Journal of Micro/Nanopatterning, Materials, and Metrology

Editor-in-Chief: Harry Levinson, HJL Lithography, USA

The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

On the cover: The figure is from "Enabling nanoimprint simulator for quality verification: process-design co-optimization toward high-volume manufacturing" by Junichi Seki et al. in the Special Section on Novel Patterning Technologies II in Vol. 21, Issue 1.


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Special Section on Next Generation Light Source, Materials, and Metrology/Inspection Equipment

Guest Editors: Erik Hosler and Brennan Peterson

Previously Published Special Sections

from the Journal of Micro/Nanopatterning, Materials, and Metrology


Journal Metrics:
ISSN: 1932-5150
E-ISSN: 2708-8340 
CiteScoreTM 2019:  3.0
Impact Factor*: 1.22
5-Year Impact Factor*: 0.968
h5-index: 20
*Source: Journal Impact FactorTM, from Clarivate, 2021

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  • Integration with Code Ocean, a cloud-based code development and publishing platform

 


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