Investigation of the absorption induced damage in ultraviolet dielectric thin films

Eberhard Welsch; K. Ettrich; Holger Blaschke; Peter Thomsen-Schmidt; Dieter Schaefer; Norbert Kaiser

doi:10.1117/1.601222

1 February 1997 Investigation of the absorption induced damage in ultraviolet dielectric thin films

Eberhard Welsch, K. Ettrich, Holger Blaschke, Peter Thomsen-Schmidt, Dieter Schaefer, Norbert Kaiser

Optical Engineering, Vol. 36, Issue 2, (February 1997). https://doi.org/10.1117/1.601222

The interaction of UV laser radiation with optical coatings is investigated by a pulsed two-probe-beam photothermal technique. UV laser damage resistance studies on LaF3/MgF2, Al2O3/SiO2 , HfO2/SiO2 multilayer stacks are performed at ? = 248 nm and t520 ns. By investigating the relationship of the number of high-low (HL) pairs and the substrate material, optical and thermal coating properties are shown to be responsible for UV single-shot laser damage. The damage threshold of selected samples is influenced by the deposition technique. The influence of the bandgap energy of typical UV thin film oxide materials on the damage is investigated. Furthermore, multishot damage measurements on LaF3/MgF2 high-reflection multilayer coatings reveal the accumulation of laser energy in the predamage range and lead to an increase in absorption.

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Eberhard Welsch, K. Ettrich, Holger Blaschke, Peter Thomsen-Schmidt, Dieter Schaefer, and Norbert Kaiser "Investigation of the absorption induced damage in ultraviolet dielectric thin films," Optical Engineering 36(2), (1 February 1997). https://doi.org/10.1117/1.601222

Published: 1 February 1997

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