Plasma-Enhanced Chemical Vapor Deposition Of Ge-Se And Ge-S Compounds

D. Blanc; J. I.B. Wilson

doi:10.1117/12.7976784

1 October 1988 Plasma-Enhanced Chemical Vapor Deposition Of Ge-Se And Ge-S Compounds

D. Blanc, J. I.B. Wilson

Author Affiliations +

Optical Engineering, Vol. 27, Issue 10, 271017 (October 1988). https://doi.org/10.1117/12.7976784

Abstract

We describe plasma-enhanced chemical vapor deposition for decomposing liquid chlorides and gaseous hydrides to yield Ge-Se and Ge-S glasses. We discuss deposition conditions for both nonisothermal glow discharge plasmas and isothermal high temperature plasmas. Our samples were examined by optical, thermal, and structural analysis to check their compositions, glass transition temperatures, and degree of microcrystallinity.

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D. Blanc and J. I.B. Wilson "Plasma-Enhanced Chemical Vapor Deposition Of Ge-Se And Ge-S Compounds," Optical Engineering 27(10), 271017 (1 October 1988). https://doi.org/10.1117/12.7976784

Published: 1 October 1988

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