The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
Co-Editors-in-Chief:
Harry Levinson, HJL Lithography, USA
Hans Zappe, University of Freiburg, Germany
New Co-Editors Appointed for JM3
Levinson, Zappe leading the journal beginning in January 2020
Design of SOI MEMS-based Bennet’s doubler kinetic energy harvester
Mithlesh Kumar et al.
Most Viewed
from the Journal of Micro/Nanolithography, MEMS, and MOEMS
Retrospective on VLSI value scaling and lithography
Michael L. Rieger (2019)
Design, simulation, and fabrication of three-dimensional microsystem components using grayscale photolithography
Melissa A. Smith et al. (2019)
Influence of secondary effects in the fabrication of submicron resist structures using deep x-ray lithography
Abrar Faisal, Thomas Beckenbach, Jürgen Mohr, Pascal Meyer (2019)
Review of microshutters for switchable glass
Boris Lamontagne, Norman R. Fong, In-Hyouk Song, Penghui Ma, Pedro J. Barrios, Daniel Poitras (2019)
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters
Neha Thakur, Li-Ting Tseng, Michaela Vockenhuber, Yasin Ekinci, Sonia Castellanos (2019)
Review of scanning electron microscope-based overlay measurement beyond 3-nm node device
Osamu Inoue, Kazuhisa Hasumi (2019)
Maskless EUV lithography, an alternative to e-beam
Kenneth C. Johnson (2009)
Contact inspection and resistance–capacitance measurement of Si nanowire with SEM voltage contrast
Takeyoshi Ohashi, Kazuhisa Hasumi, Masami Ikota, Gian Francesco Lorusso, Hans Mertens, Naoto Horiguchi (2019)
Overlay error statistics for multiple-exposure patterning
Allen H. Gabor, Nelson M. Felix (2019)
Localized and cascading secondary electron generation as causes of stochastic defects in extreme ultraviolet projection lithography
Hiroshi Fukuda (2019)
Author benefits:
- Rigorous and prompt peer review
- Rapid, e-first publication of articles
- Professional copyediting and typesetting
- Free online color figures
- Free inclusion of videos and multimedia
- Open access publication option at a low cost
- 5 free downloads from the SPIE Digital Library for authors
- Integration with Code Ocean, a cloud-based code development and publishing platform
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