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21 December 2023 Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 5: Pattern Placement, Critical Dimension, and Edge-to-Edge Overlay
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Abstract

Guest editor Alexander Starikov introduces the Special Section on Control of Integrated Circuit Patterning Variance, Part 5: Pattern Placement, Critical Dimension, and Edge-to-Edge Overlay.

© 2023 Society of Photo-Optical Instrumentation Engineers (SPIE)
Alexander Starikov "Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 5: Pattern Placement, Critical Dimension, and Edge-to-Edge Overlay," Journal of Micro/Nanopatterning, Materials, and Metrology 22(4), 041601 (21 December 2023). https://doi.org/10.1117/1.JMM.22.4.041601
Published: 21 December 2023
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KEYWORDS
Electron beam lithography

Overlay metrology

Integrated circuits

Dimensional metrology

Lithography

Metrology

Inspection

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