Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects
Guest Editors: John Robinson, Tim Brunner, and Gian Lorusso
Special Section on Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications
Guest Editors: Sebastian Engelmann, Rich Wise, Roal Gronheid, and Nelson Felix
Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes
Dhairya Dixit et al.
September 2018
TOP DOWNLOADS
from the Journal of Micro/Nanolithography, MEMS, and MOEMS
Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching
Joshua M. Duran, Andrew Sarangan (2017)
Reducing roughness in extreme ultraviolet lithography
Chris A. Mack (2017)
Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists
Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander F. Wuister (2018)
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application
Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017)
Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition
Jiyeah Rhie et al. (2018)
Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes
Gavin C. Rider (2018)
Surface feature engineering through nanosphere lithography
Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016)
High-density electrical and optical probes for neural readout and light focusing in deep brain tissue
Vittorino Lanzio et al. (2018)
Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists
Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander F. Wuister (2018)
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
Yu Zhang et al. (2017)
Video introduction to the journal
Author benefits:
- Rigorous and prompt peer review (median time from submission to first decision: 36 days)
- Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
- Professional copyediting and typesetting
- Free online color figures
- Free inclusion of videos and multimedia
- Open access publication option at a low cost
- 5 free downloads from the SPIE Digital Library for authors
- Integration with Code Ocean, a cloud-based code development and publishing platform
