Analysis of Ag nanoparticle resist in fabrication of transmission-enhanced subwavelength structures

Xiangdong Kong; Yuegang Fu; Liangping Xia; Weiguo Zhang; Ziyin Zhang; Lianhe Dong; Deqiang Wang; Chunlei Du

doi:10.1117/1.JNP.10.046017

20 December 2016 Analysis of Ag nanoparticle resist in fabrication of transmission-enhanced subwavelength structures

Xiangdong Kong, Yuegang Fu, Liangping Xia, Weiguo Zhang, Ziyin Zhang, Lianhe Dong, Deqiang Wang, Chunlei Du

Author Affiliations +

Journal of Nanophotonics, Vol. 10, Issue 4, 046017 (December 2016). https://doi.org/10.1117/1.JNP.10.046017

Abstract

A theoretical model is proposed to analyze the fabrication of metal nanopartical resist by metal nanofilm annealing, which is used in the manufacture of the transmission-enhanced subwavelength structures at the interface of the optical glass. Based on the conservation of volume of the metal before annealing and after heat treatment, the theoretical relationships of the structure parameters between the metal nanofilm and the metal nanoparticles are obtained. The experimental results coincide well with the theory model, which offers a theoretical guidance to fabricate subwavelength antireflected structures with the advantage of low cost achieved through metal nanofilm annealing. By this means, the average transmission of the quartz device intensifies to 97.9% for the structures fabricated on the both sides compared with the 93% for the unstructured one.

Citation Download Citation

Xiangdong Kong, Yuegang Fu, Liangping Xia, Weiguo Zhang, Ziyin Zhang, Lianhe Dong, Deqiang Wang, and Chunlei Du "Analysis of Ag nanoparticle resist in fabrication of transmission-enhanced subwavelength structures," Journal of Nanophotonics 10(4), 046017 (20 December 2016). https://doi.org/10.1117/1.JNP.10.046017

Received: 22 July 2016; Accepted: 29 November 2016; Published: 20 December 2016

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