Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro/Nanolithography, MEMS, and MOEMS

Maskless EUV lithography, an alternative to e-beam

Kenneth C. Johnson

Overlay error investigation for metal containing resist

Roel Gronheid et al.

Review of microshutters for switchable glass

Boris Lamontagne et al.

Video introduction to the journal

Author benefits:

  • Rigorous and prompt peer review
  • Rapid, e-first publication of articles
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform

 


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