1 August 2010 Commentary: Nano- and micromachining using laser plasma soft X-rays
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Abstract
Investigating interactions of intense soft X-rays with solid surfaces and resulting phenomena is still challenging. One could expect material removal from the surfaces (ablation) caused by soft X-ray irradiation at a precision as high as the diffraction limit of the soft X-rays. The X-ray ablation technique could enable us to fabricate nano- and micro-structures on surfaces of even transparent materials such as silica glass, polymethylmethacrylate (PMMA) and polydimethylsiloxane (PDMS), which are highly valued for their use in the fields of nanometric chemical analysis and chemical reactions in medicine and biotechnology.
Tetsuya Makimura, Shuichi Torii, Hiroyuki Niino, Kouichi Murakami, "Commentary: Nano- and micromachining using laser plasma soft X-rays," Journal of Nanophotonics 4(1), 040305 (1 August 2010). https://doi.org/10.1117/1.3488615 . Submission:
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