The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.
Editor-in-Chief: Harry Levinson, HJL Lithography, USA
Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Andreas Erdmann et al.
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from the Journal of Micro/Nanopatterning, Materials, and Metrology
Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Andreas Erdmann, Hazem S. Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank J. Timmermans, Markus Bauer (2020)
Direct comparison of line edge roughness measurements by SEM and a metrological tilting-atomic force microscopy for reference metrology
Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda (2020)
Particle and pattern discriminant freeze-cleaning method
Kei Hattori, Daisuke Matsushima, Kensuke Demura, Masaya Kamiya (2020)
Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography
Anthony Yen (2020)
Three-state lithography model: an enhanced mathematical approach to predict resist characteristics in grayscale lithography processes
Bassem Badawi, Olfa Sayadi, Ignaz Eisele, Christoph Kutter (2021)
Review of scanning electron microscope-based overlay measurement beyond 3-nm node device
Osamu Inoue, Kazuhisa Hasumi (2019)
Retrospective on VLSI value scaling and lithography
Michael L. Rieger (2019)
Design, simulation, and fabrication of three-dimensional microsystem components using grayscale photolithography
Melissa A. Smith, et al. (2019)
Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography
Manabu Hakko, Kanji Suzuki (2020)
Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Andreas Erdmann, Peter Evanschitzky, Hazem Mesilhy, Vicky Philipsen, Eric Hendrickx, Markus Bauer (2018)
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