Journal of Micro/Nanolithography, MEMS, and MOEMS

Harry Levinson, HJL Lithography, USA
Hans Zappe, University of Freiburg, Germany

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM 3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

On the cover: The figure is from the paper "Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging" by Iacopo Mochi et al., from Vol. 19, Issue 1.

Featured Content

Journal Split Will Refocus Technical Communities

Harry Levinson and Hans Zappe

Cascade and cluster of correlated reactions as causes of stochastic defects in extreme ultraviolet lithography

Hiroshi Fukuda

High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features

Wei Sun et al.

Most Viewed

from the Journal of Micro/Nanolithography, MEMS, and MOEMS

Retrospective on VLSI value scaling and lithography

Michael L. Rieger (2019) Open Access

Design, simulation, and fabrication of three-dimensional microsystem components using grayscale photolithography

Melissa A. Smith et al. (2019) Open Access

Influence of secondary effects in the fabrication of submicron resist structures using deep x-ray lithography

Abrar Faisal, Thomas Beckenbach, Jürgen Mohr, Pascal Meyer (2019) Open Access

Review of microshutters for switchable glass

Boris Lamontagne, Norman R. Fong, In-Hyouk Song, Penghui Ma, Pedro J. Barrios, Daniel Poitras (2019) Open Access

Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters

Neha Thakur, Li-Ting Tseng, Michaela Vockenhuber, Yasin Ekinci, Sonia Castellanos (2019) Open Access

Review of scanning electron microscope-based overlay measurement beyond 3-nm node device

Osamu Inoue, Kazuhisa Hasumi (2019) Open Access

Maskless EUV lithography, an alternative to e-beam

Kenneth C. Johnson (2009)

Contact inspection and resistance–capacitance measurement of Si nanowire with SEM voltage contrast

Takeyoshi Ohashi, Kazuhisa Hasumi, Masami Ikota, Gian Francesco Lorusso, Hans Mertens, Naoto Horiguchi (2019) Open Access

Overlay error statistics for multiple-exposure patterning

Allen H. Gabor, Nelson M. Felix (2019) Open Access

Localized and cascading secondary electron generation as causes of stochastic defects in extreme ultraviolet projection lithography

Hiroshi Fukuda (2019) Open Access

Author benefits:

  • Rigorous and prompt peer review
  • Rapid, e-first publication of articles
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform


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