The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA
Localized and cascading secondary electron generation as causes of stochastic defects in extreme ultraviolet projection lithography
Hiroshi Fukuda
Special Section on Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications
Guest Editors: Sebastian Engelmann, Rich Wise, Roel Gronheid, and Nelson Felix
Broadband antireflective light-blocking layer using nanoparticle suspension in photoresist with high-resolution patterning
Matthew Hamblin et al.
February 2019
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from the Journal of Micro/Nanolithography, MEMS, and MOEMS
Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching
Joshua M. Duran, Andrew Sarangan (2017)
On spontaneous current fluctuations in various electrical conductors
Martin Burkhardt (2018)
Reducing roughness in extreme ultraviolet lithography
Chris A. Mack (2017)
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application
Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017)
Surface feature engineering through nanosphere lithography
Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016)
Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists
Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander F. Wuister (2018)
Stochastic printing failures in extreme ultraviolet lithography
Peter De Bisschop (2018)
Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition
Jiyeah Rhie et al. (2018)
Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes
Gavin C. Rider (2018)
Fabrication of quartz microcylinders by laser interference lithography for angular optical tweezers
Zhanna Santybayeva et al. (2016)
Video introduction to the journal
Author benefits:
- Rigorous and prompt peer review (median time from submission to first decision: 36 days)
- Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
- Professional copyediting and typesetting
- Free online color figures
- Free inclusion of videos and multimedia
- Open access publication option at a low cost
- 5 free downloads from the SPIE Digital Library for authors
- Integration with Code Ocean, a cloud-based code development and publishing platform
