Journal of Micro/Nanolithography, MEMS, and MOEMS

Co-Editors-in-Chief:
Harry Levinson, HJL Lithography, USA
Hans Zappe, University of Freiburg, Germany

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM ³) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

On the cover: The figure is from the paper " Cascade and cluster of correlated reactions as causes of stochastic defects in exrtreme ultraviolet lithography" by Hiroshi Fukuda, from Vol. 19, Issue 2.

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Construction of complex logic circuit based on nanoparticles

Zhao Chen et al.

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Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

J. Church et al.

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Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations

Jonathan H. Ma et al.

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Construction of complex logic circuit based on nanoparticles

Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations

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High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features

Overlay error statistics for multiple-exposure patterning

Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

Retrospective on VLSI value scaling and lithography

Review of scanning electron microscope-based overlay measurement beyond 3-nm node device

Electrostatically tunable MOEMS waveguide Bragg grating-based DWDM optical filter

Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes

Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists

Contact inspection and resistance–capacitance measurement of Si nanowire with SEM voltage contrast

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