Simple tilt and height location monitoring of wafers

Tuck Wah Ng; Arthur E. B. Tay; Chang Jeh Ong

doi:10.1117/1.2203357

1 May 2006 Simple tilt and height location monitoring of wafers

Tuck Wah Ng, Arthur E. B. Tay, Chang Jeh Ong

Author Affiliations +

Optical Engineering, Vol. 45, Issue 5, 053603 (May 2006). https://doi.org/10.1117/1.2203357

Abstract

Good alignment is needed in various wafer processes. Reflectometry is a well-established technique that continues to be widely used to monitor the thickness of wafer thin films. The use of a reflectometer was investigated to detect incorrect tilt and height of wafer placement. We found that it could be used in the spectroscopic or the monochromatic mode and provided results whether the wafer was bare or coated. We also found that the technique was somewhat more sensitive to tilt of bare wafers, and more sensitive to height displacements of coated wafers.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Tuck Wah Ng, Arthur E. B. Tay, and Chang Jeh Ong "Simple tilt and height location monitoring of wafers," Optical Engineering 45(5), 053603 (1 May 2006). https://doi.org/10.1117/1.2203357

Published: 1 May 2006

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