The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.
Editor-in-Chief: Harry Levinson, HJL Lithography, USA















Burn Lin, Founding Editor, 2002-2011
Chris Mack, 2012-2019
Hans Zappe (co-editor), 2020