Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum)

Tao Shen; Iacopo Mochi; Dongmin Jeong; Elisabeth Mueller; Paolo Ansuinelli; Jinho Ahn; Yasin Ekinci

doi:10.1117/1.JMM.23.4.049801

5 August 2024 Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum)

Tao Shen, Iacopo Mochi, Dongmin Jeong, Elisabeth Mueller, Paolo Ansuinelli, Jinho Ahn, Yasin Ekinci

Author Affiliations +

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 4, 049801 (August 2024). https://doi.org/10.1117/1.JMM.23.4.049801

Abstract

Erratum corrects errors in STEM measurements in Table 1.

This article [J. Micro/Nanopattern. Mater. Metrol., 23(4), 041402 (2024) https://doi.org/10.1117/1.JMM.23.4.041402] was originally published online on 12 July 2024 with errors in Table 1 and in the Materials and Methods section. STEM measurements in the table and their corresponding mentions in the text were incorrect. The original table is shown below:

Table 1

Sample layer thickness summary.

Layer	Design (nm)	STEM (nm)	REGINE (nm)
Absorber	33	$37.53 \pm 0.25$	37.7(6)
Ru	2.5	$2.48 \pm 0.37$	2.1(2)
${Ru}_{2} {Si}_{3}$	N/A	$1.53 \pm 0.38$	1.5(1)
Si	4.2	$1.86 \pm 0.04$	N/A
${MoSi}_{2}$	N/A	$1.69 \pm 0.04$	N/A
Mo	2.8	$1.94 \pm 0.04$	N/A
${MoSi}_{2}$	N/A	$1.80 \pm 0.04$	N/A

The corrected table appears below:

Table 1

Sample layer thickness summary.

Layer	Design (nm)	STEM (nm)	REGINE (nm)
Absorber	33	$37.53 \pm 0.25$	37.7(6)
Ru	2.5	$2.48 \pm 0.37$	2.1(2)
${Ru}_{2} {Si}_{3}$	N/A	$1.53 \pm 0.38$	1.5(1)
Si	4.2	$1.86 \pm 0.30$	N/A
${MoSi}_{2}$	N/A	$1.69 \pm 0.30$	N/A
Mo	2.8	$1.94 \pm 0.28$	N/A
${MoSi}_{2}$	N/A	$1.80 \pm 0.29$	N/A

The affected portion of the text in Sec. 2.1 has been corrected to read:

“We estimated the thicknesses of Si, Mo, MoSi2 (grown on top of Si), MoSi2 (grown on top of Mo) as 1.86 ± 0.30, 1.94 ± 0.28, 1.80 ± 0.29, and 1.69 ± 0.30 nm, respectively.”

The article was corrected on 25 July 2024.

Citation Download Citation

Tao Shen, Iacopo Mochi, Dongmin Jeong, Elisabeth Mueller, Paolo Ansuinelli, Jinho Ahn, and Yasin Ekinci "Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum)," Journal of Micro/Nanopatterning, Materials, and Metrology 23(4), 049801 (5 August 2024). https://doi.org/10.1117/1.JMM.23.4.049801

Published: 5 August 2024

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KEYWORDS

Silicon

Attenuation

Extreme ultraviolet

Molybdenum

Phase shifts

Reflectometry

Ruthenium

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