Journal of Micro/Nanopatterning, Materials, and Metrology

Editor-in-Chief: Harry Levinson, HJL Lithography, USA

The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

On the cover: The figure is from the paper "Modeling the impact of shrinkage effects on photoresist development" by Sean D'Silva et al. in Vol. 20, Issue 1.

Featured Content

Precision fabrication of EUVL programmed defects with helium ion beam patterning

Chien-Lin Lee et al.

Special Series on EUV Masks

Guest Editors: Martin Burkhardt and Vicky Philipsen

Gentle method for removing metal and restoring function after scanning electron microscopy

Rashi Sharma et al.

Most Viewed

from the Journal of Micro/Nanopatterning, Materials, and Metrology

Pattern roughness analysis using power spectral density: application and impact in photoresist formulation

Charlotte Cutler, James W. Thackeray, Peter Trefonas, Dan B. Millward, Choong Bong Lee, Chris A. Mack (2021) Open Access

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem S. Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank J. Timmermans, Markus Bauer (2020) Open Access

Review of scanning electron microscope-based overlay measurement beyond 3-nm node device

Osamu Inoue, Kazuhisa Hasumi (2019) Open Access

Retrospective on VLSI value scaling and lithography

Michael L. Rieger (2019) Open Access

Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters

Neha Thakur, Li-Ting Tseng, Michaela Vockenhuber , Yasin Ekinci, Sonia Castellanos (2019) Open Access

Design, simulation, and fabrication of three-dimensional microsystem components using grayscale photolithography

Melissa A. Smith, et al. (2019) Open Access

Review of microshutters for switchable glass

Boris Lamontagne, Norman R. Fong, In-Hyouk Song, Penghui Ma, Pedro J. Barrios, Daniel Poitras (2019) Open Access

High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features

Wei Sun, Hiroya Ohta, Taku Ninomiya, Yasunori Goto (2020) Open Access

Overlay error statistics for multiple-exposure patterning

Allen H. Gabor, Nelson M. Felix (2019) Open Access

Cascade and cluster of correlated reactions as causes of stochastic defects in extreme ultraviolet lithography

Hiroshi Fukuda (2020) Open Access

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