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1 April 1994 Aberration measurement using axial intensity
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Abstract
A method of measuring optical aberrations using axial intensity information near paraxial focus is described. This method can be applied to systems with or without central obscurations. The axial intensity profile can also be used to determine the location of paraxial focus in a centrally obscured system, a measurement that is difficult to achieve using other methods. The experimental data demonstrate good agreement with theoretical predictions.
Qian Gong and Smiley S. Hsu "Aberration measurement using axial intensity," Optical Engineering 33(4), (1 April 1994). https://doi.org/10.1117/12.163190
Published: 1 April 1994
JOURNAL ARTICLE
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