Laser Chemical Vapor Deposition Using Continuous Wave And Pulsed Lasers

S. D. Allen; A. B. Trigubo; Y. C. Liu

doi:10.1117/12.7973320

1 August 1984 Laser Chemical Vapor Deposition Using Continuous Wave And Pulsed Lasers

S. D. Allen, A. B. Trigubo, Y. C. Liu

Author Affiliations +

Optical Engineering, Vol. 23, Issue 4, 234470 (August 1984). https://doi.org/10.1117/12.7973320

Abstract

The deposition rate in laser chemical vapor deposition (LCVD) is a function of the surface temperature and therefore also a function of the chang-ing reflectivity of the surface during deposition. The influence of these parame-ters on the LCVD rate of metallic and insulating thin films was investigated using both pulsed and cw laser sources and optical monitoring of the depositing film thickness. Physical properties of the LCVD films are reported.

Citation Download Citation

S. D. Allen, A. B. Trigubo, and Y. C. Liu "Laser Chemical Vapor Deposition Using Continuous Wave And Pulsed Lasers," Optical Engineering 23(4), 234470 (1 August 1984). https://doi.org/10.1117/12.7973320

Published: 1 August 1984

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