1 July 1990 Guest Editorial: X-Ray/EUV Optics
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Optical Engineering, 29(7), (1990). doi:10.1117/12.150799
Abstract
The July special issue on x-ray/EUV optics begins with a consideration of the application of multilayer mirror technology to astronomy, microscopy, and spectroscopy. The Ultra-High Resolution XUV Spectroheliograph (a com¬plex array of multilayer x-ray telescopes that has been selected for flight on the U.S. space station Freedom) is described. This paper is followed by an overview of advances in multilayer x-ray/EUV optics by one of the pioneers of the field. Normal incidence multilayer x-ray mirrors have applications as optical components for Schwarzschild x-ray microscopes as well as telescopes.
Richard B. Hoover, "Guest Editorial: X-Ray/EUV Optics," Optical Engineering 29(7), (1 July 1990). https://doi.org/10.1117/12.150799
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