, Copper, Ions, Dielectric breakdown, Interfaces, Diffusion, Electrons, Metals, Electrical breakdown, Sodium
J. Micro/Nanolith. MEMS MOEMS 9(4), 041105 (1 November 2010) https://doi.org/10.1117/1.3492413
J. Micro/Nanolith. MEMS MOEMS 9(4), 041106 (1 November 2010) https://doi.org/10.1117/1.3497576
TOPICS: Actuators, Microelectromechanical systems, Adaptive optics, Mirrors, Deformable mirrors, Interferometers, Semiconducting wafers, Finite element methods, Gold, Astronomy
J. Micro/Nanolith. MEMS MOEMS 9(4), 041107 (1 October 2010) https://doi.org/10.1117/1.3500747
TOPICS: Interfaces, Silicon, Annealing, Semiconducting wafers, Plasma, Microelectromechanical systems, Reactive ion etching, Packaging, Oxides, Microfluidics
J. Micro/Nanolith. MEMS MOEMS 9(4), 041108 (1 October 2010) https://doi.org/10.1117/1.3504691
TOPICS: Adhesives, Optical spheres, Resistance, Microelectromechanical systems, Independent component analysis, Particles, Polymers, Printing, Packaging, Silver
J. Micro/Nanolith. MEMS MOEMS 9(4), 041109 (1 November 2010) https://doi.org/10.1117/1.3506744
TOPICS: Microsensors, Temperature metrology, Sensors, Calibration, Indium oxide, Bolometers, Infrared bolometers, Resistance, Infrared sensors, Environmental sensing
J. Micro/Nanolith. MEMS MOEMS 9(4), 041110 (1 October 2010) https://doi.org/10.1117/1.3524828
TOPICS: Etching, Mirrors, Dry etching, Photomasks, Reactive ion etching, Photoresist materials, Distributed Bragg reflectors, Optical filters, Plasma, Ions
Special Section on Line-Edge Roughness
J. Micro/Nanolith. MEMS MOEMS 9(4), 041201 (1 October 2010) https://doi.org/10.1117/1.3532953
TOPICS: Line edge roughness, Manufacturing, Semiconductors, Direct write lithography, Control systems, Measurement devices, Photomasks, Chemical species, Optical lithography, Line width roughness
J. Micro/Nanolith. MEMS MOEMS 9(4), 041202 (1 November 2010) https://doi.org/10.1117/1.3494607
TOPICS: Photoresist developing, Photoresist materials, Stochastic processes, 3D modeling, Surface roughness, Interfaces, Etching, Lithography, Line edge roughness, Algorithm development
J. Micro/Nanolith. MEMS MOEMS 9(4), 041203 (1 October 2010) https://doi.org/10.1117/1.3494614
TOPICS: Etching, Semiconducting wafers, Critical dimension metrology, Photoresist processing, Ion beams, Sputter deposition, Standards development, Line width roughness, Microelectromechanical systems, Microopto electromechanical systems
J. Micro/Nanolith. MEMS MOEMS 9(4), 041204 (1 October 2010) https://doi.org/10.1117/1.3494618
TOPICS: Photomasks, Line width roughness, Image processing, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Tolerancing
J. Micro/Nanolith. MEMS MOEMS 9(4), 041205 (1 October 2010) https://doi.org/10.1117/1.3491512
TOPICS: Line width roughness, Extreme ultraviolet, Charge-coupled devices, Photomasks, Reticles, Extreme ultraviolet lithography, Microscopes, Inspection, Microscopy, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 9(4), 041206 (1 October 2010) https://doi.org/10.1117/1.3500746
TOPICS: Line edge roughness, Lithography, Diffusion, Device simulation, TCAD, Image segmentation, Nano opto mechanical systems, Transistors, Etching, Silicon
J. Micro/Nanolith. MEMS MOEMS 9(4), 041207 (1 October 2010) https://doi.org/10.1117/1.3497580
TOPICS: Polymers, Stochastic processes, Molecules, Surface roughness, Diffusion, Fractal analysis, Ionization, Laser sintering, Lab on a chip, Lithography
J. Micro/Nanolith. MEMS MOEMS 9(4), 041208 (1 October 2010) https://doi.org/10.1117/1.3497607
TOPICS: Line edge roughness, Speckle, Photomasks, Statistical analysis, Surface roughness, Extreme ultraviolet lithography, Microelectromechanical systems, Microopto electromechanical systems, Spatial frequencies, Edge roughness
J. Micro/Nanolith. MEMS MOEMS 9(4), 041209 (1 November 2010) https://doi.org/10.1117/1.3497601
J. Micro/Nanolith. MEMS MOEMS 9(4), 041210 (1 October 2010) https://doi.org/10.1117/1.3504358
TOPICS: Statistical analysis, Line width roughness, Error analysis, Solids, Edge detection, Fourier transforms, Microelectromechanical systems, Microopto electromechanical systems, Line edge roughness, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 9(4), 041211 (1 October 2010) https://doi.org/10.1117/1.3504697
TOPICS: Resistance, Lithography, TCAD, Manufacturing, Design for manufacturability, Line edge roughness, Instrument modeling, Optical lithography, Edge roughness, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 9(4), 041212 (1 October 2010) https://doi.org/10.1117/1.3517090
TOPICS: Stochastic processes, Critical dimension metrology, Line width roughness, Data modeling, Calibration, Computer simulations, Scanning electron microscopy, Lithography, Photons, Molecules
J. Micro/Nanolith. MEMS MOEMS 9(4), 041213 (1 October 2010) https://doi.org/10.1117/1.3530593
TOPICS: Polymers, Particles, Liquids, Picosecond phenomena, Line edge roughness, Polymer thin films, Photoresist processing, Interfaces, Lithography, Computer simulations
Special Section on Metrology
J. Micro/Nanolith. MEMS MOEMS 9(4), 041301 (1 October 2010) https://doi.org/10.1117/1.3540417
TOPICS: Metrology, Critical dimension metrology, Overlay metrology, Semiconductors, Tolerancing, Silicon, Chemical species, Lithography, Calibration, Standards development
J. Micro/Nanolith. MEMS MOEMS 9(4), 041302 (1 October 2010) https://doi.org/10.1117/1.3514704
TOPICS: Optical proximity correction, Scanning electron microscopy, Calibration, Electron microscopes, Reticles, Optical alignment, Distance measurement, Critical dimension metrology, Visualization, Data modeling
J. Micro/Nanolith. MEMS MOEMS 9(4), 041303 (1 October 2010) https://doi.org/10.1117/1.3514703
TOPICS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Image processing, Optical simulations, Wafer-level optics, Optical components, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 9(4), 041304 (1 October 2010) https://doi.org/10.1117/1.3514702
TOPICS: Resistance, Semiconducting wafers, Scanning electron microscopy, Calibration, Inspection, Silicon, Manufacturing, Transmission electron microscopy, Electron microscopes, Linear filtering
J. Micro/Nanolith. MEMS MOEMS 9(4), 041305 (1 October 2010) https://doi.org/10.1117/1.3514708
TOPICS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Nanoimprint lithography, Calibration, Spectroscopic ellipsometry, Scanning electron microscopy, Photoresist processing, Metrology, Polarization
J. Micro/Nanolith. MEMS MOEMS 9(4), 041306 (1 October 2010) https://doi.org/10.1117/1.3514707
TOPICS: Scatterometry, Semiconducting wafers, Optical properties, Critical dimension metrology, Optical testing, Finite element methods, Diffractive optical elements, Lithography, Data modeling, Metrology
J. Micro/Nanolith. MEMS MOEMS 9(4), 041308 (1 October 2010) https://doi.org/10.1117/1.3531982
TOPICS: Line width roughness, Metrology, Extreme ultraviolet lithography, Image analysis, Line edge roughness, Lithography, Critical dimension metrology, Scanning electron microscopy, Photomasks, Edge detection
J. Micro/Nanolith. MEMS MOEMS 9(4), 041309 (1 October 2010) https://doi.org/10.1117/1.3531999
TOPICS: Scatterometry, Critical dimension metrology, Double patterning technology, Semiconducting wafers, Etching, Reflectance spectroscopy, Metrology, Spectroscopy, Reflectometry, Lithography
J. Micro/Nanolith. MEMS MOEMS 9(4), 041311 (1 October 2010) https://doi.org/10.1117/1.3530580
TOPICS: Semiconducting wafers, Scatterometry, Image processing, Scanners, Error analysis, Scatter measurement, Silicon, Metrology, Sensors, Lithography
Articles
J. Micro/Nanolith. MEMS MOEMS 9(4), 043001 (1 November 2010) https://doi.org/10.1117/1.3496030
TOPICS: Data modeling, Calibration, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Optical proximity correction, Extreme ultraviolet, Critical dimension metrology, Reticles, Modulation
J. Micro/Nanolith. MEMS MOEMS 9(4), 043002 (1 October 2010) https://doi.org/10.1117/1.3497586
TOPICS: Microlens, Microlens array, Ultraviolet radiation, Modulation, Photomasks, Absorption, Index matching antireflective coatings, Microfluidics, Liquids, Refractive index
J. Micro/Nanolith. MEMS MOEMS 9(4), 043003 (1 October 2010) https://doi.org/10.1117/1.3503532
TOPICS: Extreme ultraviolet, Finite-difference time-domain method, Reflectivity, Refractive index, Scattering, Computer simulations, Silicon, Photomasks, Molybdenum, Surface roughness
J. Micro/Nanolith. MEMS MOEMS 9(4), 043004 (1 October 2010) https://doi.org/10.1117/1.3514706
TOPICS: Sputter deposition, Thin films, Zinc oxide, Molybdenum, Nanocomposites, Transmittance, Chemical species, Thin film deposition, Chemical elements, Chemical analysis
J. Micro/Nanolith. MEMS MOEMS 9(4), 043005 (1 October 2010) https://doi.org/10.1117/1.3517100
TOPICS: Silicon, Microelectromechanical systems, Copper, Metals, Resistance, Semiconducting wafers, Electroplating, Nickel, Oxides, Etching
J. Micro/Nanolith. MEMS MOEMS 9(4), 043006 (1 October 2010) https://doi.org/10.1117/1.3517108
TOPICS: Waveguides, Nickel, Diffusers, Silicon, Optical design, Microelectromechanical systems, Etching, Microopto electromechanical systems, Scanning electron microscopy, Wet etching
J. Micro/Nanolith. MEMS MOEMS 9(4), 043007 (1 October 2010) https://doi.org/10.1117/1.3524829
TOPICS: Photomasks, Printing, Scanning electron microscopy, Etching, Double patterning technology, Optical lithography, Semiconducting wafers, Lithography, Electroluminescence, Metals
J. Micro/Nanolith. MEMS MOEMS 9(4), 043008 (1 November 2010) https://doi.org/10.1117/1.3528431
J. Micro/Nanolith. MEMS MOEMS 9(4), 043009 (1 October 2010) https://doi.org/10.1117/1.3514710
TOPICS: Microfluidics, Silicon, Lithography, Polymethylmethacrylate, Biological research, Semiconducting wafers, Plasma etching, Chemical analysis, Polymers, Silicon films
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