Journal of Micro/Nanopatterning, Materials, and Metrology

Editor-in-Chief: Harry Levinson, HJL Lithography, USA

The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

Editorial Board
Editor-In-Chief

HJL Lithography

USA

Senior Editors

IBM Corp., USA

ASML, USA

KLA Corp., USA

LytEn, Inc., USA

Associate Editors

EUV Litho, Inc.
USA

KLA
USA

Siemens
USA

EMD Performance Materials
USA

IMEC
Belgium

Paul Scherrer Institute
Switzerland

Hitachi High Technologies Corp.
Japan

IMEC
Belgium

ASML
USA

KLA
Belgium

PsiQuantum LLC
USA

IMEC
Belgium

Tokyo Electron Limited Technology Center America
USA

ASML
USA

Tec-Start Consulting
USA

University of Massachusetts Amherst
USA

D2S Inc.
USA

Canon Nanotechnologies, Inc.
USA

IMEC
Belgium

Nikon Research Corp.
USA

I&I Consulting
USA

D2S Inc.
USA

Past Editors

Burn Lin, Founding Editor, 2002-2011
Chris Mack, 2012-2019
Hans Zappe (co-editor), 2020

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