On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses

Mark Mero; Benjamin R. Clapp; Jayesh C. Jasapara; Wolfgang G. Rudolph; Detlev Ristau; Kai Starke; Jörg Krüger; Sven Martin; Wolfgang Kautek

doi:10.1117/1.1905343

Translator Disclaimer

1 May 2005 On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses

Mark Mero, Benjamin R. Clapp, Jayesh C. Jasapara, Wolfgang G. Rudolph, Detlev Ristau, Kai Starke, Jörg Krüger, Sven Martin, Wolfgang Kautek

Author Affiliations +

Optical Engineering, 44(5), 051107 (2005). https://doi.org/10.1117/1.1905343

Abstract

The physical effects reducing the damage threshold of dielectric films when exposed to multiple femtosecond pulses are investigated. The measured temperature increase of a Ta₂O₅ film scales exponentially with the pulse fluence. A polarized luminescence signal is observed that depends quadratically on the pulse fluence and is attributed to two-photon excitation of self-trapped excitons that form after band-to-band excitation. The damage fluence decreases with increasing pulse number, but is independent of the repetition rate from 1 Hz to 1 kHz at a constant pulse number. The repetition rate dependence of the breakdown threshold is also measured for TiO₂, HfO₂, Al₂O₃, and SiO₂ films. A theoretical model is presented that explains these findings.

©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Mark Mero, Benjamin R. Clapp, Jayesh C. Jasapara, Wolfgang G. Rudolph, Detlev Ristau, Kai Starke, Jörg Krüger, Sven Martin, and Wolfgang Kautek "On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses," Optical Engineering 44(5), 051107 (1 May 2005). https://doi.org/10.1117/1.1905343

Published: 1 May 2005

ACCESS THE FULL ARTICLE