Journal of Micro/Nanopatterning, Materials, and Metrology

Editor-in-Chief: Harry Levinson, HJL Lithography, USA

The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

On the cover: The figure is from the paper "Modeling the impact of shrinkage effects on photoresist development" by Sean D'Silva et al. in Vol. 20, Issue 1.

Featured Content

Plasma-assisted discharges and charging in EUV-induced plasma

Mark van de Kerkhof et al.

Photothermal alternative to device fabrication using atomic precision advanced manufacturing techniques

Aaron M. Katzenmeyer et al.

Modeling the impact of shrinkage effects on photoresist development

Sean D'Silva et al.

Most Viewed

from the Journal of Micro/Nanopatterning, Materials, and Metrology

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem S. Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank J. Timmermans, Markus Bauer (2020) Open Access

Review of scanning electron microscope-based overlay measurement beyond 3-nm node device

Osamu Inoue, Kazuhisa Hasumi (2019) Open Access

Retrospective on VLSI value scaling and lithography

Michael L. Rieger (2019) Open Access

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

Andreas Erdmann, Peter Evanschitzky, Hazem Mesilhy, Vicky Philipsen, Eric Hendrickx, Markus Bauer (2018) Open Access

Design, simulation, and fabrication of three-dimensional microsystem components using grayscale photolithography

Melissa A. Smith, et al. (2019) Open Access

Reducing roughness in extreme ultraviolet lithography

Chris A. Mack (2018) Open Access

Review of microshutters for switchable glass

Boris Lamontagne, Norman R. Fong, In-Hyouk Song, Penghui Ma, Pedro J. Barrios, Daniel Poitras (2019) Open Access

High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features

Wei Sun, Hiroya Ohta, Taku Ninomiya, Yasunori Goto (2020) Open Access

Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists

Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander F. Wuister (2018) Open Access

Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition

Jiyeah Rhie, et al. (2018) Open Access

Author Benefits:

  • Rigorous and prompt peer review
  • Rapid, e-first publication of articles
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform


Alerts Receive Email Alerts

Become a Reviewer


Access & Subscriptions


Submit a Manuscript


Back to Top