Journal of Micro/Nanopatterning, Materials, and Metrology

Editor-in-Chief: Harry Levinson, HJL Lithography, USA

The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

On the cover: The figure is from "Investigation on the mechanical interface stability of curved high aspect ratio x-ray gratings made by deep x-ray lithography," an open access paper by Michael Richter et al. in Vol. 21, Issue 2. 


Featured Content

Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky

Special Section on Non-chemically Amplified Resists for EUV Lithography

Guest Editors: Anuja De Silva and Yasin Ekinci

Special Section on Next Generation Light Source, Materials, and Metrology/Inspection Equipment

Guest Editors: Erik Hosler and Brennan Peterson

Previously Published Special Sections

from the Journal of Micro/Nanopatterning, Materials, and Metrology


Journal Metrics:
ISSN: 1932-5150
E-ISSN: 2708-8340 
CiteScoreTM 2019:  3.0
Impact Factor*: 1.22
5-Year Impact Factor*: 0.968
h5-index: 20
*Source: Journal Impact FactorTM, from Clarivate, 2021

Author Benefits:

  • Rigorous and prompt peer review
  • Rapid, e-first publication of articles
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform

 


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