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1 February 2010 Effects of hydrogen pretreatment on physical-vapor-deposited nickel catalyst for multi-walled carbon nanotube growth
Benjamin L. Crossley, Mauricio Kossler, Ronald Arman Coutu Jr., LaVern A. Starman, Peter J. Collins
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Journal of Nanophotonics, Vol. 4, Issue 1, 049502 (February 2010). https://doi.org/10.1117/1.3356218
Abstract
Physical vapor deposited nickel catalyst layers of 10, 50, 100, 200, 350, and 500 angstroms were granulated using hydrogen plasma for varying times to determine an effective carbon nanotube (CNT) growth process using microwave plasma enhanced CVD (MPECVD). Nickel was deposited via sputtering or evaporation. The catalyst granule size, density, and resulting CNTs were analyzed. Sputtered nickel of 50 angstroms with 5 minutes of hydrogen plasma pretreatment resulted in the most effective CNT growth.
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Benjamin L. Crossley, Mauricio Kossler, Ronald Arman Coutu Jr., LaVern A. Starman, and Peter J. Collins "Effects of hydrogen pretreatment on physical-vapor-deposited nickel catalyst for multi-walled carbon nanotube growth," Journal of Nanophotonics 4(1), 049502 (1 February 2010). https://doi.org/10.1117/1.3356218
Published: 1 February 2010
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Cited by 2 scholarly publications and 1 patent.
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KEYWORDS
Nickel
Hydrogen
Nanoparticles
Plasma
Carbon nanotubes
Atomic force microscopy
LCDs
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