The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM 3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
On the cover: The figure is from the paper "Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging" by Iacopo Mochi et al., from Vol. 19, Issue 1.