optical engineering
VOL. 22 · NO. 2 | April 1983
CONTENTS
IN THIS ISSUE

Journal Articles
Phillip Blais
Opt. Eng. 22(2), 222175 (1 April 1983) https://doi.org/10.1117/12.7973076
TOPICS: Lithography, Submicron lithography, Semiconductors, Optical lithography, Integrated circuits, Optical design, Optical engineering, Metals, Oxides, Molybdenum
Al Tasch, Jr.
Opt. Eng. 22(2), 222176 (1 April 1983) https://doi.org/10.1117/12.7973077
TOPICS: Submicron lithography, Metals, Oxides, Semiconductors, Integrated circuits, Lithography, Molybdenum, Resistance, Capacitance
Wayne Moreau
Opt. Eng. 22(2), 222181 (1 April 1983) https://doi.org/10.1117/12.7973078
TOPICS: Polymers, Lithography, Polymethylmethacrylate, X-ray optics, Submicron lithography, Thermography, Ions, X-rays, Plasma
J. Holbert, P. Seese, A. Gonzales, C. Walker
Opt. Eng. 22(2), 222185 (1 April 1983) https://doi.org/10.1117/12.7973079
TOPICS: Photoresist processing, Metals, Oxides, Semiconductors, Electron beam lithography, Lithography, Photoresist materials, CMOS technology, Americium
Edward Weber
Opt. Eng. 22(2), 222190 (1 April 1983) https://doi.org/10.1117/12.7973080
TOPICS: Beam shaping, Integrated circuits, Lithography
K. Polasko, Y. Yau, R. Pease
Opt. Eng. 22(2), 222195 (1 April 1983) https://doi.org/10.1117/12.7973081
TOPICS: Electron beam lithography, Monte Carlo methods, Electron beams, Polymers, Computer simulations, Space reconnaissance, Lithography, Laser scattering, Scattering
E. Fuls
Opt. Eng. 22(2), 222199 (1 April 1983) https://doi.org/10.1117/12.7973082
TOPICS: Metals, Oxides, X-ray lithography, Semiconductors, X-rays, Silicon, Palladium, Lanthanum, Integrated circuits, Optical lithography
M. Feldman, A. White, D. White
Opt. Eng. 22(2), 222203 (1 April 1983) https://doi.org/10.1117/12.7973083
TOPICS: Zone plates, Optical alignment, X-ray lithography, Photomasks, Semiconducting wafers, Automatic alignment, Signal to noise ratio, Optical lithography, Image processing, Process control
C. Slayman, J. Bartelt, C. McKenna, J. Chen
Opt. Eng. 22(2), 222208 (1 April 1983) https://doi.org/10.1117/12.7973084
TOPICS: Ion beam lithography, Photomasks, Collimation, Semiconducting wafers, Lithography, Metals, Oxides, Semiconductors, Mask making, Photoresist processing
A. Macrander, D. Barr, A. Wagner
Opt. Eng. 22(2), 222215 (1 April 1983) https://doi.org/10.1117/12.7973085
TOPICS: Ion beam lithography, Gaussian beams, Monte Carlo methods, Polymethylmethacrylate, Silicon, Ions
J. Lerner, J. Flamand, A. Thevenon, M. Neviere
Opt. Eng. 22(2), 222220 (1 April 1983) https://doi.org/10.1117/12.7973086
TOPICS: Vacuum ultraviolet, Diffraction gratings, Electromagnetic theory, Signal attenuation
C. Aime, J. Demarcq, F. Martin, G. Ricort
Opt. Eng. 22(2), 222224 (1 April 1983) https://doi.org/10.1117/12.7973087
TOPICS: Telescopes, Velocity measurements, Speckle interferometry, Spectroscopy, Photons, Turbulence, Objectives, Imaging spectroscopy, Astronomy, Prototyping
M. Murty, R. Shukia
Opt. Eng. 22(2), 222227 (1 April 1983) https://doi.org/10.1117/12.7973088
TOPICS: Refractive index, Liquids, Glasses, Light, Helium neon lasers, Solids
M. Murty, R. Shukla
Opt. Eng. 22(2), 222231 (1 April 1983) https://doi.org/10.1117/12.7973089
TOPICS: Mirrors, Spherical lenses
Robert Jones
Opt. Eng. 22(2), 222236 (1 April 1983) https://doi.org/10.1117/12.7973090
TOPICS: Mirrors, Telescopes, Polishing, Optical telescopes, Materials processing, Process control, Surface finishing
N. Ceglio, A. Hawryluk, R. Price
Opt. Eng. 22(2), 222241 (1 April 1983) https://doi.org/10.1117/12.7973091
TOPICS: X-rays, Spectroscopy, Spectral resolution, Americium, Plasmas, Spatial resolution, Gold, Streak cameras, Image resolution, X-ray imaging
Gary Evans, Jay Leary, Jaroslava Wilcox
Opt. Eng. 22(2), 222247 (1 April 1983) https://doi.org/10.1117/12.7973092
TOPICS: Semiconductor lasers, Laser communications, Transmitters
Pei-Jan Lin, Richard Mintzer, Harvey Neiman
Opt. Eng. 22(2), 222256 (1 April 1983) https://doi.org/10.1117/12.7973093
TOPICS: Image quality, Imaging devices
Barry Meredith, Philip Carney, Robert LaBaugh
Opt. Eng. 22(2), 222260 (1 April 1983) https://doi.org/10.1117/12.7973094
TOPICS: Image processing, Space operations, Multispectral imaging, Imaging systems, Intelligence systems, Intelligent sensors, Intelligent sensor systems, Sensors, Data processing
John Arens, Gerald Lamb, Michael Peck
Opt. Eng. 22(2), 222267 (1 April 1983) https://doi.org/10.1117/12.7973095
TOPICS: Infrared cameras, Astronomy, Space telescopes, Infrared imaging, Photometry, Bismuth, Silicon, Sensors, Telescopes, Space operations
Douglas DeFoe
Opt. Eng. 22(2), 222269 (1 April 1983) https://doi.org/10.1117/12.7973096
TOPICS: Composites, Sensors, Brain mapping, Target detection, Brain
Fred Dickey, Bruce Jones
Opt. Eng. 22(2), 222275 (1 April 1983) https://doi.org/10.1117/12.7973097
TOPICS: Fourier optics, Sensors, Diffraction
Allen Greenleaf
Opt. Eng. 22(2), 222276 (1 April 1983) https://doi.org/10.1117/12.7973098
TOPICS: Calibration, Interferometers, Mirrors, Eye, Automatic tracking, Aspheric lenses, Optical components, Prototyping, Retroreflectors, Sensors
R. Catura, L. Acton, W. Brown, C. Gilbreth, L. Springer, J. Vieira, J. Culhane, I. Mason, O. Siegmund, T. Patrick, P. Sheather, K. Pounds, B. Cooke, K. Evans, J. Pye, G. Smith, A. Wells, J.E. Spragg, C.H. Whitford, A. Franks, B. Gale, K. Lindsey, M. Stedman, G Garmire, B. Margon, A. Fabian
Opt. Eng. 22(2), 222280 (1 April 1983) https://doi.org/10.1117/12.7973099
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