Characterization of freestanding polymer films for application in 351-nm, high-peak-power laser systems

Semyon Papernov; Ansgar W. Schmid; D. Zaksas

doi:10.1117/1.601867

1 February 1998 Characterization of freestanding polymer films for application in 351-nm, high-peak-power laser systems

Semyon Papernov, Ansgar W. Schmid, D. Zaksas

Optical Engineering, Vol. 37, Issue 2, (February 1998). https://doi.org/10.1117/1.601867

Perfluorinated pellicles are screened for thickness uniformity, absence of birefringence, photolytic stability under prolonged UV irradiation, and survival strength under pulsed (0.5-ns) high-peak-power laser irradiation. Results prove them to be extraordinarily robust against laser damage, photolytically stable, and better in transmitted wavefront quality than can be measured by state-of-the-art interferometry.

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Semyon Papernov, Ansgar W. Schmid, and D. Zaksas "Characterization of freestanding polymer films for application in 351-nm, high-peak-power laser systems," Optical Engineering 37(2), (1 February 1998). https://doi.org/10.1117/1.601867

Published: 1 February 1998

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