Using conventional photolithographic glass masks as high-efficiency phase gratings

Guy Voirin; Olivier M. Parriaux; Henry Vuilliomenet; R. Wildi; Ulrich Benner; S. M.O.L. Schneider

doi:10.1117/12.201811

1 September 1995 Using conventional photolithographic glass masks as high-efficiency phase gratings

Guy Voirin, Olivier M. Parriaux, Henry Vuilliomenet, R. Wildi, Ulrich Benner, S. M.O.L. Schneider

Author Affiliations +

Optical Engineering, Vol. 34, Issue 9, (September 1995). https://doi.org/10.1117/12.201811

Abstract

By patterning the iron oxide film of a conventional iron oxide mask it is possible to obtain a binary phase grating of high diffraction efficiency and high transmission that can be used in high-resolution displacement sensors.

Citation Download Citation

Guy Voirin, Olivier M. Parriaux, Henry Vuilliomenet, R. Wildi, Ulrich Benner, and S. M.O.L. Schneider "Using conventional photolithographic glass masks as high-efficiency phase gratings," Optical Engineering 34(9), (1 September 1995). https://doi.org/10.1117/12.201811

Published: 1 September 1995

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available